Xiancheng WU
,
Yinyue WANG
,
Hui YAN
,
Guanghua CHEN
材料科学技术（英文）
a-Si:C:N:H thin films have been deposited at room temperature by r.f. reactive-sputtering of a Si target in an Ar+H2+N2+CH4 gas mixture. Fourier transform infrared-absorption spectroscopy and optical absorption spectra have been investigated for the films. The study shows that the film structure and...
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