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X-ray Photoelectron Spectroscopy Studies of TixAl1-xN Thin Films Prepared by RF Reactive Magnetron Sputtering

Rui XIONG , Jing SHI

材料科学技术(英文)

TixAl1-xN films have been prepared by RF reactive magnetron sputtering. X-ray diffraction results showed that TixAl1-xN thin films in this study were hexagonal wurtzite structure with the Ti content up to 0.18. X-ray photoelectron spectrocopy studies provided that the N1s core-electron spectrum of TixAl1-xN thin film brodend with increasing Ti content, and the difference of the chemical shifts for Ti2p3/2 line between TiN and TixAl1-xN thin film was 0.7 eV.

关键词: TixAl1-xN films , null , null

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