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High Temperature Oxidation as a Production Route for Electronic Materials

W.GAOZ.W.LI

中国腐蚀与防护学报

Oxidation of metallic components often results in degradation and structural failure, prevention is therefore an important topic. On the other hand, oxidation process creates new products such as metal oxides, can be used as a production route. A well-known process in semiconductor industry is that oxidation in dry or wet atmosphere is a popular way for growth of multi-functional SiO2 films on Si wafers. Recently, oxidation processes under controlled conditions (atmosphere, temperature, and time) are used to prepare various oxides, carbides, or nitrides with micro-/nano-structures, well-defined composition, dimension, shape and properties. The use of oxidation now includes thin film and nano-/micro-sized devices, and porous oxides for sensing and catalysis purposes. This paper introduces the research activities in the authors' group on applications of oxidation as a tool for synthesis of functional materials.

关键词: oxidation , null , null , null

表面施加含稀土氧化物薄膜对Fe25Cr高温氧化的“活性元素效应"

齐慧滨 , D.G.Lees , 何业东

腐蚀学报(英文)

研究了表面施加含有不同量Y2O2的Cr2O3和Al2O3薄膜对Cr2O3形成合金Fe25Cr在1000℃、104PaO2环境中高温氧化的作用。结果发现含Y氧化物薄膜明显降低了Cr2O3层的生长速度,而且含Y复合氧化物薄膜的作用大于 Y2O3薄膜,此时,Cr2O3层表面形貌发生了较大的变化,间接证据表明Cr2O3的生长机制的由阳离子向外扩散为主转变阴离子向内扩散为 主,通过表面施加含Y的氧化物薄膜产生

关键词: 氧化物薄膜 , Fe25Cr , oxidation

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