{"currentpage":1,"firstResult":0,"maxresult":10,"pagecode":5,"pageindex":{"endPagecode":5,"startPagecode":1},"records":[{"abstractinfo":"用Ne离子束混合法制备了Ni/Cr多层膜,用Auger光电子能谱(AES)、X射线衍射(XRD)分析离子束混合多层膜的元素组成、分布和相结构,将其结果与简单蒸发沉积的Ni/Cr多层膜结构进行比较同时,对多层膜(轰击与未轰击)的硬度及摩擦学性能进行测定分析比较结果表明,离子束混合多层膜的硬度和抗磨性能与简单蒸发沉积多层膜相比都有提高这主要是因为Ne离子的轰击作用使多层膜更加致密及膜内的碳化铬硬质弥散相向界面处偏聚,使多层界面的强化作用得到加强,从而提高了多层膜的抗磨性能","authors":[{"authorName":"张伟","id":"0753b5fe-9803-4ebc-8e79-9fb18a165e83","originalAuthorName":"张伟"},{"authorName":"薛群基","id":"0e2155b9-027e-4803-b6a0-8ab1f51275a9","originalAuthorName":"薛群基"},{"authorName":"张绪寿","id":"7aca134b-8843-44b7-a632-01cfa03e591f","originalAuthorName":"张绪寿"}],"categoryName":"|","doi":"","fpage":"1165","id":"2d860134-1e8d-49a7-8878-ad92146bc38b","issue":"11","journal":{"abbrevTitle":"JSXB","coverImgSrc":"journal/img/cover/JSXB.jpg","id":"48","issnPpub":"0412-1961","publisherId":"JSXB","title":"金属学报"},"keywords":[{"id":"55b2ad72-e3d7-4382-b2bb-15f5e20b2005","keyword":"离子束混合","originalKeyword":"离子束混合"},{"id":"e2559748-4276-4638-a2e8-ed2ad91f1159","keyword":"Ni/Cr multilayer film","originalKeyword":"Ni/Cr multilayer film"},{"id":"8a6b7d89-af08-4883-a466-5f98a49cd467","keyword":" friction and wear","originalKeyword":" friction and wear"},{"id":"b7051d77-bd4e-4615-a005-a3caad249d0a","keyword":"interface strengthening","originalKeyword":"interface strengthening"}],"language":"zh","publisherId":"0412-1961_1997_11_8","title":"离子束轰击对多层膜摩擦学性能的影响","volume":"33","year":"1997"},{"abstractinfo":"A novel Ni-9.6 wt.% Cr nanocomposite film was prepared by co-electrodeposition of Ni and Cr nanoparticles in an average size of 39 nm. The Cr natroparticles were dispersed in the electrodeposited nanocrystalline Ni grains (31 nm in average). The oxidation at 800 degreesC showed that the as-deposited Ni-Cr nanocomposite film has a superior oxidation resistance compared to the electrodeposited pure Ni film and the uncoated Ni matrix. X-ray diffraction characterization and cross-sectional investigation indicated that a continuous Cr2O3 scale formed on the electrodeposited nanocomposite film. (C) 2003 Elsevier B.V. All rights reserved.","authors":[],"categoryName":"|","doi":"","fpage":"1134","id":"57ea0cdc-397c-4eec-80ec-664e04f54382","issue":"6","journal":{"abbrevTitle":"ML","id":"90b15a58-51fc-41ad-8509-c2692f6a3f6e","issnPpub":"0167-577X","publisherId":"ML","title":"Materials Letters"},"keywords":[{"id":"3fa198c9-31bb-4f5f-88ca-c99f2234cbf0","keyword":"electrodeposition;oxidation;Ni-Cr nanocomposite film;high-temperature;la2o3 particles;nickel films;resistance;alloy;composite;behavior;scale;morphology;coatings","originalKeyword":"electrodeposition;oxidation;Ni-Cr nanocomposite film;high-temperature;la2o3 particles;nickel films;resistance;alloy;composite;behavior;scale;morphology;coatings"}],"language":"en","publisherId":"0167-577X_2004_6_3","title":"Development and oxidation at 800 degrees C of a novel electrodeposited Ni-Cr nanocomposite film","volume":"58","year":"2004"},{"abstractinfo":"Investigation by using LAS 3000 surface analysis system showed that the oxide of Fe, Cr,Al formed during oxidation were Cr_2O_3,Fe_2O_3 and Al_2O_3,but only small amount of nickel oxide was found. The composition of oxide layers for different oxidation durations varied in a similar way. In all cases,there exists an oxygen concentration peak in the composition profile of oxide layer. There is a transitional zone between oxide layer and alloy film.The thickness of oxide layer increases logarithmically with the time of oxida- tion.The ion plated Ni-Cr alloy film has very dense oxide layer and good oxidation resistance.","authors":[{"authorName":"WANG Shuhe CHEN Xiuzhi WEN Lishi Institute of Metal Research","id":"fee4f39f-d2dd-4872-968f-32383d6db43b","originalAuthorName":"WANG Shuhe CHEN Xiuzhi WEN Lishi Institute of Metal Research"},{"authorName":"Academia Sinica","id":"c3eb1a19-f4b3-4c4d-8dc2-af35543a9962","originalAuthorName":"Academia Sinica"},{"authorName":"Shenyang","id":"5c80c136-c85a-4741-b79b-75dfd609a7f1","originalAuthorName":"Shenyang"},{"authorName":"China.","id":"a3e64166-49c8-4f3d-bad8-4e71edb42b5b","originalAuthorName":"China."}],"categoryName":"|","doi":"","fpage":"273","id":"15c183f7-f7e4-44de-9a39-67add04f5b99","issue":"4","journal":{"abbrevTitle":"CLKXJSY","coverImgSrc":"journal/img/cover/JMST.jpg","id":"11","issnPpub":"1005-0302 ","publisherId":"CLKXJSY","title":"材料科学技术(英文)"},"keywords":[{"id":"d7f9326e-7a20-4807-a99e-d7ea24b2347e","keyword":"ion plating","originalKeyword":"ion plating"},{"id":"26a83cfb-ea05-41d1-983d-7877fa6862b1","keyword":"null","originalKeyword":"null"},{"id":"48a56fc6-2000-4492-ac98-fac7a7ea7813","keyword":"null","originalKeyword":"null"},{"id":"cdc882a8-729a-473c-bbe7-de32ea4091e3","keyword":"null","originalKeyword":"null"},{"id":"109c9fe0-2bc2-41a1-ab05-f43b1c001a47","keyword":"null","originalKeyword":"null"}],"language":"en","publisherId":"1005-0302_1989_4_13","title":"Oxidation of Ion Plated Ni—Cr Alloy Film at 300℃","volume":"5","year":"1989"},{"abstractinfo":"The microstructure of Ti/TiN multilayer film was studied.It was shown by trans- mission electron microscopy of cross-sectional sample and respective secondary neutrals mass-spectroscopy depth profiling that the film has a periodic alternate multilayered structure:substrate /FeTi/Ti/Ti_2N/TiN/Ti_2N/Ti/Ti_2N/TiN...Ti/Ti_2N/TiN,where FeTi and Ti_2N were the transition layers formed during ion plating.Cross-sectional fracture surface of indentation samples had been obtained and studied with scanning electron microscopy.It was shown that the multilayer film deformed during indentation, formed an indentation pit and a pile-up of materials around the indentation pit.As the applied load increased deformation region extended beyond the film/substratc interface and into the substrate,the interlayer crack in the film and hole formation at the film /substrate interface were initiated.It is also shown that the multilayered Ti/TiN film offered better toughness in comparison with single layer TiN film.","authors":[{"authorName":"WAGENDRISTEL A Viena Technical Univessity","id":"5e01bde1-107b-4fbc-8d31-cdc23fb0bbd5","originalAuthorName":"WAGENDRISTEL A Viena Technical Univessity"},{"authorName":"AustriaHUANG Rongfang Institute of Metal Research","id":"c694a8dd-299c-499c-9919-ce271c8eaba2","originalAuthorName":"AustriaHUANG Rongfang Institute of Metal Research"},{"authorName":"Academia Sinica","id":"40ceeccb-bc1c-44f4-a1a9-8cc9d444a74f","originalAuthorName":"Academia Sinica"},{"authorName":"Shenyang","id":"336b9447-def8-45c6-a527-85bd5cf225eb","originalAuthorName":"Shenyang"},{"authorName":"ChinaBANGERT H YANG Xia WU Lihang WANG Haifeng PANGRATZ H SKALICKY P Viena Technical University","id":"8fc80eb8-3526-42da-8eaa-dccc60a972fa","originalAuthorName":"ChinaBANGERT H YANG Xia WU Lihang WANG Haifeng PANGRATZ H SKALICKY P Viena Technical University"},{"authorName":"Austria Associate Professor","id":"49d8fcf5-30ac-43a8-8e3c-ccb641a24728","originalAuthorName":"Austria Associate Professor"},{"authorName":"Institute of Metall Research","id":"48080e8e-97ae-4278-b494-717482dc800c","originalAuthorName":"Institute of Metall Research"},{"authorName":"Academia Sinica","id":"3006c8b4-446b-49b7-87c5-b2bd0c74008a","originalAuthorName":"Academia Sinica"},{"authorName":"Shenyang 110015","id":"a0f151b2-a766-4844-bddc-9b12df8ada85","originalAuthorName":"Shenyang 110015"},{"authorName":"China","id":"cac515c6-ce46-46ce-b6bd-3ca78fd180d9","originalAuthorName":"China"}],"categoryName":"|","doi":"","fpage":"29","id":"ce88bdd2-365c-4ff8-8d01-14bee9d218f9","issue":"7","journal":{"abbrevTitle":"JSXBYWB","coverImgSrc":"journal/img/cover/amse.jpg","id":"49","issnPpub":"1006-7191","publisherId":"JSXBYWB","title":"金属学报(英文版)"},"keywords":[{"id":"0c8b6dd3-0273-46e0-8665-441bbb1b5909","keyword":"multilayer Ti-N film","originalKeyword":"multilayer Ti-N film"},{"id":"ddbb1ec8-558e-4339-ad8c-473ed503e618","keyword":"null","originalKeyword":"null"},{"id":"24186f89-1a5f-49fb-8db2-1d2fdcd2aa86","keyword":"null","originalKeyword":"null"}],"language":"en","publisherId":"1006-7191_1993_7_3","title":"MICROSTRUCTURE AND INDENTATION BEHAVIOUR OF MULTILAYER Ti-N FILM","volume":"6","year":"1993"},{"abstractinfo":"The composition, phase structure and microstructure of the discontinuous multilayer film [NiFeCo(10 nm)/ Ag(10 nm)]×20 were investigated after Co ion implantation and annealing at 280, 320, 360 and 400℃, respectively. GMR (giant magnetoresistance) ratio of the film with/without Co ion implantation was measured. The results showed that Co ion implantation decreased the granule size of the annealed multilayer film, and increased Hc value and GMR ratio of the multilayer film. After annealing at 360℃, the multilayer film [NiFeCo(10 nm)/Ag(10 nm)]×20 with/without Co ion implantation both exhibited the highest GMR ratio of 12.4%/11% under 79.6 kA/m of applied saturation magnetic field.","authors":[{"authorName":"Yuding HE","id":"0e0e3c76-8def-4d39-8253-7b43207e8863","originalAuthorName":"Yuding HE"},{"authorName":" Shejun HU","id":"5c334b06-8825-4ac3-a0a9-5bef6a2d8f89","originalAuthorName":" Shejun HU"},{"authorName":" Jian LI","id":"4130ca98-eb1c-4059-a823-5f65d64f12c3","originalAuthorName":" Jian LI"},{"authorName":" Guangrong XIE","id":"f5f95f0b-61ae-470e-b685-451df2d07842","originalAuthorName":" Guangrong XIE"}],"categoryName":"|","doi":"","fpage":"593","id":"1c8e839c-92ee-468f-bb44-e24319347b10","issue":"4","journal":{"abbrevTitle":"CLKXJSY","coverImgSrc":"journal/img/cover/JMST.jpg","id":"11","issnPpub":"1005-0302 ","publisherId":"CLKXJSY","title":"材料科学技术(英文)"},"keywords":[{"id":"eaf59748-9e6b-423f-b5bf-42b65a4383a2","keyword":"Co ion implantation","originalKeyword":"Co ion implantation"},{"id":"7834efa8-f8c2-41ae-8b51-aef770145e6e","keyword":"null","originalKeyword":"null"},{"id":"8418dd3b-d674-4260-8236-f0938ed1f28e","keyword":"null","originalKeyword":"null"}],"language":"en","publisherId":"1005-0302_2005_4_10","title":"Effect of Co Ion Implantation on GMR of [NiFeCo(10 nm)/Ag(10 nm)]×20 Multilayer Film","volume":"21","year":"2005"},{"abstractinfo":"The oxidation behaviors of Fe26Cr1Mo with and without the Ni-La2O3 electrodeposited composite film have been investigated by thermogravimetric analysis (TGA) and a scanning electron microscope equipped with an energy-dispersive analytical X-ray system (SEM/EDAX). The experimental results show that the oxide scale growing on Fe26Cr1Mo exposed at 900 degrees C spalled severely during cooling, while after the stainless steel was coated with the Ni-La2O3 electrodeposited composite film, its high temperature cyclic oxidation resistance was significantly improved. The reason is that a La2O3-modified NiO scale, which has a superior adhesion to the substrate, was formed on the Fe26Cr1Mo stainless steel coated with Ni-La2O3 composite film.","authors":[],"categoryName":"|","doi":"","fpage":"195","id":"08e1800a-7b1c-4fca-b37f-b96cec7b6079","issue":"3","journal":{"abbrevTitle":"XTXBYWB","coverImgSrc":"journal/img/cover/XTXBEN.jpg","id":"66","issnPpub":"1002-0721","publisherId":"XTXBYWB","title":"稀土学报(英文版)"},"keywords":[{"id":"fdd284a0-48ac-43e3-8652-28653dabbfff","keyword":"rare earths;La;Ni-La2O3 electrodeposited composite film;stainless;steel;oxidation behavior;scales","originalKeyword":"rare earths;La;Ni-La2O3 electrodeposited composite film;stainless;steel;oxidation behavior;scales"}],"language":"en","publisherId":"1002-0721_1997_3_1","title":"Oxidation behavior of Fe26Cr1Mo stainless steel in the presence of Ni-La2O3 electrodeposited composite film","volume":"15","year":"1997"},{"abstractinfo":"A simple-support bending method was used to evaluate the cracking behavior of a Cu-Ni multilayer on a polyimide substrate. It is found that the crack density of the multilayer does not increase until the strain is less than a critical value (1.54%). The crack-initiation strain is determined to be 0.3%. Theoretical analysis of fracture properties demonstrates that the proposed method is an easy and effective way to evaluate the reliability of a thin film on a flexible substrate. (C) 2008 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.","authors":[],"categoryName":"|","doi":"","fpage":"178","id":"13733862-3aae-4f52-978d-ed0de1b6a59c","issue":"3","journal":{"abbrevTitle":"SM","id":"37a994ff-74c6-4c39-a38b-4d9dcf2c8354","issnPpub":"1359-6462","publisherId":"SM","title":"Scripta Materialia"},"keywords":[{"id":"4c0e96e3-504d-47f4-81cf-5605e9df67a2","keyword":"Fracture;Flexible substrate;Multilayers;Bending test;thin-films;electronics;displays;systems","originalKeyword":"Fracture;Flexible substrate;Multilayers;Bending test;thin-films;electronics;displays;systems"}],"language":"en","publisherId":"1359-6462_2009_3_3","title":"Evaluation of the crack-initiation strain of a Cu-Ni multilayer on a flexible substrate","volume":"60","year":"2009"},{"abstractinfo":"The reaction kinetics in vapor-deposited indium/amorphous-selenium (a - Se) multilayer thin films were studied using differential scanning calorimetry (DSC), x-ray diffraction (XRD), and transmission electron microscopy (TEM), A number of reactions were observed upon heating with characteristic temperatures which were found to be independent of the multilayer modulation wavelength. The initial interface reaction between In and a-Se is the formation of an In2Se phase. Kinetic analyses of the In2Se formation process combined with TEM observations indicated chat interface reaction is characterized by the two-dimensional growth of pre-existing In2Se regions formed during deposition to impingement in the plane of the original In/a-Se interface. The change of the density of In2Se grains with temperature was analyzed in terms of the derived kinetic parameters, which is consistent with TEM observations and the heat release measurements.","authors":[],"categoryName":"|","doi":"","fpage":"771","id":"0fca358b-d1e5-4ee4-b947-227e9658838b","issue":"3","journal":{"abbrevTitle":"JOMR","id":"155c387a-c8cb-4083-85f3-6b58aeef4116","issnPpub":"0884-2914","publisherId":"JOMR","title":"Journal of Materials Research"},"keywords":[{"id":"26cc2b68-961e-47ef-8d82-21a4670a1968","keyword":"nucleation;cuinse2;growth","originalKeyword":"nucleation;cuinse2;growth"}],"language":"en","publisherId":"0884-2914_1999_3_1","title":"The kinetics of indium/amorphous-selenium multilayer thin film reactions","volume":"14","year":"1999"},{"abstractinfo":"Little is known about the interdiffusion in the amorphous Ni-Si multilayer due to the lack of suitable experimental method. In this paper, the interdiffusion phenomena in the amorphous Ni-Si multilayer are investigated by an in situ x-ray diffraction technique. The temperature-dependent interdiffusivity obtained by monitoring the decay of the first-order modulation peak as a function of annealing time can be described in terms of the Arrhenius relation. The effective interdiffusivities can be expressed as D(e)(T) = 2.13 X 10(-17) exp[-(0.61+/-0.02)/k(B)T] m2/s (423-613 K). A retarded interstitial diffusion mechanism is suggested to explain the diffusion process in the amorphous multilayer films.","authors":[],"categoryName":"|","doi":"","fpage":"2471","id":"b0c9f929-c11b-4de1-b4eb-7a345414e7ff","issue":"4","journal":{"abbrevTitle":"JOAP","id":"7dcf8a89-0513-40ee-be2d-759941dcef7e","issnPpub":"0021-8979","publisherId":"JOAP","title":"Journal of Applied Physics"},"keywords":[{"id":"a07b0158-3eab-4186-b969-f70f7d889581","keyword":"modulation wavelength;silicon;diffusion;films;metals","originalKeyword":"modulation wavelength;silicon;diffusion;films;metals"}],"language":"en","publisherId":"0021-8979_1993_4_1","title":"INTERDIFFUSION STUDY OF AMORPHOUS NI-SI MULTILAYER AT LOW-TEMPERATURE","volume":"74","year":"1993"},{"abstractinfo":"FeNi multilayer films were prepared by EB-PVD technique. A modified TG-DSCapparatus was used to measure their Curie temperatures, which were around 760°C,lower than that of pure Fe thin films. The easy magnetization axis was in-plane. Hightemperature annealing in vacuum decreased the coercivity sharply. The saturationmagnetization also changed with heat treatment. After annealing at the temperatureequal to the substrate temperature during deposition, the saturation magnetizationdecreased.","authors":[{"authorName":"L.L. Liu","id":"cb85dc80-d065-4430-ba18-76918a47db70","originalAuthorName":"L.L. Liu"},{"authorName":" X.F. Bi","id":"f6e9cca0-63c3-427f-99fc-ae4938f44a8b","originalAuthorName":" X.F. Bi"},{"authorName":" S.K. Gong","id":"605a830c-e924-48c2-9fa2-c76e0b78450f","originalAuthorName":" S.K. Gong"}],"categoryName":"|","doi":"","fpage":"182","id":"5f44aefa-f4b1-4908-8ac8-538a7261f713","issue":"2","journal":{"abbrevTitle":"JSXBYWB","coverImgSrc":"journal/img/cover/amse.jpg","id":"49","issnPpub":"1006-7191","publisherId":"JSXBYWB","title":"金属学报(英文版)"},"keywords":[{"id":"a03f4e17-9d42-4764-9010-aff0f7e69995","keyword":"multilayer film","originalKeyword":"multilayer film"},{"id":"03f79a2b-16a0-420e-aa6f-adf72ecb0302","keyword":"null","originalKeyword":"null"},{"id":"35cbbf99-b0e7-4ab8-ae1e-5d4f928a4db7","keyword":"null","originalKeyword":"null"},{"id":"5430c49a-c8c8-44f3-8e55-54c9c0fb8cbc","keyword":"null","originalKeyword":"null"},{"id":"2a18e548-3263-44c5-9812-67f41edd01c2","keyword":"null","originalKeyword":"null"}],"language":"en","publisherId":"1006-7191_2002_2_13","title":"PREPARATION OF Fe/Ni MULTILAYER FILMS AND THEIR MAGNETIC PROPERTIES","volume":"15","year":"2002"}],"totalpage":2167,"totalrecord":21665}