为了防止活性等离子体对下层银膜的破坏,采用多晶TiO2半导体烧结靶,使用射频磁控溅射方法在纯氩等离子气氛中制备了大面积均匀的TiO2、Ag@TiO2薄膜.为了了解其结构与电子和光学特性间的相互作用,对TiO2和TiO2/Ag/TiO2样品的制备参数(如射频功率、总压和直流电压的共同影响)进行了研究.采用掠入射X射线衍射、紫外可见吸收、拉曼光谱等技术研究了根据其结构调整光学性能的可能性.结果显示,沉积的TiO2薄膜具有与在氩气和氧气混合气氛中沉积所得薄膜相似的形貌、电子和光学特性、能隙带宽和晶相；且所制备的Ag@TiO2薄膜银具有可逆的光致变色特性,可作为智能窗、多波长光存储器和可擦写高密度电子纸使用.
In order to protect the Ag underlayer against reactive plasma,large-scale uniform TiO2 film and Ag @TiO2 films were prepared by RF magnetron sputtering in pure Ar plasma using polycrystalline TiO2 semiconductor sintered target.TiO2 and TiO2/Ag/TiO2 samples,with particular attention to the combined influence of RF power,total pressure and DC potential,were studied to obtain a better understanding of the interaction of the structure with electronic and optical properties.Grazing incidence XRD,ultraviolet-visible absorption,and Raman spectroscopy etc.were performed to investigate the possibility of tailoring the structure with consequent modification of the optical properties.It was found that the deposited TiO2 film had similar morphology,electronic and optical property,band gap and phase transferring with the film reported in the literature which was deposited in the Ar and O2 mix atmosphere.The prepared Ag@TiO2 films present a reversible photochromic property and can be used as smart windows,high density multiwavelength optical memory and rewritable electronic paper.
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