Ishrat REHANA
,
D.Muhammad
材料科学技术（英文）
The adherent thermal layering was undertaken by chemical vapor deposition (CVD) method using saturated solution of boric acid in ultra pure CH3OH. The influence of temperature was studied by varying temperature from 100 to 600℃ during the process of boron deposition. The most optimum temperature was...
关键词:
Boron
,
CVD
,
SEM
,
AES
,
Spectrophotometer
,
Thin
