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MODELING OF DYNAMIC RECRYSTALLIZATION OF Ti6Al4V ALLOY USING A CELLULAR AUTOMATON APPROACH

J.W. Zhao , H. Ding , W.J.Zhao , F.R. Cao , H.L. Hou , Z.Q. Li

金属学报(英文版)

A cellular automaton (CA) model is established to simulate dynamic recrystallization (DRX) in the $\beta$ single-phase field of Ti6Al4V alloy, and the kinetics during DRX processing has been analyzed. The model employed considers the influences of dynamic recovery, nucleation rate, strain rate and dislocation density on DRX, and practical deformation parameters, such as temperature, strain and strain rate on DRX have been considered in the simulation. The simulated DRX grain size and DRX grain shape agree well with the experimental results, which shows the availability and feasibility of the cellular automaton method for the simulation of DRX. The result of kinetics analysis of DRX reveals that the Avrami exponent is variable ranging from 2.4 to 2.9, which increases with the increase of strain rate.

关键词: Ti6Al4V alloy , null , null , null , null , null

CaF_2含量对CaO-SiO_2-R_2O-F系微晶玻璃晶化行为的影响

周曦亚 , 胡俊 , 周斌扬 , 刘林凤

硅酸盐通报

采用烧结法制备了CaO-SiO_2-R_2O-F(R=Na, K)系微晶玻璃,并结合XRD、DTA、SEM等测试方法,探讨了CaF_2含量对CaO-SiO_2-R_2O-F系微晶玻璃晶化行为的影响.结果表明:添加适量的CaF_2能有效地促进微晶玻璃的析晶.在一定热处理制度下,制备出的微晶玻璃内含大量互锁的板条状晶体和针状晶体,主晶相为硅碱钙石和Frankamenite(一种富含氟的硅碱钙石).随着CaF_2含量的增加,晶体的含量逐渐提高,晶体数量逐渐增大,尺寸逐渐减小.

关键词: 微晶玻璃 , 硅碱钙石 , 晶化行为 , 显微结构

Growth and microstructure of r.f. sputtered Fe/Ti multilayers

材料科学技术(英文)

Fe/Ti multilayers with different modulation wavelengths (Lambda) prepared by r.f. sputtering has been investigated by using cross sectional transmission electron microscopy (XTEM). It was observed that the columnar structure, interface morphology, and metastable phase presented at the interface of the multilayer system strongly depend on the bilayer thickness (Lambda). For high period multilayers, the waviness wavelength of interfaces is about two times broader than the column diameter. For a sample with Lambda =30 nm, its column width and waviness wavelength was about 80, and 190 nm, respectively. Both of them decreased with the reduction of Lambda, so as to nearly equal values of column diameter and waviness wavelength were obtained. The Fe and Ti grains of both 30 nm and 6 nm multilayers are polycrystalline, and have a textured structure. In short bilayer thickness (Lambda =6 nm), the intermetallic compound Fe2Ti was presented at the interfaces due to solid state reaction; for Lambda =2 nm, amorphous phase Ti-rich layer was formed at the interfaces, resulting in a sharp interface multilayer structure.

关键词: model;films

Growth and microstructure of r.f. sputtered Fe/Ti multilayers

Wei WANG , Lishi WEN

材料科学技术(英文)

Fe/Ti multilayers with different modulation wavelengths (Lambda) prepared by r.f. sputtering has been investigated by using cross sectional transmission electron microscopy (XTEM). It was observed that the columnar structure, interface morphology, and metastable phase presented at the interface of the multilayer system strongly depend on the bilayer thickness (Lambda). For high period multilayers, the waviness wavelength of interfaces is about two times broader than the column diameter. For a sample with Lambda =30 nm, its column width and waviness wavelength was about 80, and 190 nm, respectively. Both of them decreased with the reduction of Lambda, so as to nearly equal values of column diameter and waviness wavelength were obtained. The Fe and Ti grains of both 30 nm and 6 nm multilayers are polycrystalline, and have a textured structure. In short bilayer thickness (Lambda =6 nm), the intermetallic compound Fe2Ti was presented at the interfaces due to solid state reaction, for Lambda =2 nm, amorphous phase Ti-rich layer was formed at the interfaces, resulting in a sharp interface multilayer structure.

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冷却方式对钢渣中f-CaO显微形貌及含量的影响

张玉柱 , 雷云波 , 李俊国 , 邢宏伟 , 韩志杰 , 龙跃

钢铁钒钛

采用扫描电子显微镜和化学分析方法对三种不同方式处理的钢渣中f-CaO的显微形貌及含量进行分析研究,试验结果表明,钢渣中弥散型f-CaO主要形成于C2S和C3S初晶、RO相形成和C3S分解等过程,其数量多、分布广、粒径较小;缓冷渣中氧化钙的典型显微形貌为灰色圆粒状、薄膜状、细小长条状;气淬渣中氧化钙的典型显微形貌为灰色薄膜状和细小长条状;热焖渣中氧化钙典型显微形貌为细小长条状;冷却强度对钢渣中f-CaO含量影响显著,因此冷却强度最弱的缓冷渣中f-CaO含量达到了6.96%,而冷却强度最高、经过水解的热焖渣中f-CaO含量只有0.55%;前期冷却强度高、后期冷却强度弱的气淬渣中f-CaO含量为2.28%;降低气淬钢渣粒径,可降低渣中f-CaO含量,从而提高其综合利用价值.

关键词: 钢渣 , 冷却强度 , 自由氧化钙 , 显微形貌 , 缓冷渣 , 气淬渣 , 热焖渣

高钙粉煤灰中f-CaO消解的试验研究

李辉 , 史诗 , 冯绍航 , 沈宝镜 , 张巨清

硅酸盐通报

本文采取加消解剂、磨细、加分散剂三种方式组合对用循环流化床锅炉低温烧成的高钙粉煤灰进行处理,以消解其中的f-CaO.分析按不同方式处理后高钙粉煤灰中f-CaO的含量,并利用扫描电镜观察f-CaO消解后的形貌变化.试验结果表明:未添加分散剂条件下,消解剂量对f-CaO消解的影响最大,其次为粉磨时间,最后为消解时间;添加分散剂有助于水分由粉煤灰颗粒表面孔隙进入其内部,加快f-CaO消解.扫描电镜观察显示仅加消解剂处理高钙粉煤灰中的f-CaO消解后生成了呈六方片状、板状和短柱状的Ca(OH)_2;而加消解剂同时加入分散剂,不光在高钙粉煤灰颗粒表面,在其内部也生成大量簇状的Ca(OH)_2.

关键词: 高钙粉煤灰 , f-CaO消解 , 消解剂 , 粉磨 , 分散剂

基于高斯过程回归的软测量模型预测水泡陈化中钢渣f-CaO含量

陈华 , 李辉 , 顾恒星 , 杨刚 , 陈伟 , 徐德龙

硅酸盐通报

采用水泡陈化方法处理滚筒钢渣,跟踪检测滚筒钢渣中游离氧化钙(f-CaO)含量.运用高斯过程回归,建立基于高斯过程回归的软测量模型预测滚筒钢渣水泡陈化中f-CaO含量.结果表明,水泡陈化方法处理滚筒钢渣可以有效降低f-CaO含量,A类滚筒钢渣120 d之后f-CaO含量基本维持在3.98%~4.03%,B类滚筒钢渣105 d之后f-CaO含量维持在9.84%~10.03%,满足安全利用的要求;基于高斯过程回归的软测量模型的真实值与预测值数据吻合较好,相对误差为-1.493%~0.748%,有效提高了滚筒钢渣水泡陈化中f-CaO含量预测精度.

关键词: 水泡陈化 , 滚筒钢渣 , 高斯过程回归 , 游离氧化钙 , 软测量

永固红F5R电泳液微胶囊的制备和表征

倪卓 , 李丹 , 钟玉莲 , 刘丽双 , 陈展明

材料导报

采用十八胺对永固红F5R进行化学修饰,以Span-80为稳定剂,四氯乙烯为分散介质,制备了分散性和稳定性良好的电泳液.以此电泳液为囊芯,脲甲醛树脂为壁材,制备了一种红色电子墨水微胶囊,研究了投料比、合成温度、酸化时间和搅拌速度等对合成微胶囊的影响.结果表明,合成的微胶囊形貌呈规则球形,表面光滑,囊壁结构致密,强度较好,包覆率达到82%,囊芯含量达到76%.永固红F5R电泳液微胶囊具有明显的电场响应行为,可以作为柔板显示器的功能材料.

关键词: 电子墨水 , 微胶囊 , 永固红F5R , 电场响应

Effects of substrate temperature on properties for transparent conducting ZnO: Al films on organic substrate deposited by r.f. sputtering

Deheng ZHANG , Dejun ZHANG , Qingpu WANG , Tianlin YANG

材料科学技术(英文)

This paper presents the substrate temperature dependence of opto-electrical properties for transparent conducting Al-doped ZnO films prepared on polyisocyanate (PI) substrates by r.f. sputtering. Polycrystalline ZnO:Al films with good adherence to the substrates having a (002) preferred orientation have been obtained with resistivities in the range from 4.1 x 10(-3) to 5.3 x 10(-4) Ohm .cm, carrier densities more than 2.6 x 10(20) cm(-3) and Hall mobilities between 5.78 and 13.11 cm(2)/V/s for films. The average transmittance reaches 75% in the visible spectrum. The quality of obtained films depends on substrate temperature during film fabrication.

关键词:

Si-based Multielement Thin Film Prepared by r.f. Reactive Sputtering at Room Temperature

Xiancheng WU , Yinyue WANG , Hui YAN , Guanghua CHEN

材料科学技术(英文)

a-Si:C:N:H thin films have been deposited at room temperature by r.f. reactive-sputtering of a Si target in an Ar+H2+N2+CH4 gas mixture. Fourier transform infrared-absorption spectroscopy and optical absorption spectra have been investigated for the films. The study shows that the film structure and optical, electrical properties are obviously modified readily by controlling the process parameters of deposition. The nitrogen-rich a-Si:C:N:H films are thermally stable within the temperature ranging from 200 to 800°C. They are of interest for the potential applications in electronic devices.

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