以氧化铁、碳化硅和氧化钴为高辐射填料,通过控制涂层浆料固含量和喷涂次数制备出了不同表面粗糙度的高辐射涂层.用AE辐射计测试了不同表面粗糙度高辐射涂层的室温发射率,根据GB/T 7287-2008测试了涂层的800℃高温发射率,用扫描电子显微镜和光学显微镜观察了涂层表面形貌,用扫描探针显微镜测试了涂层的表面粗糙度.结果表明,在辐射换热条件下高辐射涂层表面粗糙度在2.75～225.70 μm变化时,其室温发射率发生了0.02～0.05的变化.而在导热换热条件下高辐射涂层表面粗糙度在2.75～36.99μm变化时,其高温发射率没有变化.
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