{"currentpage":1,"firstResult":0,"maxresult":10,"pagecode":5,"pageindex":{"endPagecode":5,"startPagecode":1},"records":[{"abstractinfo":"利用光学显微镜和X射线衍射技术,分析了非晶态Se和掺杂Sb的Se薄膜的晶化特性.Se薄膜由于保存周期不同以及Sb掺杂到Se中的Sb含量的多少都会影响Se的晶化特性;在热处理下薄膜的晶化呈现各向异性的择优生长.分析了晶化过程中微裂纹的产生,晶界的产生和体积收缩.薄膜与衬底之间的热应力是产生微裂纹的主要因素.","authors":[{"authorName":"叶水驰","id":"44c5685d-0eb9-4abb-a7f7-4867d48d8278","originalAuthorName":"叶水驰"},{"authorName":"鲍海飞","id":"ecc2a474-28a2-4836-ba70-545e04fc805e","originalAuthorName":"鲍海飞"},{"authorName":"蓝慕杰","id":"bcdbba60-de33-4644-8c81-0469a751b445","originalAuthorName":"蓝慕杰"}],"doi":"10.3969/j.issn.1000-985X.1998.01.015","fpage":"70","id":"6a47a770-9b83-47fb-9061-21afdf167eb5","issue":"1","journal":{"abbrevTitle":"RGJTXB","coverImgSrc":"journal/img/cover/RGJTXB.jpg","id":"57","issnPpub":"1000-985X","publisherId":"RGJTXB","title":"人工晶体学报"},"keywords":[{"id":"37cebf6c-f923-49d5-a738-7047ac135e5c","keyword":"Se薄膜","originalKeyword":"Se薄膜"},{"id":"691f03fe-fcc0-47e3-86e6-ec85aca9fc5c","keyword":"掺杂Sb的Se薄膜","originalKeyword":"掺杂Sb的Se薄膜"},{"id":"cb8c156b-26d5-4d35-a7dc-7106a628d50c","keyword":"晶化","originalKeyword":"晶化"},{"id":"131d7359-3a93-402b-9973-b944d4c587e5","keyword":"微裂纹","originalKeyword":"微裂纹"}],"language":"zh","publisherId":"rgjtxb98199801015","title":"非晶态Se及掺杂Sb的Se薄膜晶化特性研究","volume":"27","year":"1998"},{"abstractinfo":"本文在25 ℃、相对湿度50%的条件下,分别蒸镀了Al,Al/Se薄膜,研究了它们在空气中的导电性能,试验结果表明,只需50 s, Al薄膜的氧化反应已基本完成,其电阻率变化率为24.9%;大约需要2 min,Al/Se薄膜电阻变化率为4.5%,随后其电阻基本处于稳定状态.这主要是因为薄膜边沿和镀Se薄膜时形成的针孔的铝膜首先被氧化,使电阻增加.形成的Al2O3薄膜阻止了反应的继续进行,电阻不再变化.","authors":[{"authorName":"李志贤","id":"ad5201ae-8012-4304-9d39-6e4294b463ce","originalAuthorName":"李志贤"},{"authorName":"赵彦钊","id":"a1df9e95-8dcc-4f8c-8cf5-c30b00cc5d0b","originalAuthorName":"赵彦钊"},{"authorName":"张方辉","id":"d09970f6-f120-48ce-8753-e160fdf7d512","originalAuthorName":"张方辉"}],"doi":"","fpage":"1271","id":"ffd9bc58-7099-4fd1-b0cb-19b7fff7a0d2","issue":"6","journal":{"abbrevTitle":"GSYTB","coverImgSrc":"journal/img/cover/GSYTB.jpg","id":"36","issnPpub":"1001-1625","publisherId":"GSYTB","title":"硅酸盐通报 "},"keywords":[{"id":"7a7b2b7b-581a-4832-bc24-735166fbdd95","keyword":"电阻变化率","originalKeyword":"电阻变化率"},{"id":"3899b96a-d315-4a0c-b493-cab36624e9fb","keyword":"稳定性","originalKeyword":"稳定性"},{"id":"7cf67601-9f7b-4852-95ea-1fb04e378684","keyword":"Al薄膜","originalKeyword":"Al薄膜"},{"id":"0c5591bc-b6a4-4036-8f1b-3c41d87f8a10","keyword":"Al/Se薄膜","originalKeyword":"Al/Se薄膜"}],"language":"zh","publisherId":"gsytb200806038","title":"薄膜Se对薄膜Al电极的防护作用探讨","volume":"27","year":"2008"},{"abstractinfo":"对于绿光OLED多层器件,在高真空条件下,利用真空蒸镀的方法,在各功能层蒸镀完成后,又在阴极的外面蒸镀了一层硒薄膜封装层,然后再按一般方法进行封装.对比了正常封装与增加Se薄膜封装层后器件的性能,对比实验中封装过程都未加干燥剂.研究发现未加Se薄膜封装层器件的半衰期为2 880 h,增加Se薄膜封装层器件的半衰期接近4 000 h,Se薄膜封装层的增加将器件的寿命延长了1.4倍;研究还发现Se薄膜封装层基本不影响器件的电流-电压特性、色坐标等光电性能.","authors":[{"authorName":"张方辉","id":"d2378983-0a90-414c-b3c1-949042a01f28","originalAuthorName":"张方辉"},{"authorName":"李欣","id":"cc6a4757-1847-4e38-b0a2-816d34a13871","originalAuthorName":"李欣"},{"authorName":"王秀峰","id":"8bb5b360-039e-4e46-839a-83812686ed7b","originalAuthorName":"王秀峰"},{"authorName":"张志刚","id":"3d08f7be-ba20-43e6-a67c-24c34b4d0078","originalAuthorName":"张志刚"},{"authorName":"张宏科","id":"cab35311-5d16-41ca-aad5-597db0091d55","originalAuthorName":"张宏科"}],"doi":"10.3969/j.issn.1007-2780.2008.01.001","fpage":"1","id":"8edb638d-9584-45eb-a529-5ceada6ec2f3","issue":"1","journal":{"abbrevTitle":"YJYXS","coverImgSrc":"journal/img/cover/YJYXS.jpg","id":"72","issnPpub":"1007-2780","publisherId":"YJYXS","title":"液晶与显示 "},"keywords":[{"id":"aba50eca-9b14-4906-9472-bc19c69a6039","keyword":"OLED","originalKeyword":"OLED"},{"id":"1b673028-c5e3-4ebc-bd61-9ed4f18f6b1c","keyword":"薄膜封装","originalKeyword":"薄膜封装"},{"id":"80bba3f8-9e2b-41bc-9163-32c25ce05d34","keyword":"寿命","originalKeyword":"寿命"}],"language":"zh","publisherId":"yjyxs200801001","title":"Se薄膜封装层对OLED器件寿命的影响","volume":"23","year":"2008"},{"abstractinfo":"采用连续离子层吸附反应(SILAR)法,分别用含有Se2-,Bi3+和Sb3+的离子溶液作为独立的阴、阳离子前驱溶液,以载玻片为衬底,在室温下沉积出致密且具有镜面金属光泽的Bi2Se3-Sb2Se3薄膜材料.为了改善薄膜样品的结晶状态,对其进行了退火处理.用AFM观察了薄膜样品的表面形貌,用XRD分析了退火前后薄膜样品的结晶状态.结果表明:薄膜样品经200℃较低温度下退火处理4 h以后,薄膜的结晶状态由无定形态转化为多晶态,其平均晶粒尺寸为30 nm~40 nm.","authors":[{"authorName":"陈多金","id":"2f9ad807-c52e-44b0-a1a0-3e3acd14fdcd","originalAuthorName":"陈多金"},{"authorName":"雷天民","id":"5dfdaab2-e69c-42bc-b64e-9f8c858083b4","originalAuthorName":"雷天民"},{"authorName":"卢刚","id":"fa51c882-b38a-4486-b9d7-023beba72c73","originalAuthorName":"卢刚"}],"doi":"","fpage":"343","id":"2f686ce9-dfbe-41b9-b54c-cfa7713517d6","issue":"z2","journal":{"abbrevTitle":"XYJSCLYGC","coverImgSrc":"journal/img/cover/XYJSCLYGC.jpg","id":"69","issnPpub":"1002-185X","publisherId":"XYJSCLYGC","title":"稀有金属材料与工程"},"keywords":[{"id":"03127e7b-b41f-46a4-935e-8511b716e9f1","keyword":"SILAR法","originalKeyword":"SILAR法"},{"id":"d9f8feac-5064-4524-8f4d-920560af5f08","keyword":"Bi2Se3-Sb2Se3","originalKeyword":"Bi2Se3-Sb2Se3"},{"id":"f74d7459-9fb7-42cb-ac79-a4e8d6c5d006","keyword":"薄膜","originalKeyword":"薄膜"},{"id":"8cbbd37b-58d3-427a-9002-281a32ea8f0e","keyword":"表征","originalKeyword":"表征"}],"language":"zh","publisherId":"xyjsclygc2006z2084","title":"纳米晶Bi2Se3-Sb2Se3薄膜的SILAR法制备及表征","volume":"35","year":"2006"},{"abstractinfo":"采用连续离子层吸附反应(SILAR)法,分别用含有Se2-,Bi3+和Sb3+的离子溶液作为独立的阴、阳离子前驱溶液,以载玻片为衬底,在室温下沉积出致密且具有镜面金属光泽的Bi2Se3-Sb2Se3薄膜材料.为了改善薄膜样品的结晶状态,对其进行了退火处理.用AFM观察了薄膜样品的表面形貌,用XRD分析了退火前后薄膜样品的结晶状态.结果表明:薄膜样品经200℃较低温度下退火处理4 h以后,薄膜的结晶状态由无定形态转化为多晶态,其平均晶粒尺寸为30 nm~40 nm.","authors":[{"authorName":"陈多金","id":"905f6f6a-4535-419b-bb69-204400f49aed","originalAuthorName":"陈多金"},{"authorName":"雷天民","id":"c2bd5a69-1d13-4130-bd7d-db2e42d39c6d","originalAuthorName":"雷天民"},{"authorName":"卢刚","id":"fbe04d37-1b01-4f3a-b06d-ca8766afb1e6","originalAuthorName":"卢刚"}],"doi":"","fpage":"343","id":"cea43dec-b8c3-4fdd-83fb-ac8fda56f3d4","issue":"z1","journal":{"abbrevTitle":"XYJSCLYGC","coverImgSrc":"journal/img/cover/XYJSCLYGC.jpg","id":"69","issnPpub":"1002-185X","publisherId":"XYJSCLYGC","title":"稀有金属材料与工程"},"keywords":[{"id":"0046c372-5d4c-4b09-ae4c-d03fdb8bb743","keyword":"SILAR法","originalKeyword":"SILAR法"},{"id":"def30477-3ddd-4413-94da-974123c2cf99","keyword":"Bi2Se3-Sb2Se3","originalKeyword":"Bi2Se3-Sb2Se3"},{"id":"29b3ba36-f75d-4766-9969-a9cebb8e471f","keyword":"薄膜","originalKeyword":"薄膜"},{"id":"df509eca-9be3-4dd8-8290-05becc0edbca","keyword":"表征","originalKeyword":"表征"}],"language":"zh","publisherId":"xyjsclygc2006z1084","title":"纳米晶Bi2Se3-Sb2Se3薄膜的SILAR法制备及表征","volume":"35","year":"2006"},{"abstractinfo":"Se量是影响CIGS薄膜生长的重要因素之一.本实验利用三步共蒸法在不同Se量常温下沉积CIGS薄膜,而后对衬底分三步在不同温度下真空退火,采用扫描电子显微镜(SEM)和能量散射谱(EDS)观察和分析了薄膜的表面形貌和元素成分,采用X射线衍射仪(XRD)表征了薄膜的组织结构,采用紫外可见分光光度计(UV)研究了薄膜的光学性质,结果表明真空退火下Se量应严格控制在Culn0.7 Ga0.3 Se2化学计量比范围内,这样有利于制备出较高吸收率的CIGS薄膜.","authors":[{"authorName":"李文科","id":"7c8b5be7-0862-492c-9475-1e7d4aec5bcf","originalAuthorName":"李文科"},{"authorName":"唐振方","id":"8b2aa705-17f7-4bc8-b2b4-81f4c47099bf","originalAuthorName":"唐振方"}],"doi":"","fpage":"408","id":"d44a7c90-41b9-40a9-b7f8-cd5627ec0a1f","issue":"3","journal":{"abbrevTitle":"CLKXYGCXB","coverImgSrc":"journal/img/cover/CLKXYGCXB.jpg","id":"13","issnPpub":"1673-2812","publisherId":"CLKXYGCXB","title":"材料科学与工程学报"},"keywords":[{"id":"f1b27097-1f5b-4c2d-87f0-5beb01157562","keyword":"CIGS 薄膜","originalKeyword":"CIGS 薄膜"},{"id":"fb5994f5-09b1-435b-9d2d-feea77f7bf3f","keyword":"Se 量","originalKeyword":"Se 量"},{"id":"5c9fb926-d331-4594-91a5-b78f7eda7af2","keyword":"真空退火","originalKeyword":"真空退火"},{"id":"7fb22434-f641-4bb6-9006-b3bf2dab6e86","keyword":"晶体结构","originalKeyword":"晶体结构"},{"id":"b706ba0a-6b4a-4d1d-95a9-d58b41af2dd6","keyword":"光学性质","originalKeyword":"光学性质"}],"language":"zh","publisherId":"clkxygc201003021","title":"Se量对CIGS薄膜的结构及光学性质的影响","volume":"28","year":"2010"},{"abstractinfo":"在Mo基底上,采用恒电位法从含有CuCl2、InCl3、GaCl3、H2SeO3、柠檬酸的水溶液中电沉积制备Cu(In,Ga)Se2薄膜,用HCl调节pH值为2.5,并对沉积薄膜400℃左右Ar气氛中退火20 min.对退火前后的膜进行X射线衍射,扫描电镜和能谱分析仪分析,结果表明,电沉积制备的Cu(In,Ga)Se2薄膜为黄铜矿结构,退火后,共沉积薄膜的结晶度提高,晶粒尺寸增加,Se含量减少.","authors":[{"authorName":"刘琪","id":"85d27c3b-0fbb-4f8b-a586-419f947d64e9","originalAuthorName":"刘琪"},{"authorName":"冒国兵","id":"c069d8a2-e72d-4762-95a2-da42bad622cd","originalAuthorName":"冒国兵"},{"authorName":"万兵","id":"a7848e46-efb4-4224-84ae-c19fc679aad9","originalAuthorName":"万兵"},{"authorName":"敖建平","id":"d6be30c8-0e34-4b60-97d3-ebab67b24030","originalAuthorName":"敖建平"}],"doi":"10.3969/j.issn.1007-2330.2007.01.016","fpage":"61","id":"ae37ddf7-24d6-454f-9e8f-cffc0c9dbd97","issue":"1","journal":{"abbrevTitle":"YHCLGY","coverImgSrc":"journal/img/cover/YHCLGY.jpg","id":"77","issnPpub":"1007-2330","publisherId":"YHCLGY","title":"宇航材料工艺 "},"keywords":[{"id":"fb9d5c49-b706-4d29-b3b8-e60895822fdb","keyword":"电沉积","originalKeyword":"电沉积"},{"id":"533caccc-6786-4d54-9054-fcce92e56111","keyword":"退火","originalKeyword":"退火"},{"id":"a0de8f16-caab-42f6-affc-f89e1d25a3a3","keyword":"CIGS薄膜","originalKeyword":"CIGS薄膜"},{"id":"3cc344a7-31be-45e9-a29c-37bca7a9828d","keyword":"太阳电池","originalKeyword":"太阳电池"}],"language":"zh","publisherId":"yhclgy200701016","title":"电沉积太阳电池用Cu(In,Ga)Se2薄膜","volume":"37","year":"2007"},{"abstractinfo":"采用电沉积方法在SnO2玻璃基底上制备了Co-Se化合物薄膜. 研究了薄膜形成的电化学机理和电沉积工艺对薄膜组成与形貌的影响, 并表征了薄膜的结构与光学性质. 结果表明:Co2+受预沉积Se的表面诱导还原或直接与H2SeO3的六电子还原反应产物H2Se发生反应形成Co-Se化合物; 沉积电位、沉积温度和pH值均显著影响电沉积Co-Se化合物薄膜的形貌与成分; 在沉积电位为-0.5V(<>vsSCE)、沉积温度为50℃和pH值为2.0时可制备出表面致密平整且呈六方晶型结构的富硒CoSe薄膜, 其光吸收系数达到1×105cm-1,直接带隙宽度为(1.53±0.01)eV,接近单结太阳电池光吸收层材料的理论最佳值.","authors":[{"authorName":"王博","id":"a5ccfc4e-c284-458f-9953-ca9f573437ab","originalAuthorName":"王博"},{"authorName":"刘芳洋","id":"9b9ff5d8-4651-4eb5-83f2-7f0edb29ee6d","originalAuthorName":"刘芳洋"},{"authorName":"李劼","id":"92bcc8df-1f5d-48a1-8ac8-6c9e7272a60c","originalAuthorName":"李劼"},{"authorName":"赖延清","id":"36e0288a-1cdf-4859-9be8-51422a805f3b","originalAuthorName":"赖延清"},{"authorName":"张治安","id":"4e741480-2b92-461e-a1e0-ac442bce8578","originalAuthorName":"张治安"},{"authorName":"刘业翔","id":"d83e07c2-073e-4bde-b678-9e6ede22fae7","originalAuthorName":"刘业翔"}],"categoryName":"|","doi":"10.3724/SP.J.1077.2011.00403","fpage":"403","id":"15d488b7-fc3a-4193-b3f9-4c66e00c86c6","issue":"4","journal":{"abbrevTitle":"WJCLXB","coverImgSrc":"journal/img/cover/WJCLXB.jpg","id":"62","issnPpub":"1000-324X","publisherId":"WJCLXB","title":"无机材料学报"},"keywords":[{"id":"ce6ddbf7-5e7f-4655-af61-20bdf4fff094","keyword":"CoSe薄膜","originalKeyword":"CoSe薄膜"},{"id":"5d5a107e-980a-4b56-ad83-dbb27cd0904b","keyword":"cyclic voltammetry","originalKeyword":"cyclic voltammetry"},{"id":"941d3293-4f33-4f1c-a8be-a796bb7c8558","keyword":"under potential deposition","originalKeyword":"under potential deposition"},{"id":"ffcf7f16-3540-4e17-90d2-2799c0fe7f5f","keyword":"band gap","originalKeyword":"band gap"},{"id":"c68cd5c6-de76-4dee-bf67-4ba23bbf496e","keyword":"solar cells","originalKeyword":"solar cells"}],"language":"zh","publisherId":"1000-324X_2011_4_1","title":"Co-Se 化合物薄膜的电沉积制备与表征","volume":"26","year":"2011"},{"abstractinfo":"采用电沉积方法在SnO2玻璃基底上制备了Co-Se化合物薄膜.研究了薄膜形成的电化学机理和电沉积工艺对薄膜组成与形貌的影响,并表征了薄膜的结构与光学性质.结果表明:Co2+受预沉积Se的表面诱导还原或直接与H2SeO3的六电子还原反应产物H2Se发生反应形成Co-Se化合物;沉积电位、沉积温度和pH值均显著影响电沉积Co-Se化合物薄膜的形貌与成分;在沉积电位为-0.5V(vs SCE)、沉积温度为50℃和pH值为2.0时可制备出表面致密平格且呈六方晶型结构的富硒CoSe薄膜,其光吸收系数达到1×105 cm-1,直接带隙宽度为(1.53±0.01)eV,接近单结太阳电池光吸收层材料的理论最佳值.","authors":[{"authorName":"王博","id":"d7a88066-0f20-46da-9ecb-a3a92c7436bb","originalAuthorName":"王博"},{"authorName":"刘芳洋","id":"d31abecb-da94-40ad-a675-8d1837c8e0e7","originalAuthorName":"刘芳洋"},{"authorName":"李劼","id":"d420bfa8-66b0-41aa-817e-391de5fb0b7d","originalAuthorName":"李劼"},{"authorName":"赖延清","id":"31c42376-28f5-47b4-a951-e08daa8d8b99","originalAuthorName":"赖延清"},{"authorName":"张治安","id":"2dcd4fd4-4473-47e4-9023-274989dfa7b0","originalAuthorName":"张治安"},{"authorName":"刘业翔","id":"22021329-c6cc-4cfd-8997-94bf67b671ec","originalAuthorName":"刘业翔"}],"doi":"10.3724/SP.J.1077.2011.00403","fpage":"403","id":"d83c110d-50e2-4ab5-ac1e-af17f6ceaa23","issue":"4","journal":{"abbrevTitle":"WJCLXB","coverImgSrc":"journal/img/cover/WJCLXB.jpg","id":"62","issnPpub":"1000-324X","publisherId":"WJCLXB","title":"无机材料学报"},"keywords":[{"id":"37701e94-0424-4c21-94c1-024f9ec33d59","keyword":"CoSe薄膜","originalKeyword":"CoSe薄膜"},{"id":"da577fa7-24ac-459e-a1e7-0cf5818361bd","keyword":"循环伏安","originalKeyword":"循环伏安"},{"id":"3571e0e7-c0c5-4a1c-91b3-8974cae01f4c","keyword":"欠电位沉积","originalKeyword":"欠电位沉积"},{"id":"c681bc0b-90c2-4854-86a2-aa47e6339056","keyword":"带隙宽度","originalKeyword":"带隙宽度"},{"id":"901d10a2-43fe-482f-85f1-19b94e3d7e46","keyword":"太阳电池","originalKeyword":"太阳电池"}],"language":"zh","publisherId":"wjclxb201104012","title":"Co-Se化合物薄膜的电沉积制备与表征","volume":"26","year":"2011"},{"abstractinfo":"在含有Bi 3+、HTeO2+、Se4+离子的水溶液中通过电化学方法实现了Bi2Te3-ySey热电薄膜沉积,研究了电沉积Bi2Te3-ySey的阴极极化曲线及热电薄膜的生长过程,通过电子显微镜(SEM)和能谱仪(EDS)等手段对热电薄膜进行了形貌、成分分析。结果表明电解液的离子组成、沉积电位对薄膜成分、形貌有较大影响。在-0.07V沉积电位下制备的热电薄膜Bi2Te2.75Se0.95晶粒大小均匀,结构致密。","authors":[{"authorName":"任大海","id":"6867ba5b-2527-40ba-81be-6398c254eeea","originalAuthorName":"任大海"},{"authorName":"戴震宇","id":"7ee13b8b-47b3-44fd-866b-98fb305e3aba","originalAuthorName":"戴震宇"},{"authorName":"尤政","id":"e752c924-c0be-49a4-8c77-d1e8d7348990","originalAuthorName":"尤政"}],"doi":"","fpage":"1261","id":"a8c75500-59a0-4ccd-9c9d-d4ebf2702bc6","issue":"7","journal":{"abbrevTitle":"GNCL","coverImgSrc":"journal/img/cover/GNCL.jpg","id":"33","issnPpub":"1001-9731","publisherId":"GNCL","title":"功能材料"},"keywords":[{"id":"78865e1b-ffc6-49c0-b39c-3aa97e8eab5f","keyword":"热电薄膜","originalKeyword":"热电薄膜"},{"id":"ab54625a-8941-4444-ac14-cfa45683d92f","keyword":"热电转换","originalKeyword":"热电转换"},{"id":"687bd885-41ff-49f4-94fc-dece17111fb6","keyword":"电沉积","originalKeyword":"电沉积"}],"language":"zh","publisherId":"gncl201107027","title":"Bi-Te-Se热电薄膜的电化学沉积","volume":"42","year":"2011"}],"totalpage":1072,"totalrecord":10718}