LI Douxing PING Dehai NING Xiaoguang YE Hengqiang Laboratory of Atomic Imaging of Solids
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Institute of Metal Research
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Academia Sinica
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Shenyang.China Professor
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Institute of Metal Research
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Academia Sinica
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Shenyang 110015
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China
金属学报(英文版)
The characteristic of interface depending on the atomic structure exerts an inportant,and sometime controlling,influence on performance of the interacial materials. The present paper reviews the main studies on fine structure of both the materials inter- faces and interfacial reaction products in semiconductor uperlattice,metal multilayer ceram- ics and composite materials by mean of selected area electron doffraction patterns and high resolution electron microscopy. The following features of interfaces are reviewed:the orientation relationships;the char- acteristic of steps,facets and ronghness of interfaces;atomic bonding across the interface;the degree of coherency,the structure of misfit dislocations and elastic relaxations at the inter- faces:the presence of defects at the onterfaces:the structure of the interfacial reaction prod- ucts as well as the reaction kinetics and reaetion mechanism.
关键词:
fine structure of the interfaces
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高建杰
,
汤文明
,
吴玉程
,
郑治祥
材料热处理学报
使用扫描电子显微镜、电子能谱仪、X射线衍射等研究了在N_2气氛中1150℃×10 h等温热处理的Si_3N_4/Ni,Si_3N_4/Ni_3Al平面偶界面固相反应区的形貌、成分分布、显微结构及相组成.结果表明:Si_3N_4/Ni界面固相反应形成约20 μm厚的反应区,反应区主要由Ni_3Si构成,其中分布着大量细密的孔洞;而Si_2N_4/Ni_3Al界面固相反应形成约2 μm厚的反应区,反应区具有比Ni_3Al高得多的Al含量,反应区由NiAl及Ni_3Si构成.Si_3N_4/Ni_3Al具有比Si_3N_4/Ni高得多的界面化学相容性.
关键词:
Si_3N_4
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Ni_3Al
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界面固相反应
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显微结构
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相组成
