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ION HEATING PROCESS DURING PLASMA IMMERSION ION IMPLANTATION

X.B. Tian , X.F. Wang , A.G. Liu , L.P. Wang , S. Y. Wang , B. Y. Tang and P. K. Chu 1)Advanced Welding Production & Technology National Key Laboratory , Harbin Institute of Technology , Harbin 150001 , China 2)Department of Physics & Materials Science , City University of Hong Kong , China

金属学报(英文版)

The research on plasma immersion ion implantation has been conducted for a little over ten years. Much is needed to investigate including processing technlogy, plasma sheath dynamics, interaction of plasma and surface, etc. Of the processing methods elavated temperature technique is usually used in PIII to produce a thick modified layer by means of the thermal diffusion. Meanwhile plasma ion heating is more recently developed by Ronghua Wei et al[1]. Therefore the temeperature is a critical parameter in plasma ion processing. In this paper we present the theoretical model and analysize the effect of imlantation voltage, plasma density, ion mass,etc on the temperature rise.

关键词: plasma immersion ion implantation , null , null

介观LC电路在时变电源作用下量子态的演化

夏小建

量子电子学报 doi:10.3969/j.issn.1007-5461.2009.06.010

采用Wei-Norman方法,求出含时变电压源的介观LC电路随时间演化的精确解,应用相空间准概率分布函数,研究了时变电源作用下介观LC电路相干态的量子特性,结果表明此函数是一个二维运动的Gauss波包,其中心电量和磁通呈余弦和正弦变化.

关键词: 量子光学 , LC回路 , 介观电路 , 相干态 , 量子态演化 , 相空间的准概率分布函数

DL-EPR法评价2205双相不锈钢晶间腐蚀敏感性

徐菊良 , 邓博 , 孙涛 , 李劲 , 蒋益明

金属学报 doi:10.3724/SP.J.1037.2009.00598

利用Thermo-Calc软件并结合金相显微镜,定性研究了2205双相不锈钢在800℃下敏化不同时间后的微观组织演变过程.通过研究扫描速率、介质成分、介质温度和试样表面状态优化了双环电化学动电位再活化法(DL-EPR),并用该优化方法研究了2205双相不锈钢晶间腐蚀敏感性.结果表明:DL-EPR法能定量评价σ相对2205双相不锈钢晶间腐蚀敏感性的影响,随敏化时间延长,σ相含量增多,晶jian 腐蚀敏感性也随之增加.腐蚀形貌的观测验证了这一规律,

关键词: 2205双相不锈钢 , DL-EPR , 晶间腐蚀敏感性 , σ相

Oxidation of Alloying Elements during ESR of Stainless Steel

WEI Jihe Xi'an Institute of Metallurgy and Construction Engineering , China.

材料科学技术(英)

The oxidation of alloying elements during the ESR of stainless steel has been studied. The model previously developed by WEI and Mitchell for the chemical reactions and mass transfer processes during ESR was applied to the remelting of the high Cr steel 1Cr18Ni9(Ti).The laboratory data for the unsteady state A.C.ESR were analyzed and dealt with by the model.When the remelting process reached a steady state,an oxidant(Fe_2O_3 powder)or a deoxidant(Ca-Si powder or metallic Ca)was added to the slag bath.The results showed that this model is applicable to the remelting of stainless steel rather precisely, and it is expected that the model may offer a reliable basis for the control of composition during practical ESR of high alloy steel. Also,the oxidation of Cr in the steel must be noticed when its content is high;but it is entirely possible to adjust the Cr content of ingot within a considerable range,using a special technique by means of the slag-metal reactions during the remelting.

关键词: ESR , null , null , null , null

掺Mn硅酸锌薄膜中微量氧化锌对发光强度的影响

席俊华 , 季振国 , 刘坤 , 王超 , 杜鹃

无机材料学报 doi:10.3724/SP.J.1077.2006.01506

利用溶胶-凝胶法结合高温热处理在硅衬底上制备了掺Mn硅酸锌薄膜, 用XRD、SEM、UV-Vis吸收谱和PL谱测试了样品的结晶性能与光学性能, 并分析了热处理温度对掺Mn硅酸锌薄膜的结晶性能和光学性能的影响. 实验结果发现, ZnO的适量存在对掺Mn薄膜的发光有增强作用. 进一步的分析认为, 这一现象的机理可由G.G. Qin提出的量子约束-发光中心 (QCLC) 模型进行解释, ZnO中受激发的电子和空穴通过隧穿效应到达硅酸锌基体中复合发光, 从而增强发光强度.

关键词: 硅酸锌 , ZnO , photoluminescence , quantum confinement-luminescence center

Extended quantum confinement luminescence center model for photoluminescence from oxidized porous silicon and nanometer-Si-particle- or nanometer-Ge-particle-embedded silicon oxide films

Materials Research Bulletin

Through analysis of the latest experimental results reported in the literature and obtained in our laboratory, we have extended our previous quantum confinement/luminescence center model for the photoluminescence mechanism of porous Si and of nanometer-silicon-particle-embedded Si oxide films (G.G. Qin and Y.Q. Jia, Solid State Commun. 86, 559 (1993)). We consider that there are three main types of competitive photoexcitation/photoemission processes and that the process in which photoexcitation occurs in the nanometer silicon particles (NSPs) while photoemission occurs in the luminescence centers (LCs) in the SiOx layers very close to the NSPs is usually the major one. We discuss under what conditions the other two types of processes will dominate. We believe that the extended quantum confinement/luminescence center model is a physical model that is suitable for the photoluminescence from silicon oxide films embedded with NSPs or nanometer Ge particles (NGPs), as well as from oxidized porous Si. (C) 1999 Elsevier Science Ltd.

关键词: oxides;luminescence;defects;blue-light emission;visible luminescence;optical-properties;nanocrystals;mechanism;dependence;sio2-films;absorption;spectra;defects

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