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MICROSTRUCTURE AND INDENTATION BEHAVIOUR OF MULTILAYER Ti-N FILM

WAGENDRISTEL A Viena Technical Univessity , AustriaHUANG Rongfang Institute of Metal Research , Academia Sinica , Shenyang , ChinaBANGERT H YANG Xia WU Lihang WANG Haifeng PANGRATZ H SKALICKY P Viena Technical University , Austria Associate Professor , Institute of Metall Research , Academia Sinica , Shenyang 110015 , China

金属学报(英文版)

The microstructure of Ti/TiN multilayer film was studied.It was shown by trans- mission electron microscopy of cross-sectional sample and respective secondary neutrals mass-spectroscopy depth profiling that the film has a periodic alternate multilayered structure:substrate /FeTi/Ti/Ti_2N/TiN/Ti_2N/Ti/Ti_2N/TiN...Ti/Ti_2N/TiN,where FeTi and Ti_2N were the transition layers formed during ion plating.Cross-sectional fracture surface of indentation samples had been obtained and studied with scanning electron microscopy.It was shown that the multilayer film deformed during indentation, formed an indentation pit and a pile-up of materials around the indentation pit.As the applied load increased deformation region extended beyond the film/substratc interface and into the substrate,the interlayer crack in the film and hole formation at the film /substrate interface were initiated.It is also shown that the multilayered Ti/TiN film offered better toughness in comparison with single layer TiN film.

关键词: multilayer Ti-N film , null , null

Ti-N多层膜的显微结构和压痕行为

A.WAGENDRISTEL , 黄荣芳 , H.BANGERT , 杨霞 , 吴立航 , 王海峰 , H.PANGRATZ , P.SKALICKY

金属学报

研究了Ti/TiN多层膜的显微结构,横截面试样的透射电镜研究和二次离子质谱深度分析均表明,该膜具有周期变化的多层结构,即:基体/FeTi/Ti/Ti_2N/TiN/Ti_2N/Ti/Ti_2N/TiN…Ti/Ti_2N/TiN.制备了压痕试样的断口试样,并用扫描电镜进行了观察.结果表明,多层硬膜在压痕试验时发生形变,出现压痕坑,在其周围形成材料堆积.随着所加载荷的增加,形变区扩大,越过膜/基界面进入基体,引起膜内的层间开裂和在膜/基界面上形成孔洞,研究结果表明,和单层TiN相比,Ti/TiN多层膜具有较好的韧性.

关键词: Ti-N多层膜 , microstructure , indentation

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