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INDUCTION PLASMA REACTIVE DEPOSITION OF TUNGSTENCARBIDE FROM TUNGSTEN METAL POWDER

X.L. Jiang

金属学报(英文版)

Experimental results are reported on the primary carburization reaction between the tungsten powder and methane in the induction plasma, and the secondary carburization of the deposit on substrate at high temperature. Optical microscopy and scanning electron microscopy were used to examine the microstructures of starting tungsten powder, carburized powder, and deposit. X-ray diffraction analysis, thermal gravimetric analysis and microhardness measurement were used to characterize the structures and properties of the powder and the deposit. It is found that the primary carburization reaction in the induction plasma starts from the surface of tungsten particles when the particles are melted. Tungsten particles are partially carburized inside the reactive plasma. Complete carburization is achieved through the secondary carburization reaction of the deposit on substrate at high temperature.

关键词: tungsten powder , null , null , null

大气等离子喷涂制备低氧含量厚钨涂层

张小锋 , 于磊 , 杨震晓 , 邓春明

材料工程 doi:10.11868/j.issn.1001-4381.2014.05.005

采用等离子球化技术对不规则钨粉进行球化,以还原后的球形钨粉为原料于CuCrZr合金基体上在氮气保护下,用大气等离子喷涂制备聚变堆用厚钨梯度涂层.利用X射线衍射(XRD)对钨粉和涂层进行物相分析,采用扫描电镜(SEM)对钨粉和涂层微观形貌进行观察,使用O/N测量仪、激光热导仪和拉伸试验机分别对涂层氧含量、热导率和结合强度进行测量,用X射线光电子能谱(XPS)对钨涂层中钨元素的价态进行分析.结果表明:在氮气保护下,采用大气等离子喷涂成功制备了以Cu-Mo/Mo-W为过渡的约2mm厚钨涂层,其结合强度为15.2MPa.相对真空热处理而言,H2还原热处理能显著降低等离子球化钨粉和钨涂层的氧含量,H2处理后涂层中氧含量从0.93%(质量分数,下同)降至0.17%.在钨涂层制备过程中由于存在对流氧化和扩散氧化,导致涂层存在微量的氧化物,其中氧化物主要以WO2.72和WO3存在.

关键词: 钨粉 , 等离子球化 , 大气等离子喷涂 , 钨涂层

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