Jihui WANG
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E.Wieers
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L.M.Stals
,
J.P.Celis
材料科学技术（英文）
MoSx coatings were prepared by bipolar-pulse DC unbalanced magnetron-sputtering system with the variation of coating thickness at different Ar pressures. The composition and surface morphology were determined by using energy dispersive X-ray and scanning electron microscopy; the structural characterisation was analyzed by X-ray diffraction. The friction and wear properties were investigated by fretting tests in air with less than 10% and 50% relative humidity.At 0.40 Pa pressure, (002) basal plane orientation was formed throughout the coatings. At 0.88 Pa and 1.60 Pa pressures, (002) basal plane orientation was only noticed in the first stage of coating growth (around 0.20 µm in thickness), and then edge orientations with their basal planes perpendicular to the surface would be evolved in the coatings. Humidity has a minor influence on the coatings that have (002) basal plane orientation, whereas the tribological properties of MoSx coatings with edge orientations are greatly affected by humidity. The mechanisms of coating growth and friction and wear processes are discussed.
关键词:
MoSx coating
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Jihui WANG
材料科学技术（英文）
MoS2 coatings were prepared using an unbalanced bipolar pulsed DC (direct current) magnetron sputtering apparatus under different targets, cathode current densities, power modes and bias voltages. The morphology, structure and growth characteristics of MoS2 coatings were observed and identified respectively by scanning electron microscopy, X-ray diffractometry and mass spectrometry. The results show that MoS2 coatings evolve with the (002) basal plane parallel to the surface by using cold pressed target with lower density, lower cathodic current density, bipolar pulse DC power and minus bias voltage, whereas the coatings deposited under hot pressed target, higher cathodic current density, simple DC power and positive bias voltage have the (002) basal plane perpendicular to the surface. The influence of deposition conditions on the crystal structure of MoS2 coating is implemented by altering its growth rate and the energy of sputtering-deposition particles.
关键词:
Deposition condition
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