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Al(Ga)原子择优占位对Gd2Co17化合物磁晶各向异性的影响

顾正飞 , 刘正义 , F.R.de , Boer , K.H.J.Buschow

材料研究学报

用磁性测量和磁取向粉末X-射线衍射方法,研究了Gd2Co17-xMx (M = Al, Ga; x ? 4 )化合物的磁晶各向异性与Al(Ga)原子浓度的依赖关系。随着x 的增加,Gd2Co17-xAlx(x ≥1)和Gd2Co17-xGax(x ≥2)化合物的室温磁晶各向异性由易面转变为易轴;在Al、Ga 原子的浓度分别为x =0.9和 x =1.8附近时,室温各向异性常数K1由负变正,在x = 3时达到最大值,且含Al化合物的K1最大值约为含Ga化合物的四倍。根据Al(Ga)原子在Gd2Co17化合物不同Co晶位择优占位的事实,讨论了Co亚点阵磁晶各向异性的演变。结果表明,Al原子择优占据6c晶位是导致Al原子对Co亚点阵各向异性正贡献大于Ga原子的主要原因。

关键词: 金属材料 , magnetocrystaline anisotropy , magnetic measurement , site preference

Growth and microstructure of r.f. sputtered Fe/Ti multilayers

材料科学技术(英文)

Fe/Ti multilayers with different modulation wavelengths (Lambda) prepared by r.f. sputtering has been investigated by using cross sectional transmission electron microscopy (XTEM). It was observed that the columnar structure, interface morphology, and metastable phase presented at the interface of the multilayer system strongly depend on the bilayer thickness (Lambda). For high period multilayers, the waviness wavelength of interfaces is about two times broader than the column diameter. For a sample with Lambda =30 nm, its column width and waviness wavelength was about 80, and 190 nm, respectively. Both of them decreased with the reduction of Lambda, so as to nearly equal values of column diameter and waviness wavelength were obtained. The Fe and Ti grains of both 30 nm and 6 nm multilayers are polycrystalline, and have a textured structure. In short bilayer thickness (Lambda =6 nm), the intermetallic compound Fe2Ti was presented at the interfaces due to solid state reaction; for Lambda =2 nm, amorphous phase Ti-rich layer was formed at the interfaces, resulting in a sharp interface multilayer structure.

关键词: model;films

Growth and microstructure of r.f. sputtered Fe/Ti multilayers

Wei WANG , Lishi WEN

材料科学技术(英文)

Fe/Ti multilayers with different modulation wavelengths (Lambda) prepared by r.f. sputtering has been investigated by using cross sectional transmission electron microscopy (XTEM). It was observed that the columnar structure, interface morphology, and metastable phase presented at the interface of the multilayer system strongly depend on the bilayer thickness (Lambda). For high period multilayers, the waviness wavelength of interfaces is about two times broader than the column diameter. For a sample with Lambda =30 nm, its column width and waviness wavelength was about 80, and 190 nm, respectively. Both of them decreased with the reduction of Lambda, so as to nearly equal values of column diameter and waviness wavelength were obtained. The Fe and Ti grains of both 30 nm and 6 nm multilayers are polycrystalline, and have a textured structure. In short bilayer thickness (Lambda =6 nm), the intermetallic compound Fe2Ti was presented at the interfaces due to solid state reaction, for Lambda =2 nm, amorphous phase Ti-rich layer was formed at the interfaces, resulting in a sharp interface multilayer structure.

关键词:

永固红F5R电泳液微胶囊的制备和表征

倪卓 , 李丹 , 钟玉莲 , 刘丽双 , 陈展明

材料导报

采用十八胺对永固红F5R进行化学修饰,以Span-80为稳定剂,四氯乙烯为分散介质,制备了分散性和稳定性良好的电泳液.以此电泳液为囊芯,脲甲醛树脂为壁材,制备了一种红色电子墨水微胶囊,研究了投料比、合成温度、酸化时间和搅拌速度等对合成微胶囊的影响.结果表明,合成的微胶囊形貌呈规则球形,表面光滑,囊壁结构致密,强度较好,包覆率达到82%,囊芯含量达到76%.永固红F5R电泳液微胶囊具有明显的电场响应行为,可以作为柔板显示器的功能材料.

关键词: 电子墨水 , 微胶囊 , 永固红F5R , 电场响应

Effects of substrate temperature on properties for transparent conducting ZnO: Al films on organic substrate deposited by r.f. sputtering

Deheng ZHANG , Dejun ZHANG , Qingpu WANG , Tianlin YANG

材料科学技术(英文)

This paper presents the substrate temperature dependence of opto-electrical properties for transparent conducting Al-doped ZnO films prepared on polyisocyanate (PI) substrates by r.f. sputtering. Polycrystalline ZnO:Al films with good adherence to the substrates having a (002) preferred orientation have been obtained with resistivities in the range from 4.1 x 10(-3) to 5.3 x 10(-4) Ohm .cm, carrier densities more than 2.6 x 10(20) cm(-3) and Hall mobilities between 5.78 and 13.11 cm(2)/V/s for films. The average transmittance reaches 75% in the visible spectrum. The quality of obtained films depends on substrate temperature during film fabrication.

关键词:

Si-based Multielement Thin Film Prepared by r.f. Reactive Sputtering at Room Temperature

Xiancheng WU , Yinyue WANG , Hui YAN , Guanghua CHEN

材料科学技术(英文)

a-Si:C:N:H thin films have been deposited at room temperature by r.f. reactive-sputtering of a Si target in an Ar+H2+N2+CH4 gas mixture. Fourier transform infrared-absorption spectroscopy and optical absorption spectra have been investigated for the films. The study shows that the film structure and optical, electrical properties are obviously modified readily by controlling the process parameters of deposition. The nitrogen-rich a-Si:C:N:H films are thermally stable within the temperature ranging from 200 to 800°C. They are of interest for the potential applications in electronic devices.

关键词:

R.F.磁控溅射生成的氧化钨薄膜的性能

李竹影 , 宋玉苏 , 刘祖黎 , 姚凯伦

功能材料

由于薄膜沉积过程中缺乏氧气,溅射得到的是化学配比偏离WO3的氧化钨薄膜,本文详细研究了不同电压下,R.F磁控溅射生成的不同化学配比的氧化钨薄膜的伏安循环特性;发现它们在一定电压范围内(1.15V到2.8V)都可产生着色现象.着色后对光的吸收是一致的.光的透过率显示电压超过某一值后,膜的变色能力减弱并消失.XRD显示本文所得氧化钨薄膜主要是非晶态的结构.

关键词: 氧化钨薄膜 , 电致变色 , r.f.磁控溅射

Characterization of ZnO:Al Films Deposited on Organic Substrate by r.f. Magnetron Sputtering

Jin MA , Xiaotao HAO , Shiyong ZHANG , Honglei MA

材料科学技术(英文)

Transparent conducting Al-doped zinc oxide (ZnO:Al) films with good adhesion have been deposited on polyimide thin film substrates by r.f. magnetron sputtering technique at low substrate temperature (25~180℃). The structural, optical and electrical properties of the deposited films were investigated. High quality films with electrical resistivity as low as 8.5×10-4 w\c·cm and the average transmittance over 74% in the wavelength range of the visible spectrum have been obtained. The electron carrier concentrations are in the range from 2.9×1020 to 7.1×1020 cm-3 with mobilities from 4 to 8.8 cm2V-1s-1 The densities of the films are in the range from 4.58 to 5.16 g/cm-3.

关键词: Zinc oxide , null , null

r.f.PCVD法制备c-BN膜的研究

张晓玲 , 胡奈赛 , 何家文

无机材料学报

采用 F T I R、 T E M、 S E M 等技术, 对在渗硼层表面经r.f. P C V D 沉积的 B N 膜进行了研究试验证明, 与采用 N 气和 H 气相比, 以 Ar + 10vol% H 作为载气, 所获得的膜层c-B N 含量最高, 膜厚最大, 可达4.6μm , 且膜基结合良好而以 N 气或 H 气为载气时, 前者会导致膜基结合力大大下降, 后者会引起沉积速度明显降低结果表明, 对于 P C V D 过程, 控制c- B N 形成的主要因素是离子轰击能量的转移, 而不是氢的选择溅射过程试验获得的膜层由a- B N 和c- B N 组成, c- B N的尺寸为20 ~40nm

关键词: c-BN膜 , null , null

检测金属离子的R-S-F结构型荧光分子传感器研究进展

侯长军 , 黄清菁 , 霍丹群 , 张宿义 , 沈才洪 , 张良

功能材料

Receptor-Spacer-Fluorophore(R-S-F)结构型荧光分子传感器是由可选择性结合客体的主体基团与传递信号的荧光团通过桥联基团连接而成的一类分子传感器,结合了超分子在分子识别中良好的选择性和荧光信号的高灵敏度两个优点,成为一类可用于检测金属离子并具巨大发展潜力的新型光学敏感材料.以超分子主体化合物冠醚、杯芳烃结构为分类依据,从主体基团选择性能角度综述了近5年已成功合成并用于金属离子检测的R-S-F型荧光分子传感器及其研究的最新进展.

关键词: 荧光分子传感器 , 分子识别 , 冠醚 , 杯芳烃 , 卟啉

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