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PERFORMANCE AND MICROSTRUCTURE OF SUPERHARD Si_3N_4 FILM BY HIGH POWER CO_2 LASER CVD

FENG Zhongchao GUO Liang LIANG Yong HAN Jian HOU Wanliang NING Xiaoguang Institute of Metal Research , Academia Sinica , Shenyang , China Associate Professor , Institute of Metal Research , Academia Sinica , Shenyang 110015 , China

金属学报(英文版)

A superhard α-Si_3N_4 film,deposited on metal substrate,was produced by laser chemical vapor deposition adopting a kW-level high power CO_2 laser.Most films are composed of fine Si_3N_4 partieles.They join the metal substrate in strong bond.The films have super hardness,excellent resistance to wear and corrosion,etc.Their thickness may be controlled within 5-30 μm.

关键词: laser chemical vapour deposition , null , null , null , null

大功率CO_2激光沉积超硬Si_3N_4膜的性能和组织

冯钟潮 , 郭良 , 梁勇 , 韩健 , 侯万良 , 宁小光

金属学报

用大功率(kW级)CO_2激光在金属基材上通过化学气相沉积获得α-Si_3N_4膜。膜层多为细小的Si_3N_4颗粒组成,与基材有良好的结合,具有超硬和优良的耐磨抗蚀等性能,厚度在5—30μm范围内可控。

关键词: 激光化学气相沉积 , Si_3N_4 film , microstructure , hardness , wear resistance , corrosion resistance

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