任建世
,
张功杼
,
王桢枢
,
刘根
,
刘圣麟
金属学报
在恒定气压和电压条件下,用测量溅射减量的方法,系统研究了Cr—Fe,Bi-Sb,Cu—Zn,Ag—Cu,Al-Zn和Cd—Sn六个系统的25个试样在辉光放电灯中溅射率与组分的关系结果表明;阴极溅射在稳态时,二元合金(不形成金属间化合物)的溅射率与组元浓度的普遍关系是双曲线,只有在某些特殊情况下,两组元的溅射率相差不大时,可以近似看成线性关系。
关键词:
二元合金
,
glow discharge
,
binary alloy
,
sputtering rate
F.Chen
金属学报(英文版)
A new net-shape cathode sputtering target which has a simple structure and a high sputtering was put forward. The multiple-structure made of alloying and coating layers of tantalum was achieved on the surface of TC4 (Ti6AI4V) using this method in double glow surface alloying process. The tantalized samples were investigated by SEM, XRD and electrochemical corrosion method .Results show the complicated tissue of pure tantalizing layer and diffusion layer was successfully formed on the surface of TC4 with the method of net-shape cathode glow discharge, which further improved the corrosion-resistance of TC4 and formed good corrosion-resistant alloys.
关键词:
TC4 (Ti6AI4V)
,
null
,
null
