ZHONG Zengyong
,
ZO U Dunxu
,
LI Shiqiong (Central Iron and Steel Research Institute
,
Beijing 100081 . China)
金属学报(英文版)
Recent work on Ti_3Al base alloy,TAC-1, developed in CISRI, including investigations of effects of modification in alloying and TMP on microstructural characteristics and mechanical behaviour,indicates that alloy TAC -1 is very promising structural material for a number of elevated temperature applications. Stuody dealing with a reverse relation between RT ductility and toughness found on TiA base alloy, TAC-2, led to development of a special heat treatment technique for producing a fine filly lamellar microstructure (FFL), which gives a high and balancing ductility and toughness. This is also of significance for promoting engineering applications of this alloy.
关键词:
: Ti_3Al
,
null
,
null
付兴华
,
方舟
,
傅正义
,
单连伟
,
丁碧妍
,
韦其红
,
侯文萍
功能材料与器件学报
doi:10.3969/j.issn.1007-4252.2005.03.010
采用溶胶-凝胶法制备了Ba0.5Sr0.5NbzTi1-zO3薄膜(Nb=0-4.12mol%),采用HPAgilent 429A阻抗分析仪等测试方法研究了微量元素铌对Ba0.5Sr0.5NbzTi1-zO3(BSNT)薄膜介电性能的影响.当Nb分别为0-4.12mol%时,相对介电常数εr降低而介质损耗tanδ均得到了改善,当测试频率为1kHz,tanδ由0.09降低到0.067;居里温度Tm逐渐移向低温;在测试频率2.0-10MHz范围内,εr、tanδ均能表现出较好的频散特性.采用XRD、TEM等测试方法分析了薄膜的结构特征.薄膜为四方钙钛矿晶体结构,但Nb的溶入改变了晶胞参数的c/a比,减小了薄膜的晶粒尺寸,提高了薄膜的致密度.
关键词:
SBT薄膜
,
介电常数
,
介质损耗
,
Nb施主掺杂
,
结构特征
Computer Physics Communications
Based on a detailed check of the LDA + U and GGA + U corrected methods, we found that the transition energy levels depend almost linearly on the effective U parameter. GGA + U seems to be better than LDA + U, with effective U parameter of about 5.0 eV. However, though the results between LDA and GGA are very different before correction, the corrected transition energy levels spread less than 0.3 eV. These more or less consistent results indicate the necessity and validity of LDA + U and GGA + U correction. (C) 2012 Elsevier B.V. All rights reserved.
关键词:
Band-gap problems;LDA plus U and GGA plus U;ZnO;First-principles;augmented-wave method
鲜晓斌
,
刘柯钊
,
吕学超
,
张永彬
稀有金属材料与工程
用循环Ar+轰击-磁控溅射离子镀(MSIP)法在U表面上镀Al,Ti/Al,并采用俄歇电子能谱仪(AES)、扫描电镜(SEM)、电化学实验和平面磨耗实验,研究了其表面、剖面形貌和耐磨耐蚀性能,以及Al/U和Ti/Al镀层界面.结果表明:U上循环Ar+轰击-磁控溅射离子镀Al,Ti/Al界面存在较宽的原子共混区,且Ti/Al镀层的耐磨耐蚀性能明显优于单一磁控溅射离子镀Al层.
关键词:
Ti/Al镀层
,
界面
,
耐磨性
,
耐蚀性
伏晓国
,
刘柯钊
,
汪小琳
,
柏朝茂
,
赵正平
,
蒋春丽
金属学报
采用X射线光电子能谱(XPS)分析研究了298 K时O2在金属U和U Nb合金清洁表面的原位吸附过程,作为对照还研究了在纯Nb表面的吸附.吸附各阶段XPS图谱的变化揭示了O2在U,Nb和U-Nb合金表面的吸附将导致UO2,NbO和Nb2O5等多种产物形成定量分析表明,O2在U和U-Nb合金表面的饱和吸附量大约分别为45 L和40 L(1 L=L33x10-4Pa.s),而O2在金属Nb上的饱和吸附量仅约为10 L.
关键词:
合金
,
null
,
null
伏晓国
,
刘柯钊
,
汪小琳
,
柏朝茂
,
赵正平
,
蒋春丽
金属学报
doi:10.3321/j.issn:0412-1961.2001.06.004
采用X射线光电子能谱(XPS)分析研究了298 K时O2在金属U和U Nb合金清洁表面的原位吸附过程,作为对照还研究了在纯Nb表面的吸附.吸附各阶段XPS图谱的变化揭示了O2在U,Nb和U-Nb合金表面的吸附将导致UO2,NbO和Nb2O5等多种产物形成定量分析表明,O2在U和U-Nb合金表面的饱和吸附量大约分别为45 L和40 L(1 L=L33x10-4Pa@s),而O2在金属Nb上的饱和吸附量仅约为10 L.
关键词:
O2
,
U
,
U-Nb合金
,
表面吸附
,
X射线光电子谱
