C.C. Zhang
,
C.S. Yang
,
G.F. Ding
,
S.Q. Qian
,
J.S. Wu
金属学报(英文版)
Microstructure and phase transformation behaviors of the film annealed at different temperatures were studied by X-ray diffractometry (XRD), transmission electron microscopy and differential scanning calorimeter (DSC). Also tensile tests were examined. For increasing annealed temperature, multiple phase transformations, transformations via a B19-phase or direct martensite/austenite transformation are observed. The TiNiPd thin film annealed at 750℃ had relatively uniform martensite/austenite transformation and shape memory effect. Martensite/austenite transformation was also found in strain-temperature curves. Subsequent annealing at 450℃ had minor effect on transformation temperatures of Ti-Ni-Pd thin films but resulted in more uniform transformation and improved shape memory effect.
关键词:
Ti-Ni-Pd thin films
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