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Chemical composition and Mott-Schottky analysis of passive film formed on G3 alloy in bicarbonate/carbonate buffer solution

Dangguo LI

金属学报(英文版)

The chemical composition and semi-conductive properties of passive film on nickel-based alloy (G3 alloy) in bicarbonate/carbonate buffer solution were investigated by Auger spectroscopy (AES), X-ray photoelectron spectroscopy (XPS), electrochemical impedance spectra (EIS) and Mott-Schottky plot. AES and XPS results showed that the passive film appeared double-layer, in which the inner film was composed of nickel oxide, the mixed nickel-chromium-molybdenum-manganese oxides were the major component of the outer film. The electrochemical results revealed that the factors including frequency, potential, time, temperature and pH value can affect the semi-conductive property, the doping densities decreased with increasing potential and pH value, prolonging time, and decreasing temperature. According to the above results, it can be concluded that the film protection on the substrate enhanced with increasing potential and pH value, prolonging time, and decreasing temperature.

关键词: Nickel-based alloy , 俄歇分析 , X-射线光电子能谱 , 电化学阻抗谱 , Mott-Schottky曲线

Ni-Mo合金电沉积层的X-射线光电子能谱研究

黎向锋 , 左敦稳 , 王珉

电镀与精饰 doi:10.3969/j.issn.1001-3849.1999.04.002

利用X-射线光电子能谱对Ni-Mo沉积层表层中Ni、Mo的存在形式进行了分析,并对其表面进行了Ar+离子刻蚀深度分析.结果表明:Ar+离子未溅射时,沉积层中的Ni和Mo分别以Ni(OH)2和MoO3(或MoO2-4)形式存在:Ar+离子溅射3 min后,沉积层中的Ni和Mo分别以NiO和MoO2形式存在;Ar+离子溅射15 min后,沉积层中的Ni和Mo分别以单质Ni和单质Mo形式存在.

关键词: X-射线光电子能谱 , 沉积层 , Ni-Mo

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