Guoping DU
,
Hui SHEN
,
Lanping YUE
,
Weiguo YAO
,
Zongquan LI and Zhenzhong QI (Institute of Solid State Physics
,
Academia Sinica
,
Hefei
,
230031
,
China)(To whom correspondence should be addressed)
材料科学技术（英文）
For evaporation-deposited Ti films, face-centred cubic structure was observed at the initial stage of film growth, then transited to the hexagonal close-packed structure during film growing (less than 50 nm thick). While. for ion-beam sputter-deposited films. the structure of films always kept the fcc structure during all stages of film formation. The structure of film at initial growth stages relates with the substrate. It is discussed that different film processes and different growth stages provide different thermodynamic condition of film formation and result in the different crystal structures of films during the film formation
关键词:
Applied Physics a-Materials Science & Processing
Amorphous aluminate YAlO3 (YAO) thin films on n-type silicon wafers as gate dielectric layers of metal - oxide semiconductor devices are prepared by pulsed laser deposition. As a comparison, amorphous aluminate LaAlO3 (LAO) thin films are also prepared. The structural and electrical characterization shows that the as-prepared YAO films remain amorphous until 900 degrees C and the dielectric constant is similar to 14. The measured leakage current of less than 10(-3) A/cm(2) at a bias of V-G = 1.0 V for similar to 40-nm-thick YAO and LAO films obeys the Fowler Nordheim tunneling mechanism. It is revealed that the electrical property can be significantly affected by the oxygen pressure during deposition and post rapid thermal annealing, which may change the fixed negative charge density at the gate interface.
关键词:
hafnium oxide;si;stability;silicon;transition;dioxide;devices;hfo2
