材料期刊网

PREPARATION OF TiN FILMS BY N_2 ASSISTED Xe~+ ION BEAM ENHANCED DEPOSITION AND THEIR MECHANICAL PROPERTIES

WANG Xi YANG Genqing LIU Xianghuai ZHENG Zhihong HUANG Wei ZHOU Zuyao ZOU Shichang Ion Beam Laboratory , Shanghai Institute of Metallurgy , Academia Sinica , shanghai , China

金属学报(英文版)

A new method for preparation of hard TiN films has been developed by using electron beam evaporation-deposition of Ti and bombardment with 40 keV Xe~+ ion beam in a N_2 gas environment.The synthesized TiN films were superior to PVD and CVD ones in respects of improved adhesion to substrate and low preparing temperature.They exhibited good wear resistance and high hardness up to 2200 kg/mm~2.Some industrial applications have been reported.

关键词: TiN film , null , null