S.R. Lee
,
E.S.Byon and Y.-W. Seo 1)Korea Institnte of Machinery and Materials
,
Changwon 641-010
,
Korea 2)V & P International Co.
,
Ltd
,
705-9
,
Gozandong
,
Inchon 405-310
,
Korea Manuscript received 26 August 1996)
金属学报(英文版)
Cubic boron nitride (c-BN) films were successfully grown on Si(100)substrates by a helicon wave plasma-assisted chemical vapor deposition technique.The lower limits of rf substrated bias voltage and plasma density for formation of a single phase c-BN film were 350V and 4.5×10~(10) cm~(3),respectively. The grown c-BN films demonstrated a poor adhesion to the substrates. A postannealing treatment at 800℃ C in N_2 atmosphere was found very effective in relieving the compressive stress in the films which were thereby stabilized to improve the adhesion.
关键词:
:cubic boron nitride
,
null
,
null
,
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丁坤英
,
王立君
,
孙振
,
刘延宽
稀有金属材料与工程
利用超音速火焰喷涂技术在Ni718合金表面制备WC-17Co涂层,然后进行150℃/10h,300℃/10 h和450℃/10 h恒温热处理.利用纳米压痕和显微压痕的方法研究热处理过程对涂层显微硬度、弹性模量和断裂韧性的影响,利用Almen试片曲率法计算试片中残余应力的变化.结果表明,150,300和450℃的热处理过程未对WC-17Co涂层的组织和结构特征造成显著地影响;涂层的显微硬度、弹性模量和断裂韧性随热处理温度的升高而降低;涂层机械性能随温度升高而降低的变化趋势是由涂层残余压应力的变化特征引起的.
关键词:
WC-17Co
,
恒温热处理
,
机械性能
,
残余压应力
