材料期刊网，材料期刊，材料类期刊，材料期刊投稿

The research on plasma immersion ion implantation has been conducted for a little over ten years. Much is needed to investigate including processing technlogy, plasma sheath dynamics, interaction of plasma and surface, etc. Of the processing methods elavated temperature technique is usually used in PIII to produce a thick modified layer by means of the thermal diffusion. Meanwhile plasma ion heating is more recently developed by Ronghua Wei et al[1]. Therefore the temeperature is a critical parameter in plasma ion processing. In this paper we present the theoretical model and analysize the effect of imlantation voltage, plasma density, ion mass,etc on the temperature rise.

关键词: plasma immersion ion implantation , null , null

1998 COMPREHENSIVE TABLE OF CONTENTS

中国腐蚀与防护学报

N。1Atmospheric Corrosivlty for Steels………………………………………………… .LIANG Caideng HO[I i。-tat（6）Caustic Stress Corrosion Cr。king of Alloy 800 Part 2.The Effect of Thiosul执e……………………………………… KONG De-sheng YANG Wu ZHAO Guo-zheng HUANG De.ltL。ZHANG Yu。。he CHEN She。g-bac（13）SERS slid E16CttOCh6iniC81 Stlldy Of Illhibit1Oli M6ch＆tllsth Of ThlollY68 Oil ITOll ID H....

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介观LC电路在时变电源作用下量子态的演化

夏小建

量子电子学报 doi:10.3969/j.issn.1007-5461.2009.06.010

采用Wei-Norman方法,求出含时变电压源的介观LC电路随时间演化的精确解,应用相空间准概率分布函数,研究了时变电源作用下介观LC电路相干态的量子特性,结果表明此函数是一个二维运动的Gauss波包,其中心电量和磁通呈余弦和正弦变化.

关键词: 量子光学 , LC回路 , 介观电路 , 相干态 , 量子态演化 , 相空间的准概率分布函数

Monte Carlo simulation of angular distribution and fractionation in the zero-fluence isotope sputtering

Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms

A static Monte Carlo simulation program has been used to study the influence of primary and secondary knock-on atoms on the angular distribution and the fractionation, for zero-fluence sputtering of Mo-92-Mo-100. At 10 keV Xe ion energy, calculations show that significant depth-dependent momentum asymmetry exists in the near-surface region, as in Refs. (L.P. Zheng, R.S. Li, M.Y.LI, Nucl. Instr, and Meth. B 100 (1995) 490; L.P. Zheng, M.Y. Li, Nucl. Instr. and Meth. B 114(1996) 28). The calculations also show that at the polar emission angle range between 0 degrees and 90 degrees the probabilities of the sputtered primary knock-on atoms for Mo-92 and Mo-100 are small (6.1% for Mo-92 and 6.6% for Mo-100), especially, between 0 degrees and 30 degrees they are very small (2.5% for Mo-92 and 2.8% for Mo-100). At 0.1 keV Ar ion energy, the calculations show that partial momentum flux ratios, for the primary and the secondary knock-on atoms, deviate far from one, through marker plane 1 (about an atomic layer distance from the surface). (C) 1998 Elsevier Science B.V. All rights reserved.

关键词: mo-92-mo-100;targets

溶液温度和衬底对电化学沉积Cu2O薄膜形貌的影响

陈志钢 , 唐一文 , 张丽莎 , 张新 , 贾志勇 , 余颖

材料科学与工程学报 doi:10.3969/j.issn.1673-2812.2005.04.025

以透明导电玻璃(TCO)、纳米TiO2/TCO、CNTs/TCO、铜片分别为工作电极,用简单铜盐通过阴极还原制备了Gu2O薄膜,并研究了溶液温度和衬底对电化学沉积Gu2O薄膜形貌的影响.结果表明:以TCO和铜片为衬底时,由于表面微粒为微米级,不管溶液温度高低,只能得到微米级的Cu2O薄膜;以纳米TiO2/TCO和CNTs/TCO为衬底,池温高于30℃只能得到微米级的Cu2O薄膜,而池温降到0℃时,都可得到纳米Cu2O.

关键词: 氧化亚铜 , 电沉积 , 溶液温度 , 衬底