材料期刊网

Effect of Deposition Temperature on Dynamics and Mechanism of Deposition for Si-B-C Ceramic from BCla/SiCH3Cl3/H2 Precursor

材料科学技术（英文）

关键词: 沉积温度 , 化学成分 , 动力学 , 机理 , 陶瓷 , 沉积速率 , 形态学变化 , 微观结构

Preparation and Characterization of Boron Thin Film on Iron Substrate

Ishrat REHANA , D.Muhammad

材料科学技术（英文）

The adherent thermal layering was undertaken by chemical vapor deposition (CVD) method using saturated solution of boric acid in ultra pure CH3OH. The influence of temperature was studied by varying temperature from 100 to 600℃ during the process of boron deposition. The most optimum temperature was found to be 200℃. The effect of time span was observed from 6 to 120 h. The generation of micro or nano-scale thickness could be achieved by reducing time span of the experiment. The behavior of CVD was characterized by using scanning electron microscope, absorbance spectrohotometer and atomic emission spectrograph.

关键词: Boron , CVD , SEM , AES , Spectrophotometer , Thin