李世直
,
徐翔
金属学报
采用直流等离子体化学气相沉积技术,在高速钢、Si(100)和Si(111)基体上沉积TiN膜,并对膜的晶体结构、表面形貌、断口结构、显微硬度、氯含量等进行了测定和分析,部分样品进行了二次离子质谱(SIMS)、Auger谱(AES)和X光光电子谱(ESCA)等分析.试验表明:在不同基材上沉积的TiN膜,只要沉积参数相同,膜的结构和性能都相同.在沉积温度500℃左右,TiN膜的生长方式有一转变,即可能是由层生长转变为岛状生长.直流PCVD法生成的TiN膜,其N:Ti≈1:1,有强的(200)织构,膜与基体间有较宽的共混区,因而结合强度高和耐磨性好,适于用作耐磨镀层.
关键词:
等离子体化学气相沉积
,
TiN film
ZHOU Jiankun LIU Xianghuai CHEN Youshan WANG Xi ZHENG Zhihong HUANG Wei ZOU Shichang Shanghai Institute of Metallurgy
,
Academia Sinica
,
Shanghai
,
China
金属学报(英文版)
The TiN films were synthesized with an alternate process of depositing titanium from a E-gun evaporation source and 40 keV N~+ bombarding onto the target.It is shown from the composi- tion analysis and structure investigations using RBS,AES,TEM,XPS and X-ray diffraction spectrum that the formed fihns are mainly composed of TiN phase with grain size of 30—40 nm and without preferred orientation,the nitrogen content in the film is much less than that in case without N~+ bombarding,and an intermixed region about 40 nm thick exists between the film and the substrate.The films exhibt high microhardness and low friction. ZHOU Jiankun,Ion Beam Laboratory,Shanghai Institute of Metallurgy,Academia Sinica, Shanghai 200050,China
关键词:
TiN film
,
null
赵程
,
彭红瑞
,
李世直
金属学报
用XPS,AES,XRD,SEM及显微硬度计分析和测试了不同成分的等离子体化学气相沉积(PCVD)Ti—N—C膜,并与PCVD一TiN膜比较。认为:Ti—N—C膜优异的耐磨性可归因于高显微硬度及致密的结构。AES及XPS分析结果表明,Ti—N—C与TiN膜表面吸附的氧原子价态不同,其决定因素是膜晶格中是否有足够的碳原子存在。氧吸附态的不同可能导致不同的磨损失效方式。
关键词:
等离子体化学气相沉积(PCVD)
,
Ti-N-C film
,
TiN film
王曦
,
周建坤
,
陈酉善
,
柳襄怀
,
邹世昌
金属学报
本文建立了一个适用于描述离子束增强沉积(Ion Beam Enhanced Deposition,即IBED)过程的Monte-Carlo计算机模拟程序。程序由离子注入计算和蒸发沉积计算两大部分组成。离子注入计算以二体碰撞近似为基础,以随机固体为靶模型,对入射离子和所有反冲原子的力学运动进行跟踪。程序中考虑了沉积原子对靶室中某些残余气体分子的吸附;还表达了靶的组份及密度在IBED过程中的不断变化,从而实现了靶的动态化。该程序可以提供IBED薄膜组份的深度分布、界面混合以及能量沉积等信息。计算结果表明,在IBED氮化钛薄膜中,Ti沉积速率对薄膜组份有很大影响。当沉积速率较低时,薄膜组份基本与注入离子和沉积原子的到达率比(N/Ti)无关。膜与基体间的混合层厚度随离子原子到达率比(N/Ti)增加而增加。计算结果与实验测试结果符合很好。
关键词:
离子束增强沉积
,
TiN film
,
computer simulation
Kewei XU Jiawen HE Huijiu ZHOU Research Institute for Strength of Metals
,
Xi'an Jiaotong University
,
Xi'an
,
710049
,
China
材料科学技术（英文）
The measurement of internal stresses in a PACVD TiN film proved experimentally to be difficult by a conventional X-ray diffraction technique.The linear relationship between 2θ and sin~2(?) could hardly be reached in some cases.Nevertheless.a good confirmation between the variation of FWHM-sin~2(?) and 20-sin~2(?) was revealed for every nonlinear forms.It followed that the effect of nondistributed micro-strains might exist in plasma assisted vapor deposited films,which usually have a strong crystal orientation,and the method of effectively separating macro-stress and micro-strain must be applied for the precise determination of internal stresses in PACVD films.
关键词:
TiN film
,
null
,
null
LIU Changqing
,
LI Meishuan
,
JIN Zhujing
,
WU Weitao Corrosion Science Laboratory
,
Institute of Corrosion and Protection of Metals
,
Academia Sinica
,
Shenyang
,
China research assistant
,
Institute of Corrosion and Protection of Metals
,
Academia Sinica
,
Shenyang 110015
,
China
金属学报(英文版)
The cantilever bending test,particularly monitored by an acoustic emission technique, was adopted to measure the tensile and interfacial adhesive strengths of the HCD ion plated fine TiN film on pure Ti substrate.The behaviors of film damaging were found to be characterized by:an internal tensile stress which exceeded its tensile strength for TiN facing upward,and a shearing stress along film substrate interface which exceeded its adhesive strength for TiN facing downward.The measured tensile and adhcsive strengths are 603 and 242 MPa respectively.
关键词:
tensile strength
,
null
,
null
,
null
高原
,
韦文竹
,
袁琳
,
陈选楠
,
王成磊
,
陆小会
,
张焱
,
吴炜钦
,
张光耀
材料热处理学报
对低碳钢表面进行等离子铬镍共渗,在4Cr13不锈钢表面沉积氮化钛薄膜.对两种强化层及其基体进行电化学腐蚀性能测试.结果表明:在1 mol/L的H2SO4溶液中,铬镍共渗试样的耐腐蚀程度和氮化钛薄膜的相当,是4Cr13不锈钢试样的90倍,是低碳钢试样的120倍；在1 mol/L的NaOH溶液中,铬镍共渗试样的耐腐蚀性是4Cr13不锈钢试样的0.67倍,是低碳钢试样4.67倍,是氮化钛薄膜的3.67倍；在3.5％的NaCl溶液中,铬镍共渗试样的耐腐蚀性是低碳钢试样的2.3倍,是氮化钛薄膜的0.167倍,是4Cr13不锈钢试样的0.33倍.
关键词:
铬镍共渗
,
氮化钛薄膜
,
不锈钢
,
点蚀
,
腐蚀
王艳
稀有金属材料与工程
选用Ti6Al4V合金作为基体材料,并对其进行N+注入以及非平衡磁控溅射TiN膜制得两种改性试样,借助Phillips X'Pert型X射线衍射仪、扫描电子显微镜(SEM)及台阶仪等表征试样及考察改性层的冲击磨损行为,研究认为:在反复冲击载荷作用下,两试样均出现了疲劳磨损现象,但N+注入试样的磨损机制主要是点蚀及疲劳剥落；而TiN膜的磨损机制主要是剥层失效并伴有一定的磨粒磨损；试样的抗冲击磨损性能受多因素制约,如膜层硬度,膜-基结合强度、膜层韧性等.
关键词:
N+注入
,
非平衡磁控溅射
,
TiN膜
,
冲击磨损
,
磨损行为
杜军
,
王红美
,
王鑫
表面技术
doi:10.16490/j.cnki.issn.1001-3660.2015.09.022
目的：研究划痕法测试参数对临界失效载荷的影响,以便更准确地测定硬质薄膜的结合强度。方法采用磁控溅射技术在304不锈钢和Si片上制备氮化钛( TiN )薄膜。采用扫描电镜观察薄膜的截面形貌和厚度,采用纳米压入法测试薄膜的硬度,采用划痕法测试薄膜的结合强度,研究不同划痕长度、划动速率和加载速率对临界载荷的影响。结果所制备TiN薄膜致密,厚度约2μm,纳米压入硬度约2300HV,TiN/304不锈钢体系为硬膜软基体。相同加载载荷(10 N)和划动行程(3 mm)条件下,增加划动速率(1~3 mm/min),导致首次声发射信号延迟；相同加载载荷(10 N)和划动速率(3 mm/min)条件下,随着划动行程的增加(3~9 mm),第三、四类失效模式逐渐减弱。结论采用划痕法测定结合强度时,应该以划痕形貌同时出现第一到第四模式时判断失效,并且对应典型声发射信号为参考；合理的测试参数范围,可重复出现临界载荷值。制备的TiN薄膜声发射信号存在共同的临界特征值4.9 N,结合划痕形貌特征,判定其结合强度值为4.9 N。
关键词:
磁控溅射
,
TiN薄膜
,
结合强度
,
划痕法
,
声发射
,
失效模式
