{"currentpage":1,"firstResult":0,"maxresult":10,"pagecode":5,"pageindex":{"endPagecode":5,"startPagecode":1},"records":[{"abstractinfo":"用渗铝-内氧化技术制备了Al2O3表面弥散铜基导电材料,研究了渗铝层的铝浓度分布和表面弥散层的显微组织及有关性能.结果表明,渗层的铝浓度接近渗剂中铝粉的含量,渗层深度可达100μm,内氧化后,能在渗铝层形成A12O3弥散硬化层,Al2O3含量也影响了铜的表面硬度、电阻率和磨损抗力.\n","authors":[{"authorName":"石子源","id":"665ef4a1-7daf-4af4-8e12-d74a4f7ac57e","originalAuthorName":"石子源"},{"authorName":"王德庆","id":"8d643fe3-1857-469e-8c11-bfe6407cd1c9","originalAuthorName":"王德庆"}],"doi":"","fpage":"381","id":"7abc92e0-5edb-4046-9674-fccd2f725ca7","issue":"4","journal":{"abbrevTitle":"GNCL","coverImgSrc":"journal/img/cover/GNCL.jpg","id":"33","issnPpub":"1001-9731","publisherId":"GNCL","title":"功能材料"},"keywords":[{"id":"bea9c853-c692-43e5-b2b6-db61286e59c2","keyword":"渗铝","originalKeyword":"渗铝"},{"id":"b6aa19d1-7f1c-45e0-ab5c-120728d4006d","keyword":"内氧化","originalKeyword":"内氧化"},{"id":"0ec213de-51cf-45f5-861d-80122a936702","keyword":"表面弥散","originalKeyword":"表面弥散"},{"id":"2c1f16c2-ccb0-43ef-9249-c11fa203fa36","keyword":"导电材料","originalKeyword":"导电材料"}],"language":"zh","publisherId":"gncl200204012","title":"Al2O3表面弥散铜基导电材料的制备","volume":"33","year":"2002"},{"abstractinfo":"以 Cu2O为氧化剂,在氩气保护下对不同 w(Al)的 Cu-Al合金表面进行弥散强化(内氧化温度为 1 123~ 1 273 K,保温时间 10~ 96 h),并对内氧化层的组织形貌进行了研究.结果表明, w(Al)的多少直接影响内氧化层的厚度、组织形貌及硬度和导电率, Cu-Al合金的内氧化动力学曲线呈抛物线变化规律.","authors":[{"authorName":"李红霞","id":"e887365d-c67c-45f3-bab5-f1eab55f304b","originalAuthorName":"李红霞"},{"authorName":"田保红","id":"9cde49a7-fd88-4ca4-8e94-bb269b9bae72","originalAuthorName":"田保红"},{"authorName":"宋克兴","id":"715e02f2-89c7-4482-bdc2-e44f51fa89dd","originalAuthorName":"宋克兴"},{"authorName":"刘平","id":"1e9a5952-beaf-41bf-9603-09c9fc408fed","originalAuthorName":"刘平"}],"doi":"10.3969/j.issn.1004-244X.2005.02.014","fpage":"44","id":"4e7395e2-75d6-4502-b607-f97ccbcadfbc","issue":"2","journal":{"abbrevTitle":"BQCLKXYGC","coverImgSrc":"journal/img/cover/BQCLKXYGC.jpg","id":"4","issnPpub":"1004-244X","publisherId":"BQCLKXYGC","title":"兵器材料科学与工程 "},"keywords":[{"id":"618ecb36-dfeb-4bf1-bd03-e202109e437d","keyword":"弥散强化","originalKeyword":"弥散强化"},{"id":"71dba19e-7c65-4e47-85e9-fdb6e9e7c077","keyword":"Cu-Al合金","originalKeyword":"Cu-Al合金"},{"id":"13dff1e8-4a89-4bfd-b3b9-eaa7b8e6a5b4","keyword":"内氧化","originalKeyword":"内氧化"},{"id":"5a82373e-1584-433c-afee-b27ed9b99404","keyword":"逆扩散","originalKeyword":"逆扩散"}],"language":"zh","publisherId":"bqclkxygc200502014","title":"内氧化法制备表面弥散强化铜合金的组织与性能","volume":"28","year":"2005"},{"abstractinfo":"以Cu2O为氧化剂,在氩气保护下用内氧化技术对不同低Al含量的Cu-Al合金表面进行了弥散强化处理(内氧化温度为1123~1273K,保温时间10~96h),研究了硬化层的组织形貌及性能.用Wagner高温氧化理论分析了铝含量、工艺参数与内氧化层深及内氧化速度之间的定量关系.结果表明:试样表面通过内氧化后,固溶在Cu基体内部的Al以Al2O3形态从基体析出,基体纯化,导电率提高.同时铜基体中弥散分布的纳米级的Al2O3颗粒强化了铜基体,使硬度及磨损抗力提高.Al含量的多少直接影响内氧化层的厚度、组织形貌及硬度和导电率,Cu-Al合金的内氧化动力学曲线呈抛物线变化规律.","authors":[{"authorName":"李红霞","id":"d1749807-e15f-4f98-9a8b-189565b5f37f","originalAuthorName":"李红霞"},{"authorName":"田保红","id":"f5448cbd-991c-43bb-989b-08928d298b6c","originalAuthorName":"田保红"},{"authorName":"宋克兴","id":"f04a7f0b-bd94-4f5d-9942-85339d023cd5","originalAuthorName":"宋克兴"},{"authorName":"刘平","id":"92030cf9-ed06-4449-b670-3c81339204c3","originalAuthorName":"刘平"}],"doi":"10.3969/j.issn.1009-6264.2005.02.023","fpage":"94","id":"e7053115-e323-4e39-a81b-d9a30a720bc2","issue":"2","journal":{"abbrevTitle":"CLRCLXB","coverImgSrc":"journal/img/cover/CLRCLXB.jpg","id":"15","issnPpub":"1009-6264","publisherId":"CLRCLXB","title":"材料热处理学报"},"keywords":[{"id":"2e88a302-7e5c-464b-8904-003b07dbde68","keyword":"弥散强化","originalKeyword":"弥散强化"},{"id":"123913de-1a68-429b-8e13-74ff2d51b63f","keyword":"Cu-Al合金","originalKeyword":"Cu-Al合金"},{"id":"d1b7f206-0266-46d7-8958-d14ce8be8a44","keyword":"内氧化","originalKeyword":"内氧化"},{"id":"484854b9-25b4-413b-916d-a33f61342fcb","keyword":"逆扩散","originalKeyword":"逆扩散"}],"language":"zh","publisherId":"jsrclxb200502023","title":"低铝含量Cu-Al合金的表面弥散强化及其性能","volume":"26","year":"2005"},{"abstractinfo":"研究了不同氧化铝含量弥散铜中弥散相特征与其性能的关系.结果表明,低氧化铝含量的弥散铜中纳米相颗粒粒度均匀、弥散分布,颗粒间距较大.该材料塑性好,加工硬化速度慢.中等氧化铝含量的弥散铜纳米相粒度均匀、弥散分布,颗粒间距小,加工硬化速度快.高氧化铝含量弥散铜的纳米相存在多种形貌,且分布的均匀性差,材料难以加工.","authors":[{"authorName":"王永朝","id":"c86630b6-699d-4857-8967-3c023508874c","originalAuthorName":"王永朝"},{"authorName":"刘国元","id":"ac8f4673-8f5e-45ab-ac9a-82c6d0234726","originalAuthorName":"刘国元"},{"authorName":"付自来","id":"6f550010-0078-4b57-9646-b34faa0589b0","originalAuthorName":"付自来"},{"authorName":"陈会东","id":"b8d42006-2ed6-40fd-a237-5acc359230b1","originalAuthorName":"陈会东"},{"authorName":"雷竹芳","id":"63f3cb06-c1d3-41f5-82b7-3529c1f5ad7b","originalAuthorName":"雷竹芳"},{"authorName":"李文甫","id":"a83a9e6d-8f85-4fed-9fe6-6f170250f20b","originalAuthorName":"李文甫"}],"doi":"","fpage":"27","id":"295af8aa-c650-4b39-9c4a-a51d2c318d44","issue":"4","journal":{"abbrevTitle":"CLKFYYY","coverImgSrc":"journal/img/cover/CLKFYYY.jpg","id":"10","issnPpub":"1003-1545","publisherId":"CLKFYYY","title":"材料开发与应用"},"keywords":[{"id":"388e80ec-5964-4991-9d57-69bb4ba6101f","keyword":"铜合金","originalKeyword":"铜合金"},{"id":"af86d76f-ef95-4a93-855a-b7dc92fc4d54","keyword":"弥散强化铜","originalKeyword":"弥散强化铜"},{"id":"86dfafbb-a939-4877-a221-0c038ad1239b","keyword":"弥散相","originalKeyword":"弥散相"},{"id":"96e624bb-cd51-47a7-8527-11fe02aada20","keyword":"纳米氧化铝","originalKeyword":"纳米氧化铝"}],"language":"zh","publisherId":"clkfyyy201204007","title":"弥散强化铜弥散相特征与其性能的关系","volume":"27","year":"2012"},{"abstractinfo":"弥散强化Pt合金的成功开发与应用是20世纪铂合金材料发展最重要的成就.评述了以碳化物和氧化物弥散强化Pt和Pt合金的发展和制备技术、弥散强化Pt合金的结构特征以及弥散强化Pt合金的室温和高温性能,讨论了弥散强化Pt合金的强化机制.","authors":[{"authorName":"宁远涛","id":"a6b6d11a-6109-40ed-a6be-dade915ba59f","originalAuthorName":"宁远涛"}],"doi":"10.3969/j.issn.1004-0676.2010.02.014","fpage":"60","id":"e1a2f4e5-837c-4c5e-9c60-712aec68a017","issue":"2","journal":{"abbrevTitle":"GJS","coverImgSrc":"journal/img/cover/GJS.jpg","id":"38","issnPpub":"1004-0676","publisherId":"GJS","title":"贵金属"},"keywords":[{"id":"a857c91f-6778-475b-98b2-6657899c10a6","keyword":"金属材料","originalKeyword":"金属材料"},{"id":"1d455b36-6037-4ecc-aba7-4a300f70b2ea","keyword":"弥散强化Pt合金","originalKeyword":"弥散强化Pt合金"},{"id":"3c6b3204-f1f1-4e42-8d60-efcfbd73c384","keyword":"结构","originalKeyword":"结构"},{"id":"0fc43740-3efd-42fa-9b1a-a02b4e7ef69c","keyword":"性能","originalKeyword":"性能"},{"id":"8d8f2d47-2b3a-47f4-ba32-59b0bc8dcc24","keyword":"制备技术","originalKeyword":"制备技术"},{"id":"e245a784-3c71-4a9f-a834-d32e1ca876b1","keyword":"强化机制","originalKeyword":"强化机制"}],"language":"zh","publisherId":"gjs201002014","title":"弥散强化型铂基高温合金","volume":"31","year":"2010"},{"abstractinfo":"用透射电镜(TEM)、高分辨电镜(HRTEM)观察了Al2O3弥散强化铜合金的微观结构,并分析了影响弥散相大小及分布的因素.用X射线衍射仪精确测定了Cu基体的衍射峰位置,依据衍射峰的位置变化探讨了Al脱溶及Al2O3质点的析出过程.结果表明:用内氧化法制备弥散强化铜合金时,Al2O3质点在内氧化阶段析出,且Al充分脱溶,内氧化反应进行得很彻底;合金在烧结和热挤压阶段都没有质点析出.合金中Al2O3质点均匀弥散地分布在晶界和晶粒内,并且晶粒内质点比晶界质点更细小、弥散,大小约5nm,间距10nm,晶界处的质点大小约10nm,间距约50nm.","authors":[{"authorName":"陆艳杰","id":"e554f13d-7c00-4b60-b20e-d9c9318f29c0","originalAuthorName":"陆艳杰"},{"authorName":"崔舜","id":"3b536c98-d59c-45ba-ab56-2c80c0294508","originalAuthorName":"崔舜"},{"authorName":"康志君","id":"b3d7384c-acaa-4404-b2a6-e492dbb2b181","originalAuthorName":"康志君"},{"authorName":"周文洪","id":"01b212d5-f62b-4c3f-947c-6a3f63b22c21","originalAuthorName":"周文洪"}],"doi":"","fpage":"219","id":"23bafeef-753c-46be-8c4b-dce9354dca23","issue":"z1","journal":{"abbrevTitle":"CLDB","coverImgSrc":"journal/img/cover/CLDB.jpg","id":"8","issnPpub":"1005-023X","publisherId":"CLDB","title":"材料导报"},"keywords":[{"id":"de0f82c4-bab4-44cb-a6d5-6c0677a1b4fc","keyword":"弥散强化","originalKeyword":"弥散强化"},{"id":"10b7ca46-4d77-459e-85f6-0393d2133bdd","keyword":"铜合金","originalKeyword":"铜合金"},{"id":"48ef4fce-9fc0-4e6d-ad0f-6be2a5ee9f4e","keyword":"微观结构","originalKeyword":"微观结构"},{"id":"f6838ce6-be13-4562-82e9-ae40bd0091f2","keyword":"内氧化","originalKeyword":"内氧化"}],"language":"zh","publisherId":"cldb2006z1071","title":"弥散强化铜合金中弥散相的观察及析出过程","volume":"20","year":"2006"},{"abstractinfo":"弥散强化铜具有高强、高导、耐热的特性,是综合性能最好的一类铜合金.比较了原位与非原位制备弥散铜的性能,总结了影响弥散强化铜性能的因素,综述了目前具有产业化前景的原位方法制备弥散铜,最后介绍了弥散强化铜的应用领域.","authors":[{"authorName":"燕鹏","id":"6e4986a5-1e23-452d-8e62-6e15b593cb59","originalAuthorName":"燕鹏"},{"authorName":"林晨光","id":"ac46dae0-cdbd-4f90-bdc1-cb33e97f77e1","originalAuthorName":"林晨光"},{"authorName":"崔舜","id":"b93687e2-61b3-469a-9b10-452a9f0dd11b","originalAuthorName":"崔舜"},{"authorName":"周增林","id":"5327d1a8-5972-490a-b1c8-e41e09b5ea0a","originalAuthorName":"周增林"},{"authorName":"李明","id":"6ea4239e-7c86-4ecd-bf53-c645d3c591b2","originalAuthorName":"李明"},{"authorName":"陆艳杰","id":"37f9fc94-7f77-4d06-bca0-d06677b40d2f","originalAuthorName":"陆艳杰"},{"authorName":"李增德","id":"a079da05-f254-4508-b0cd-fd742f2c93c9","originalAuthorName":"李增德"},{"authorName":"雷虎","id":"e36bb0bf-f8e8-48a3-8e65-6a2b29d7fd67","originalAuthorName":"雷虎"}],"doi":"","fpage":"101","id":"1253421a-b23d-4f3a-8680-3c5fcd68fc33","issue":"11","journal":{"abbrevTitle":"CLDB","coverImgSrc":"journal/img/cover/CLDB.jpg","id":"8","issnPpub":"1005-023X","publisherId":"CLDB","title":"材料导报"},"keywords":[{"id":"85829c2b-fcef-485b-aede-d2cdfc79a137","keyword":"弥散强化铜","originalKeyword":"弥散强化铜"},{"id":"401fb0ae-ef68-4f8f-bc2f-1e8111696a0c","keyword":"原位制备","originalKeyword":"原位制备"},{"id":"2f97579c-5c58-425c-abdf-38d5275f545b","keyword":"应用领域","originalKeyword":"应用领域"}],"language":"zh","publisherId":"cldb201111021","title":"弥散强化铜合金的研究与应用现状","volume":"25","year":"2011"},{"abstractinfo":"采用碱洗除去铝箔表面的富铅层,在其表面沉积出高度弥散的锡晶核,通过扫描电镜观察铝箔表面沉积锡晶核的分布,并对铝箔腐蚀后的表面形貌以及对腐蚀孔孔径大小进行统计。结合极化曲线测量铝箔的腐蚀电位,研究电沉积弥散锡晶核对高压阳极铝箔电解腐蚀特性的影响。结果表明:沉积锡晶核的电流密度越大,铝箔表面得到的锡晶核面密度越高,晶核越细小;弥散的锡晶核能够和铝基体组成腐蚀微电池,有效地引导铝箔腐蚀发孔,提高铝箔发孔的均匀性,从而提高铝箔的比电容;相对于表面富铅的铝箔,电沉积弥散锡晶核的铝箔表面微电池数量显著下降,使得腐蚀电位提高,铝箔表面未沉积锡晶核处表面活性低,从而导致铝箔的腐蚀减薄减少。","authors":[{"authorName":"彭宁","id":"a7396151-2608-4c13-b470-e9ddd7cb71b6","originalAuthorName":"彭宁"},{"authorName":"何业东","id":"775c00d7-9929-4853-8131-0eb7a4e63077","originalAuthorName":"何业东"},{"authorName":"宋洪洲","id":"0ec890d6-e892-4843-b183-437af552a419","originalAuthorName":"宋洪洲"},{"authorName":"杨小飞","id":"6302d30c-48fd-44b8-9fa9-60cde1212215","originalAuthorName":"杨小飞"},{"authorName":"蔡小宇","id":"a664bf84-f66c-496c-a35a-5032c427b002","originalAuthorName":"蔡小宇"}],"doi":"","fpage":"3367","id":"e2fbb95f-97eb-49ad-a127-ea22376ccf4e","issue":"12","journal":{"abbrevTitle":"ZGYSJSXB","coverImgSrc":"journal/img/cover/ZGYSJSXB.jpg","id":"88","issnPpub":"1004-0609","publisherId":"ZGYSJSXB","title":"中国有色金属学报"},"keywords":[{"id":"58d8cf0f-ae91-4fea-b6f5-26c18ce87ac9","keyword":"电解电容器","originalKeyword":"电解电容器"},{"id":"b520d35b-f619-4306-a7b5-066bca6c462e","keyword":"高压铝箔","originalKeyword":"高压铝箔"},{"id":"e54ed874-57cd-4bed-9e15-21203cb7c80f","keyword":"锡晶核","originalKeyword":"锡晶核"},{"id":"3b895c43-498c-4fb4-8196-5cade5930469","keyword":"比电容","originalKeyword":"比电容"}],"language":"zh","publisherId":"zgysjsxb201312015","title":"电沉积弥散锡晶核对高压阳极铝箔电解腐蚀特性的影响","volume":"","year":"2013"},{"abstractinfo":"弥散强化铂基材料是一种先进的结构型与高温型贵金属复合材料,并且是玻璃纤维漏板材料发展的主要方向.综述了弥散强化铂基材料的制备方法及其优缺点,总结了目前弥散强化铂基材料中存在的固溶强化、晶界强化及弥散强化的强化机理及其研究进展,介绍了弥散强化铂基材料的组织结构特点及其蠕变特征、常温高温下的主要性能、应用以及新的发展动向,为弥散强化铂基材料的选择、研究以及工业化应用提供了参考依据.","authors":[{"authorName":"张吉明","id":"84d4eaca-e18a-4a5a-a3cf-0686de417395","originalAuthorName":"张吉明"},{"authorName":"耿永红","id":"1f287e39-1819-4f9f-84af-2446390b26ac","originalAuthorName":"耿永红"},{"authorName":"陈松","id":"a5f3e1e0-2657-4c4c-874a-510a1b7851b9","originalAuthorName":"陈松"},{"authorName":"管伟明","id":"209cc8b0-4573-4bee-b47e-d1bcd438a2c5","originalAuthorName":"管伟明"},{"authorName":"张昆华","id":"5d21c5ad-1163-47c2-816f-9d92675b10ed","originalAuthorName":"张昆华"}],"doi":"","fpage":"58","id":"e1d23e1d-fe99-4190-8924-8d9fa2fa951c","issue":"3","journal":{"abbrevTitle":"CLDB","coverImgSrc":"journal/img/cover/CLDB.jpg","id":"8","issnPpub":"1005-023X","publisherId":"CLDB","title":"材料导报"},"keywords":[{"id":"3f427843-0df8-41de-943e-c35cf7017769","keyword":"铂基材料","originalKeyword":"铂基材料"},{"id":"ad9457f5-d073-47db-95af-a563c36443e7","keyword":"固溶强化","originalKeyword":"固溶强化"},{"id":"e2e4750a-a8a6-4706-bece-8c53ca17315c","keyword":"晶界强化","originalKeyword":"晶界强化"},{"id":"f0676a66-4df5-4df9-af50-601d570a5101","keyword":"弥散强化","originalKeyword":"弥散强化"}],"language":"zh","publisherId":"cldb200903013","title":"弥散强化铂基材料的研究现状","volume":"23","year":"2009"},{"abstractinfo":"从组分设计出发,详细阐述了弥散颗粒和合金元素的种类、含量及微观结构对材料性能的影响.介绍了机械合金化法、内氧化法、化学沉淀法和溶胶-凝胶法制备弥散强化铜合金的工艺过程和特点.指出了未来弥散强化铜合金组分设计和制备工艺研究中应关注的焦点问题及研究方向.","authors":[{"authorName":"李斌","id":"cfc382c9-8b8a-4f35-88a4-7138e68f07d5","originalAuthorName":"李斌"},{"authorName":"刘贵民","id":"b0a766ff-9b6a-4e5b-9959-2f208780a88b","originalAuthorName":"刘贵民"},{"authorName":"丁华东","id":"1b0be153-5178-495c-8c28-bf93bacc229f","originalAuthorName":"丁华东"},{"authorName":"雍青松","id":"c03484d5-fa37-47e1-a432-fb2621040dc1","originalAuthorName":"雍青松"},{"authorName":"郑晓辉","id":"2cd831f8-9e1c-48b9-ab33-0dc398ea54b4","originalAuthorName":"郑晓辉"}],"doi":"","fpage":"107","id":"213cf29f-f203-47fe-b8ff-45ad9cf873fe","issue":"17","journal":{"abbrevTitle":"CLDB","coverImgSrc":"journal/img/cover/CLDB.jpg","id":"8","issnPpub":"1005-023X","publisherId":"CLDB","title":"材料导报"},"keywords":[{"id":"370ff525-1506-4aaf-a2e2-de886a1414a1","keyword":"弥散强化","originalKeyword":"弥散强化"},{"id":"29eea09a-fb59-442c-8091-da6fe0a6ef3b","keyword":"铜合金","originalKeyword":"铜合金"},{"id":"2e1a1243-202f-44b6-a5bf-f7a6e7937311","keyword":"组分设计","originalKeyword":"组分设计"},{"id":"0cc9a197-2241-4d29-8385-1f214a514a38","keyword":"制备工艺","originalKeyword":"制备工艺"}],"language":"zh","publisherId":"cldb201217022","title":"弥散强化铜合金的研究现状","volume":"26","year":"2012"}],"totalpage":4677,"totalrecord":46767}