{"currentpage":1,"firstResult":0,"maxresult":10,"pagecode":5,"pageindex":{"endPagecode":5,"startPagecode":1},"records":[{"abstractinfo":"总结了我国在MOCVD化合物半导体材料方面的最新进展, 重点为MOCVD化学、Ⅲ-Ⅴ族和Ⅱ-Ⅵ族半导体材料及其在光电和微波器件中的应用. 为进一步发展我国的MOCVD材料提出了若干建议.","authors":[{"authorName":"彭瑞伍","id":"b9ce97dd-cf57-41ce-a70a-549a880c2fa6","originalAuthorName":"彭瑞伍"},{"authorName":"胡金波","id":"1950856f-3489-409d-803e-a363fa0e3444","originalAuthorName":"胡金波"}],"doi":"10.3969/j.issn.0258-7076.1998.03.002","fpage":"164","id":"3cbf8022-6c08-4cb1-b534-a9ae0d83769a","issue":"3","journal":{"abbrevTitle":"XYJS","coverImgSrc":"journal/img/cover/XYJS.jpg","id":"67","issnPpub":"0258-7076","publisherId":"XYJS","title":"稀有金属"},"keywords":[{"id":"eaf9835d-ed48-428e-9ccb-a17c63312c48","keyword":"金属有机物化学气相沉积(MOCVD)","originalKeyword":"金属有机物化学气相沉积(MOCVD)"},{"id":"da0fe8cd-72f9-4428-a0a8-531fbee8e9e4","keyword":"MOCVD半导体材料","originalKeyword":"MOCVD半导体材料"},{"id":"871cfe9c-f149-439d-9386-27ffa5991229","keyword":"MOCVD半导体器件","originalKeyword":"MOCVD半导体器件"}],"language":"zh","publisherId":"xyjs199803002","title":"MOCVD化合物半导体材料及其应用","volume":"22","year":"1998"},{"abstractinfo":"概述了紫外半导体电致发光器件的发展历史、现状、趋势及其应用,详述了国内外近两年对AlGaN基半导体电致发光器件的研究进展.","authors":[{"authorName":"岑继文","id":"42a96439-e4db-4744-a273-6e8a64f1bca7","originalAuthorName":"岑继文"},{"authorName":"何明兴","id":"369bae9b-0421-4b35-a7c1-0654c6577914","originalAuthorName":"何明兴"},{"authorName":"李新军","id":"d7b5437b-df6f-4785-84c9-cbfcc87e43a0","originalAuthorName":"李新军"},{"authorName":"王良焱","id":"3d9a6972-e52c-42d2-a35d-48eb021d24f0","originalAuthorName":"王良焱"}],"doi":"","fpage":"90","id":"e009d4b7-5e59-4ddc-ae94-2e87cdf92776","issue":"1","journal":{"abbrevTitle":"CLDB","coverImgSrc":"journal/img/cover/CLDB.jpg","id":"8","issnPpub":"1005-023X","publisherId":"CLDB","title":"材料导报"},"keywords":[{"id":"3b5fe02c-cd5b-4952-a04e-d20ce3339d6e","keyword":"AlGaN","originalKeyword":"AlGaN"},{"id":"5c2dfa47-1515-4b7a-8b54-5cae7570fcec","keyword":"半导体电致发光","originalKeyword":"半导体电致发光"},{"id":"019dea95-2376-4c86-8cda-2ef84c39444c","keyword":"紫外","originalKeyword":"紫外"},{"id":"5b682e68-38fd-4804-ae8e-c3d232fc4188","keyword":"LED","originalKeyword":"LED"}],"language":"zh","publisherId":"cldb200501026","title":"紫外半导体电致发光器件研究进展","volume":"19","year":"2005"},{"abstractinfo":"应用金属有机化合物气相淀积(MOCVD)制备了具有渐变层的半导体布拉格反射镜(DBR),分别是抛物线性、线性和突变结构的DBR.三种反射镜结构都设计为8个周期,通过白光反射谱测量突变DBR具有最大反射率.应用原子力显微镜对所制备的DBR表面形貌进行分析.结果表明,相同周期数情况下线性渐变DBR相对于其他两种结构粗糙度最小,具有良好的表面形貌,可以应用于垂直腔面发射激光器的研制.","authors":[{"authorName":"盖红星","id":"f9569968-ed26-4620-8131-68b44778d399","originalAuthorName":"盖红星"},{"authorName":"邓军","id":"6a2fd115-2fe9-4998-8568-4fa0765ce87c","originalAuthorName":"邓军"},{"authorName":"廉鹏","id":"7cb0a235-92d2-42f4-94c9-ff7868d9f3c7","originalAuthorName":"廉鹏"},{"authorName":"俞波","id":"c6087dc9-0f2f-452c-87d0-0ca05cd53735","originalAuthorName":"俞波"},{"authorName":"李建军","id":"b5fd4d92-98ea-4469-8057-344e5a6c845c","originalAuthorName":"李建军"},{"authorName":"韩军","id":"8f2b1558-3f67-4c64-947b-b9cbf6bc770c","originalAuthorName":"韩军"},{"authorName":"陈建新","id":"5c0729d1-76c8-4c8c-ac56-1a2e56f030de","originalAuthorName":"陈建新"},{"authorName":"沈光地","id":"c885ac01-8ebf-4caf-ab16-6557594008a4","originalAuthorName":"沈光地"}],"doi":"10.3969/j.issn.1007-4252.2006.03.009","fpage":"207","id":"971a3ee7-a139-4bbe-8485-cf15d53f56e6","issue":"3","journal":{"abbrevTitle":"GNCLYQJXB","coverImgSrc":"journal/img/cover/GNCLYQJXB.jpg","id":"34","issnPpub":"1007-4252","publisherId":"GNCLYQJXB","title":"功能材料与器件学报 "},"keywords":[{"id":"2defe529-8ee7-4d98-96c5-ef334f9f01d4","keyword":"布拉格反射镜","originalKeyword":"布拉格反射镜"},{"id":"bc747578-f169-46b0-92e1-b19a0ec8b64e","keyword":"金属有机化合物气相淀积","originalKeyword":"金属有机化合物气相淀积"},{"id":"3cd72bb2-1a51-4e05-9dbf-a085e83d14fc","keyword":"原子力显微镜","originalKeyword":"原子力显微镜"},{"id":"cd9e628b-aee7-41fd-b4ab-174e9a0def8c","keyword":"AlGaAs","originalKeyword":"AlGaAs"}],"language":"zh","publisherId":"gnclyqjxb200603009","title":"具有渐变层半导体DBR的MOCVD外延制备","volume":"12","year":"2006"},{"abstractinfo":"使用低压MOCVD生长应变InGaAs/GaAs 980 nm量子阱.研究了生长温度、生长速度对量子阱光致发光谱(PL)的影响.并将优化后的量子阱生长条件应用于980 nm半导体激光器的研制中,获得了直流工作下,阈值电流为19 mA,未镀膜斜率效率为0.6 W/A,输出功率在100 mW的器件.","authors":[{"authorName":"俞波","id":"1847f592-cebc-4139-9091-ca1b71d9bea8","originalAuthorName":"俞波"},{"authorName":"盖红星","id":"5becc38f-a341-4ebc-a29a-a1ee71edd40a","originalAuthorName":"盖红星"},{"authorName":"韩军","id":"3775bc2b-5371-4b8b-856a-4e717e491530","originalAuthorName":"韩军"},{"authorName":"邓军","id":"18c61fa4-92d6-48f6-808c-5c3f70f46426","originalAuthorName":"邓军"},{"authorName":"邢艳辉","id":"b2b41d42-550d-43cd-bb81-4ddbf9dac4f4","originalAuthorName":"邢艳辉"},{"authorName":"李建军","id":"b0482a0c-5b68-4b38-b9ed-b9f95109d04a","originalAuthorName":"李建军"},{"authorName":"廉鹏","id":"5c199688-9c3f-49a8-82b8-5c80fc8103d7","originalAuthorName":"廉鹏"},{"authorName":"邹德恕","id":"4dca1659-5671-4960-acef-2b337538c883","originalAuthorName":"邹德恕"},{"authorName":"沈光地","id":"e2b28a45-9a16-4aa8-a2e2-92c150e587f5","originalAuthorName":"沈光地"}],"doi":"10.3969/j.issn.1007-5461.2005.01.015","fpage":"81","id":"d3a3bfbe-15a1-4ea1-a574-1c7442b8b4b7","issue":"1","journal":{"abbrevTitle":"LZDZXB","coverImgSrc":"journal/img/cover/LZDZXB.jpg","id":"53","issnPpub":"1007-5461","publisherId":"LZDZXB","title":"量子电子学报 "},"keywords":[{"id":"6b320bb5-3cfa-4815-9cb1-4c93fdbe1f94","keyword":"光电子学","originalKeyword":"光电子学"},{"id":"c569ff6b-3634-4493-b255-ef39c4512d7a","keyword":"半导体激光器","originalKeyword":"半导体激光器"},{"id":"102583dc-393a-4b0e-95db-b983e2355c02","keyword":"应变量子阱","originalKeyword":"应变量子阱"},{"id":"6bee8750-0ba3-4198-8822-0b6b75ff3142","keyword":"金属有机化学气相淀积","originalKeyword":"金属有机化学气相淀积"}],"language":"zh","publisherId":"lzdzxb200501015","title":"应变InGaAs/GaAs量子阱MOCVD生长优化及其在980 nm半导体激光器中的应用","volume":"22","year":"2005"},{"abstractinfo":"简要介绍了量子结构材料与器件中的基本概念,重点介绍了量子结构的定义和量子尺寸效应的能带裁剪工程.以Ⅱ-Ⅵ族化合物半导体为例,介绍了量子尺寸效应对于激子束缚能的影响.以此为基础,综述了Ⅱ-Ⅵ族化合物半导体量子阱、量子点等量子结构材料以及量子结构器件在光电探测、发光器件与太阳能电池领域的研究现状,并总结了Ⅱ-Ⅵ族化合物半导体量子结构材料与器件的发展趋势.","authors":[{"authorName":"郝建伟","id":"f295508d-dae0-43e2-84db-f5543201d3ab","originalAuthorName":"郝建伟"},{"authorName":"查钢强","id":"8e340af5-c65a-4d46-9ee1-8745fb10d9cd","originalAuthorName":"查钢强"},{"authorName":"介万奇","id":"240cd3a8-0830-45a1-881e-8ebc908c5a15","originalAuthorName":"介万奇"}],"doi":"10.3969/j.issn.1001-4381.2011.06.018","fpage":"87","id":"80ab47b9-d510-4c1a-b6af-f2240fa62448","issue":"6","journal":{"abbrevTitle":"CLGC","coverImgSrc":"journal/img/cover/CLGC.jpg","id":"9","issnPpub":"1001-4381","publisherId":"CLGC","title":"材料工程"},"keywords":[{"id":"0d916c4f-e8ee-4be3-9aca-4ff90efc6c9b","keyword":"Ⅱ-Ⅵ族化合物半导体","originalKeyword":"Ⅱ-Ⅵ族化合物半导体"},{"id":"22634fb7-d490-4f0e-927e-65da9a71d799","keyword":"量子结构","originalKeyword":"量子结构"},{"id":"8ba0964f-f6f3-4558-a7d1-33375e55d0d5","keyword":"激子效应","originalKeyword":"激子效应"},{"id":"8c9490fe-f08b-4781-8f54-5dda5a4d46aa","keyword":"量子尺寸效应","originalKeyword":"量子尺寸效应"}],"language":"zh","publisherId":"clgc201106018","title":"Ⅱ-Ⅵ族化合物半导体量子结构材料和器件的研究与发展","volume":"","year":"2011"},{"abstractinfo":"对无机和有机电致变色材料及其在电致变色器件中的应用做了详尽地分析.重点介绍了近年来广泛研究的一种变色子修饰半导体电极的复合型电致变色器件.通过对这种有机-无机复合电致变色器件结构的剖析,分析了变色机理,展望了这种变色器件的发展动向.","authors":[{"authorName":"葛万银","id":"ad41a134-9826-40b9-ad71-bee8ea32c61a","originalAuthorName":"葛万银"},{"authorName":"李永祥","id":"3e9c6cf8-7a8d-4e43-8081-652b27cf4089","originalAuthorName":"李永祥"},{"authorName":"于晓峰","id":"f298a511-cc9c-412a-b37a-d9d9f56bad2f","originalAuthorName":"于晓峰"},{"authorName":"杨群保","id":"613ddc3e-3da2-44e1-8a5f-5ff97e8f7bad","originalAuthorName":"杨群保"}],"doi":"","fpage":"108","id":"d7052d59-2bb0-4cdc-956c-230f7283bc27","issue":"11","journal":{"abbrevTitle":"CLDB","coverImgSrc":"journal/img/cover/CLDB.jpg","id":"8","issnPpub":"1005-023X","publisherId":"CLDB","title":"材料导报"},"keywords":[{"id":"c2b2d138-185d-4b01-9ba4-6ebc587b3aff","keyword":"电致变色","originalKeyword":"电致变色"},{"id":"cbb9081c-eeb9-4ab2-b24f-358d6c43ba8a","keyword":"有机-无机复合","originalKeyword":"有机-无机复合"},{"id":"1e1f9346-397c-40d9-8214-2c1e20166c2e","keyword":"纳米膜材料","originalKeyword":"纳米膜材料"},{"id":"acd12568-c65f-49ee-9bc5-a290a8d3918f","keyword":"平板显示器件","originalKeyword":"平板显示器件"}],"language":"zh","publisherId":"cldb200511029","title":"纳米半导体电极及有机-无机电致变色器件","volume":"19","year":"2005"},{"abstractinfo":"本文评述了半导体器件引线框架材料国内外研究开发的现状,对引线框架材料性能和材料设计进行了分析,并讨论了随着计算机和信息工业的迅猛发展,引线框架材料今后的发展趋势.","authors":[{"authorName":"邬震泰","id":"060909ca-6fdc-4f07-a306-9af570a24ef8","originalAuthorName":"邬震泰"}],"doi":"10.3969/j.issn.1673-2812.2001.03.026","fpage":"127","id":"f6977e18-7c27-4666-a27b-d1e99eaae369","issue":"3","journal":{"abbrevTitle":"CLKXYGCXB","coverImgSrc":"journal/img/cover/CLKXYGCXB.jpg","id":"13","issnPpub":"1673-2812","publisherId":"CLKXYGCXB","title":"材料科学与工程学报"},"keywords":[{"id":"055214b7-1439-4ac5-b752-33bb12ffa2e0","keyword":"引线框架材料","originalKeyword":"引线框架材料"},{"id":"1cc13b8d-7af0-4ff6-af9a-7e6be3013d71","keyword":"半导体器件","originalKeyword":"半导体器件"},{"id":"b18d5aa5-f299-4288-b323-e5d8e36bf2ee","keyword":"材料设计","originalKeyword":"材料设计"}],"language":"zh","publisherId":"clkxygc200103026","title":"半导体器件引线框架材料的现状与发展","volume":"19","year":"2001"},{"abstractinfo":"在MOCVD质量控制生长模式下,通过分析Ⅲ-Ⅴ族化合物半导体材料在衬底表面的反应过程,建立了一个实用的生长模型.此模型是基于分子动力学、化学反应热力学理论分析之上的.针对Turbo-Disc 反应体系,分析了Turbo-Disc 的传热以及质量传送模式后, 建立了Turbo-Disc的生长模型.在此模型中建立了输入反应室的参数(IPs)和边界层的生长参数的关系.在对组分匹配的GaInP/GaAs 三组分生长体系进行分析时,发现此模型是非常有效的,理论计算的结果与实验得到的结果非常吻合.应用此模型在实际生产中可以迅速地得到匹配的多组分外延层.","authors":[{"authorName":"王浩","id":"255a6323-15c4-4cdd-9a22-122d5281eb8d","originalAuthorName":"王浩"},{"authorName":"廖常俊","id":"85e7b7e1-c5a0-41cb-80ae-415f112f3550","originalAuthorName":"廖常俊"},{"authorName":"范广涵","id":"9c60db10-5c65-4bc9-aa7c-8fc65bbf30d6","originalAuthorName":"范广涵"},{"authorName":"刘颂豪","id":"5354f5de-80eb-4aa9-aa8f-d28631390308","originalAuthorName":"刘颂豪"},{"authorName":"郑树文","id":"f1fffe83-20fd-4b1e-bb28-f3fe7a03a1a6","originalAuthorName":"郑树文"},{"authorName":"李述体","id":"9773960a-56d3-409f-af9d-ed604df42fdb","originalAuthorName":"李述体"},{"authorName":"郭志友","id":"c4806904-c62d-406e-974c-c3a108eab263","originalAuthorName":"郭志友"},{"authorName":"孙慧卿","id":"3dc18b01-f7ce-4a9e-a754-65efbd18a75a","originalAuthorName":"孙慧卿"},{"authorName":"陈贵楚","id":"cd64938f-180c-4783-8af8-7140406ab3b8","originalAuthorName":"陈贵楚"},{"authorName":"陈炼辉","id":"8f77de8d-8c17-4074-96b9-4c74e3e90464","originalAuthorName":"陈炼辉"},{"authorName":"吴文光","id":"36a79c42-a3ec-4779-ac67-3174d71cac21","originalAuthorName":"吴文光"},{"authorName":"李华兵","id":"37b37035-dc3d-4681-a8a7-136809781654","originalAuthorName":"李华兵"}],"doi":"10.3969/j.issn.1000-985X.2004.04.018","fpage":"549","id":"429ef30e-f23f-44b6-ae10-0337ce397577","issue":"4","journal":{"abbrevTitle":"RGJTXB","coverImgSrc":"journal/img/cover/RGJTXB.jpg","id":"57","issnPpub":"1000-985X","publisherId":"RGJTXB","title":"人工晶体学报"},"keywords":[{"id":"b1798c46-6375-472d-a714-2a86c3419ba9","keyword":"MOCVD","originalKeyword":"MOCVD"},{"id":"ff989512-27df-4a65-a95f-79645b6c930c","keyword":"Turbo-Disc","originalKeyword":"Turbo-Disc"},{"id":"8898dda4-4e5a-4c19-b207-ffdd52138a15","keyword":"生长动力学","originalKeyword":"生长动力学"},{"id":"e5dd345d-e685-4f27-8d30-a2921853c6b0","keyword":"GaInP","originalKeyword":"GaInP"}],"language":"zh","publisherId":"rgjtxb98200404018","title":"一个实用的生产用Ⅲ-Ⅴ族化合物半导体材料Turbo-Disc MOCVD生长模型","volume":"33","year":"2004"},{"abstractinfo":"本文论述了室温半导体核辐射探测器新材料及其探测器的研究发展过程和最新动态,分别介绍了几种主要室温半导体核辐射探测器新材料晶体的组成、结构、性能及其探测器的制备技术,主要应用情况.结果表明:HgI2、CdZnTe和CdSe单晶体是性能优异的室温半导体核辐射探测器新材料,用其制作的探测器,可在室温下广泛用于环境监测、核医学、工业无损检测、安全检查、核武器突防、航空航天、天体物理和高能物理等领域.因此,近年来对大尺寸高质量HgI2、CdZnTe和CdSe单晶体及其室温核辐射探测器的研究,已成为高技术新材料领域的前沿研究课题.","authors":[{"authorName":"朱世富","id":"8a40e0d0-aa67-40ed-b324-6d0c33449359","originalAuthorName":"朱世富"},{"authorName":"赵北君","id":"1397585f-8888-4c6e-be38-aac3404c7fe2","originalAuthorName":"赵北君"},{"authorName":"王瑞林","id":"adb83e89-7cc7-474d-99ba-2e9b667a9bca","originalAuthorName":"王瑞林"},{"authorName":"高德友","id":"3673be66-e7f1-4103-91b5-cc06797fe039","originalAuthorName":"高德友"},{"authorName":"韦永林","id":"ce53bcfa-efb0-473b-9f63-029b8afdc954","originalAuthorName":"韦永林"}],"doi":"10.3969/j.issn.1000-985X.2004.01.002","fpage":"6","id":"6054f54d-e8c1-4207-b0d7-929014ab1575","issue":"1","journal":{"abbrevTitle":"RGJTXB","coverImgSrc":"journal/img/cover/RGJTXB.jpg","id":"57","issnPpub":"1000-985X","publisherId":"RGJTXB","title":"人工晶体学报"},"keywords":[{"id":"2cb6defc-cf64-4d24-8d7b-c8abb5eea989","keyword":"半导体新材料","originalKeyword":"半导体新材料"},{"id":"0fa81e42-9d28-4878-b121-707ac183ab67","keyword":"室温核辐射探测器","originalKeyword":"室温核辐射探测器"},{"id":"9a9ac6d1-14af-4128-ac93-3dc735d45a31","keyword":"制备技术","originalKeyword":"制备技术"},{"id":"b3f67272-345d-4d0b-a299-77d202637b14","keyword":"性能","originalKeyword":"性能"},{"id":"2057efb9-a1cd-48e7-934a-830062f38aac","keyword":"应用","originalKeyword":"应用"}],"language":"zh","publisherId":"rgjtxb98200401002","title":"室温半导体核辐射探测器新材料及其器件研究","volume":"33","year":"2004"},{"abstractinfo":"区熔法工艺制备的Ti2 Be3温差发电材料,以PN结为研究对象。通过有限体积法对单对半导体PN 结模型的温度、流场进行模拟,并用热阻分析法对传热过程进行计算,考虑热电转换过程受 PN 结空腔内气体对流、热传导和辐射的影响。研究结果表明,数值模拟和热阻分析法所得结果吻合,芯片传热过程中陶瓷基板热阻耗散46%的温差,且当热端温度达1000 K时,辐射传热量占总传热量的37%;因此对半导体PN 结模型进行优化,适当降低陶瓷基底热阻有利于提高半导体PN结实际温差和应用价值。","authors":[{"authorName":"王长宏","id":"b06bfdde-3f91-40a5-ae53-e8cea4c7a313","originalAuthorName":"王长宏"},{"authorName":"李娜","id":"4aaae6d4-2b55-4377-88d2-b7c3fe9dcb8d","originalAuthorName":"李娜"},{"authorName":"林涛","id":"ad2744f8-1267-43d9-8cc2-3b4e8ed95918","originalAuthorName":"林涛"},{"authorName":"吴浩东","id":"9865ad0b-2743-41cb-a4c9-71e2111d7b2c","originalAuthorName":"吴浩东"}],"doi":"10.3969/j.issn.1001-9731.2016.12.024","fpage":"12147","id":"04234154-c53c-4287-98a6-474dd00ee471","issue":"12","journal":{"abbrevTitle":"GNCL","coverImgSrc":"journal/img/cover/GNCL.jpg","id":"33","issnPpub":"1001-9731","publisherId":"GNCL","title":"功能材料"},"keywords":[{"id":"421d62dc-c50f-4106-b367-d44c490fa195","keyword":"温差发电器件","originalKeyword":"温差发电器件"},{"id":"c1a0efbd-b6f8-47df-97eb-d1b0becf03d2","keyword":"热电转换","originalKeyword":"热电转换"},{"id":"f0efa446-3366-4028-a0c3-f965f8d3f4c5","keyword":"热电性能","originalKeyword":"热电性能"},{"id":"38322146-303d-492a-9bcc-a402b7bdd88c","keyword":"数值分析","originalKeyword":"数值分析"}],"language":"zh","publisherId":"gncl201612024","title":"半导体P-N型温差发电器件热电性能研究?","volume":"47","year":"2016"}],"totalpage":544,"totalrecord":5440}