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Microstructure and Mechanical Properties of Multilayer Ti(C, N) Films by Closed-field Unbalanced Magnetron Sputtering Ion Plating

Guojun Zhang

材料科学技术(英文)

Ti(C, N) multilayer films have been prepared by closed-field unbalanced magnetron sputtering technology and using graphite target as the C supplier. Microstructural observation results showed that the Ti(C, N) films exhibited multilayer structure with most of fine nano-columnar Ti(C, N) grains existing in the films. The current of graphite target had an effect remarkably on the multilayer structure of films: the periodical thickness gradually increased as the current went up, but the grain size of films gradually decreased and even amorphous phase appeared as the current further increased. The microstructure of Ti(C, N) films changed from columnar crystallite to nanocomposite in high current of graphite target where the fine Ti(C, N) grains were distributed uniformly in the amorphous Ti(C, N) matrix, and the volume fraction of the amorphous phase increased with increasing current. Measurement results showed that the Ti(C, N) multilayer films have high microhardness and low friction coefficient, and especially the film  deposited in the current of 0.9 A exhibits superior properties with optimizing hardness and friction coefficient. Based on the relationship of the microstructure and the properties of films, the multilayer structure and fine grain size of Ti(C, N) films are responsible for their well mechanical and friction properties. And choosing the graphite target as the C supplier is more propitious to decrease the friction coe±cients of films.

关键词: Ti(C, N) , 多层膜 , 石墨靶材

TiN/Ti多层膜调制比对摩擦磨损行为影响的研究

龚海飞 , 邵天敏 , 张晨辉 , 徐军

无机材料学报 doi:10.3724/SP.J.1077.2008.00758

考察了TiN/Ti多层膜调制比对其摩擦磨损行为的影响. 采用磁过滤阴极弧沉积的方法制备了具有不同调制比的TiN/Ti多层膜, 用扫描电镜和透射电镜对其层状结构及子层结构进行了观察和分析. 用纳米压痕和SRV摩擦磨损试验的方法, 对多层膜进行了纳米硬度和弹性模量测试以及摩擦磨损实验. 结果表明, 所制备的TiN/Ti多层膜层状结构清晰, 与基底结合良好, 调制比对多层膜的硬度和磨损特性影响较大, 而对摩擦系数的影响却不明显. 结合实验结果,
讨论了硬度与弹性模量的比值(H/E值)对TiN/Ti多层膜耐磨性的影响.

关键词: TiN/Ti , multilayer coating , layer structure , friction and wear

真空退火Co/Pt多层膜的结构、磁及磁光特性分析

李明 , 蒋志红 , 沈德芳

无机材料学报

本文用直流磁控溅射方法制备了Co/Pt多层膜,并对其进行了较为细致的真空退火处理,结果表明,适度的低温退火可增加Co/Pt多层膜的矫顽力,而并不削弱其磁滞克尔回线的矩形特征.当退火温度达到300℃以后,Co/Pt多层膜的矫顽力、垂直各向异性和克尔角将强烈下降,晶体结构的改善及应力的释放、晶粒的增长、层间原子扩散引起的Co层有效厚度减薄,进而居里温度的下降,分别是Co/Pt多层膜在低温、中温、高温退火过程中,磁及磁光性能变化的主要机制.

关键词: 磁光薄膜 , null , null , null

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