张增志
,
付跃文
,
周有强
无机材料学报
提出了沉积纳米陶瓷薄膜的一种新方法一燃烧化学沉积法.该方法省去了真空条件;直接在空气中沉积纳米陶瓷薄膜.其主要特点是将配制好的初始液体雾化,让该液雾穿过高温火焰流体.初始液体在火焰流中发生化学反应,并形成反应火焰流,该反应火焰流体系在火焰流的前方基底上沉积出纳米陶瓷薄膜,然后再通过热处理进行晶化处理,使形成晶态相.本文以制备 α-Al2O3纳米薄膜为例,介绍用该方法的制备过程,并用SEM和 TEM分析了。α-Al2O3纳米薄膜的显微形貌和结构.
关键词:
纳米陶瓷
,
combustion chemistry
,
deposition
,
α-Al2O3
W.J. Li
,
Z.M. Wu
,
J.F. Zhao
,
Z.H. Wu
,
X.L.Zhao and B.C. Cai ( Information Storage Research Center
,
Shanghai Jiaotong University
,
Shanghai 200030
,
China
,
College of Chemical Engineering & Technology
,
Taiyuan University of Technology
,
Taiyuan 030024
,
China)
金属学报(英文版)
Titanium dioxide thin films were prepared by low pressure metal organic chemical vapor deposition (LP-MOCVD) from titanium IV isopropoxide. Nitrogen was used as a carrier gas for the titanium precursor,and oxygen as a reactant gas. The deposition rates of the films have been studied as functions of process parameters such as sabstrate temperature and oxygen flow rote. Structural evolution of the films has been studied as functions of substrate temperature (110 to 700℃) and annealing temperature. The films have been characterized by X-ray dissection and by Raman scattering. Films deposited onto Si(100) substrates were amorphous at 110-250℃, anatase at 350- 550℃ and rutile above 650℃. The films deposited at substrate temperatures less than 550℃ and annealed at 600℃ for two hours were annealed, annealed at 700℃ for two hours were mixtures of anatase and rutile, and annealed at 850℃ for two hours were rutile.
关键词:
MOCVD
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