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多壁碳纳米管负载Cu2O和CuI催化剂上芳醛与2-氨基吡啶氧化酰胺化反应:Cu(I)物种的催化作用

H. N. Hareesh , K. U. Minchitha , N. Nagaraju , N. Kathyayini

催化学报 doi:10.1016/S1872-2067(15)60964-0

采用浸渍法制备了多壁碳纳米管(MWCNT)负载的Cu2O和CuI催化剂,并运用粉末X射线衍射、红外光谱、扫描电镜-能量散射谱、透射电镜和NH3程序升温脱附等技术对催化剂进行了表征。结果表明,催化剂中沉积的Cu2O和CuI分别以立方相和γ相存在于MWCNT上,且表现出由弱到强的拉电子(Lewis酸)性能。将催化剂用于催化芳醛与2-氨基吡啶氧化酰胺化反应合成N-(吡啶-2-基)苯酰胺类化合物,产物选择性为100%,收率为50%–95%。 CuI/MWCNT催化剂上产物分离收率性能好于Cu2O/MWCNT,但后者的循环使用性能更好。与共价的CuI相比,离子化的Cu2O与极性的酸活化的MWCNT间具有更适宜的相互作用,这种不同的相互作用可显著影响2-氨基吡啶的氨基对芳醛羰基的亲核进攻速率。

关键词: 氧化亚铜 , 碘化铜 , 多壁碳纳米管 , 2-氨基吡啶 , 氧化酰胺化

Ion sputter erosion in metallic glass-A response to "Comment on: Homogeneity of Zr(64.13)Cu(15.75)Ni(10.12)Al(10) bulk metallic glass" by L-Y. Chen, Y-W. Zeng, Q-P. Cao, B-J. Park, Y-M. Chen, K. Hono, U. Vainio, Z-L. Zhang, U. Kaiser, X-D. Wang, and J-Z Jiang J. Mater. Res. 24, 3116 (2009)

Journal of Materials Research

The morphology of the dark and bright regions observed by transmission electron microscopy for the Zr(64.13)Cu(15.75)Ni(10.12)Al(10) bulk metallic glass strongly depends on the ion beam parameters used for ion milling. This indicates that the ion beam could introduce surface fluctuation to metallic glasses during ion milling.

关键词: room-temperature

Pressure effects on spectra of tunable laser crystal GSGG : Cr3+ IV: Pressure-induced shifts of R-1 line, R-2 line, and U band at 300 K

Communications in Theoretical Physics

By means of both a theory for pressure-induced shifts (PS) of energy spectra and a theory for shifts of energy spectra due to electron-phonon interaction (EPI), the 'pure electronic' PS and the PS due to EPI of R-1 line, R-2 line, and U band of GSGG:Cr3+ at 300 K have been calculated, respectively. The calculated results are in good agreement with all the experimental data. Their physical origins have also been explained. It is found that the mixing-of degree \t(2)(2)(T-3(1))e(4)T(2)> and \t(2)(3) 2E> base-wavefunctions in the wavefunctions of R-1 level of GSGG:Cr3+ at 300 K is remarkable under normal pressure, and the mixing-degree rapidly decreases with increasing pressure. The change of the mixing-degree with pressure plays a key role not only for the 'pure electronic' PS of R-1 line and R-2 line but also the PS of R-1 line and R-2 line due to EPI. The pressure-dependent behaviors of the 'pure electronic' PS of R-1 line (or R-2 line) and the PS Of R-1 line (or R-2 line) due to EPI are quite different. It is the combined effect of them that gives rise to the total PS of R-1 line (or R-2 line). In the range of about 15 kbar similar to 45 kbar, the mergence and/or order-reversal between t(2)(2)(T-3(1))e(4)T(2) levels and t(2)(32)T(1) levels take place, which cause the fluctuation of the rate of PS for t(2)(2)(T-3(1))e(4)T(2) (or t(2)(3) T-2(1)) with pressure. At 300 K, both the temperature-dependent contribution to R-1 line (or R-2 line or U band) from EPI and the temperature-independent one are important.

关键词: high-pressure effect;spin-orbit interaction;electron-phonon;interaction;d orbital;coupling between t(2)(2)(3T(1))e(4)T(2) and;t(2)(32)E;tunable laser crystal;theoretical calculations;temperature-dependence;thermal broadenings;garnet crystals;cr3+ ions;r-line;cr-3+;luminescence;ruby;spectroscopy

U薄膜制备方法

吕学超 , 任大鹏 , 汪小琳

稀有金属材料与工程

探讨了U薄膜的制备方法.主要介绍了机械抛光、电解抛光、机械轧制、磁控溅射沉积、离子束辅助沉积和聚焦离子束方法等,涉及了精细U薄膜的制备要求.同时,简要介绍了防止U薄膜氧化的后处理手段.

关键词: U薄膜 , 制备方法 , U薄膜抗氧化处理

O2在UU-Nb合金表面吸附的XPS研究

伏晓国 , 刘柯钊 , 汪小琳 , 柏朝茂 , 赵正平 , 蒋春丽

金属学报

采用X射线光电子能谱(XPS)分析研究了298 K时O2在金属UU Nb合金清洁表面的原位吸附过程,作为对照还研究了在纯Nb表面的吸附.吸附各阶段XPS图谱的变化揭示了O2在U,Nb和U-Nb合金表面的吸附将导致UO2,NbO和Nb2O5等多种产物形成定量分析表明,O2在UU-Nb合金表面的饱和吸附量大约分别为45 L和40 L(1 L=L33x10-4Pa.s),而O2在金属Nb上的饱和吸附量仅约为10 L.

关键词: 合金 , null , null

O2在UU-Nb合金表面吸附的XPS研究

伏晓国 , 刘柯钊 , 汪小琳 , 柏朝茂 , 赵正平 , 蒋春丽

金属学报 doi:10.3321/j.issn:0412-1961.2001.06.004

采用X射线光电子能谱(XPS)分析研究了298 K时O2在金属UU Nb合金清洁表面的原位吸附过程,作为对照还研究了在纯Nb表面的吸附.吸附各阶段XPS图谱的变化揭示了O2在U,Nb和U-Nb合金表面的吸附将导致UO2,NbO和Nb2O5等多种产物形成定量分析表明,O2在UU-Nb合金表面的饱和吸附量大约分别为45 L和40 L(1 L=L33x10-4Pa@s),而O2在金属Nb上的饱和吸附量仅约为10 L.

关键词: O2 , U , U-Nb合金 , 表面吸附 , X射线光电子谱

Detailed check of the LDA plus U and GGA plus U corrected method for defect calculations in wurtzite ZnO

Computer Physics Communications

Based on a detailed check of the LDA + U and GGA + U corrected methods, we found that the transition energy levels depend almost linearly on the effective U parameter. GGA + U seems to be better than LDA + U, with effective U parameter of about 5.0 eV. However, though the results between LDA and GGA are very different before correction, the corrected transition energy levels spread less than 0.3 eV. These more or less consistent results indicate the necessity and validity of LDA + U and GGA + U correction. (C) 2012 Elsevier B.V. All rights reserved.

关键词: Band-gap problems;LDA plus U and GGA plus U;ZnO;First-principles;augmented-wave method

Re掺杂对Hg系超导体U-J关系的影响

张军 , 孙学峰 , 赵霞 , 李晓光

低温物理学报 doi:10.3969/j.issn.1000-3258.1999.04.010

本文研究了Hg0.7Cr0.3Sr2Ca2Cu3Oy, HgBa2Ca2Cu2.9Re0.1Oy, HgSr2Ca3Cu3.8}Re0.2Oy的磁性,发现Re的掺入会改变U-J关系.由驰豫测量结果分析得到Hg(Re)-1223,Hg(Re)-1234具有对数钉扎势U=U0H-nln(Jc0/J),其中对Hg(Re)-1223在20K~60K范围里U0和Jc0近似与温度无关; 对Hg(Re)-1234,U0和Jc0与磁场和温度有关.而Hg-1223具有幂次方钉扎势U=U0(Jc0/J)μ.另外,由磁化曲线M(H)的测量得到临界电流密度随磁场的变化关系.结果表明Hg(Re)-1223在20K~90K、Hg(Re)-1234在20K~70K的温度范围内,临界电流密度随磁场的变化关系均可以用由对数钉扎势得出的Jc(H)关系很好地描述.我们认为Re掺入引起的体系的各向异性的减小和岛状钉扎中心,使得材料钉扎能力增强并引起U-J关系的变化.

关键词:

U68CuCr与U75V钢轨的摩擦磨损行为对比

万永清 , 杨忠民 , 杨西荣 , 王慧敏 , 陈颖

钢铁 doi:10.13228/j.boyuan.issn0449-749x.20150410

通过在MM-200摩擦磨损试验机上轮对滚动摩擦模拟试验,研究U68CuCr、U75V两种钢轨分别与ER8车轮钢轮对滚动摩擦磨损行为。U68CuCr、U75V是相同强度级别,不同硬度的钢轨。结果表明:U68CuCr钢轨硬度略低于U75V钢轨的硬度,但U68CuCr钢轨试样及其ER8匹配车轮的试样的磨耗量显著小于U75V钢轨试样及其ER8匹配车轮试样的磨耗量。同时,U68CuCr钢轨的塑性变形层和白层都比U75V钢轨的厚。

关键词: 摩擦磨损 , 钢轨 , 磨耗量

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