材料期刊网

Acrylate Copolymers as Impact Modiifer for Epoxy Resin

WANG Tao , WANG Jun , CHEN Wei , DUAN Huajun , YANG Shuang , CHEN Xi , ZHANG Bin

武汉理工大学学报-材料科学版(英文版) doi:10.1007/s11595-015-1297-0

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Electromagnetic Interference Shielding Properties of Electroless Nickel-coated Carbon Fiber Paper Reinforced Epoxy Composites

CHEN Wei , WANG Jun , WANG Tao , WANG Junpeng , XU Renxin , YANG Xiaoli

武汉理工大学学报-材料科学版(英文版) doi:10.1007/s11595-014-1060-y

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Chen系统的状态变量周期性反馈控制

李开明 , 李亚洲 , 冯维贵 , 林长

量子电子学报 doi:10.3969/j.issn.1007-5461.2007.05.014

采用非线性反馈控制,用附加了带参数的正弦项对Chen系统进行了有效的控制.随着参数k的逐渐增大,系统的动力学行为呈现出一系列的变化.数值研究结果表明:随控制参数的增大,驱动信号的强度渐大,混沌系统由混沌运动到周期轨道,最终到一相点.

关键词: 混沌 , Chen系统 , 不动点 , Lyapunov指数 , 反馈控制

Congratulations to Prof. Dr. WEI Shoukun's 100th Birthday

金属学报(英文版)

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Dedicated to Prof. Dr. WEI Shoukun's 100th birthday

稀有金属（英文版）

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SIF expressions for center cracked strip loaded by uniformly distributed stress acting on central portion of crack - Corrections of Chen's results - Response

International Journal of Fracture

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Ion sputter erosion in metallic glass-A response to "Comment on: Homogeneity of Zr(64.13)Cu(15.75)Ni(10.12)Al(10) bulk metallic glass" by L-Y. Chen, Y-W. Zeng, Q-P. Cao, B-J. Park, Y-M. Chen, K. Hono, U. Vainio, Z-L. Zhang, U. Kaiser, X-D. Wang, and J-Z Jiang J. Mater. Res. 24, 3116 (2009)

Journal of Materials Research

The morphology of the dark and bright regions observed by transmission electron microscopy for the Zr(64.13)Cu(15.75)Ni(10.12)Al(10) bulk metallic glass strongly depends on the ion beam parameters used for ion milling. This indicates that the ion beam could introduce surface fluctuation to metallic glasses during ion milling.

关键词: room-temperature

第27卷B辑作者索引

金属学报

Volu扣ne 27SeriesB1991AUTHOR INDEX CCAO Guanghan(曹光旱)············……6一B科6CAo weijie(曹卫恋)..················……5一B32oCAO Yilin(曹益林)··················……6一B443CHANG Xin(常听)···············……1一B48CHE Guang邻n(车广灿)·············一6一B科0CHEN Erbao(陈二保)···············……6一B410CHEN Jia....

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ION HEATING PROCESS DURING PLASMA IMMERSION ION IMPLANTATION

X.B. Tian , X.F. Wang , A.G. Liu , L.P. Wang , S. Y. Wang , B. Y. Tang and P. K. Chu 1)Advanced Welding Production & Technology National Key Laboratory , Harbin Institute of Technology , Harbin 150001 , China 2)Department of Physics & Materials Science , City University of Hong Kong , China

金属学报(英文版)

The research on plasma immersion ion implantation has been conducted for a little over ten years. Much is needed to investigate including processing technlogy, plasma sheath dynamics, interaction of plasma and surface, etc. Of the processing methods elavated temperature technique is usually used in PIII to produce a thick modified layer by means of the thermal diffusion. Meanwhile plasma ion heating is more recently developed by Ronghua Wei et al[1]. Therefore the temeperature is a critical parameter in plasma ion processing. In this paper we present the theoretical model and analysize the effect of imlantation voltage, plasma density, ion mass,etc on the temperature rise.

关键词: plasma immersion ion implantation , null , null

介观LC电路在时变电源作用下量子态的演化

夏小建

量子电子学报 doi:10.3969/j.issn.1007-5461.2009.06.010

采用Wei-Norman方法,求出含时变电压源的介观LC电路随时间演化的精确解,应用相空间准概率分布函数,研究了时变电源作用下介观LC电路相干态的量子特性,结果表明此函数是一个二维运动的Gauss波包,其中心电量和磁通呈余弦和正弦变化.

关键词: 量子光学 , LC回路 , 介观电路 , 相干态 , 量子态演化 , 相空间的准概率分布函数