张学华
,
曹猛
,
王明霞
,
刘桐
,
李德军
金属功能材料
doi:10.3969/j.issn.1005-8192.2007.01.007
本研究选择钽和铌的氮化物作为个体层材料,利用FJL560CI2型超高真空射频磁控与离子束联合溅射系统制备TaN、NbN及-系列的TaN/NbN多层薄膜.通过XRD和纳米力学测试系统以及摩擦磨损仪分析了该体系合成以后的晶体结构,以及调制周期对机械性能的影响.结果表明:多层膜的纳米硬度值普遍高于两种个体材料混合相的硬度值;当调制周期为8.5 nm时,TaN/NbN多层膜达到最大硬度30 GPa,结晶出现多元化,多层膜体系的硬度、应力、弹性模量以及膜-基结合性能均达到最佳效果.
关键词:
射频磁控溅射
,
TaN/NbN多层膜
,
调制周期
,
硬度
Xuehua ZHANG
,
Yuanbin KANG
,
Sipeng LIU
,
Qiang LI
,
Ying YANG
材料科学技术（英文）
TaN/NbN multilayered coatings with nanoscale bilayer periods were synthesized at different Ar/N2 flow rate by r.f. magnetron sputtering. XRD and nano indenter were employed to investigate the influence of Ar/N2 flow rate on microstructure and mechanical properties of the coatings. The low-angle XRD pattern indicated a well-defined composition modulation and layer structure of the multilayered coating. All multilayered coatings almost revealed higher hardness than the rule-of-mixtures value of monolithic TaN and NbN coatings. At FAr:FN2 =10, the multilayered coating possessed excellent hardness, elastic modulus, internal stress, and fracture resistance, compared with ones synthesized at other Ar/N2 flow rates. The layered structure with strong mixture of TaN (110), (111), (200) and Nb2N (101) textures should be related to the enhanced mechanical properties.
关键词:
RF magnetron sputtering
,
TaN/NbN多层膜
,
纳米尺度
