研究了水平阴极方式复合电沉积Ni-MWCNTs(Ni-多壁碳纳米管).采用硫酸镍基础电解液,添加适当表面活性剂和光亮剂,MWCNTs为2~2.5 g/L,电流密度为2.5 A/dm2时,获得的Ni-MWCNTs沉积层结构致密,复合沉积层中MWCNTs含量达22.45%.复合电沉积层表面微观形貌照片显示,MWCNTs在复合电沉积层中占主要体积,镍的电结晶形态呈球形,结晶点位置位于MWCNTs管壁缺陷处及部分管端处,MWCNTs的管端和管壁缺陷处的Ni晶粒相互连接,形成牢固的复合沉积层.复合电沉积层中MWCNTs含量受电解液中MWCNTs浓度、电流密度以及光亮剂影响,在MWCNTs上的Ni沉积层连续性直接受MWCNTs管壁上缺陷的数量和连续性影响,形成晶核的缺陷尺度至少在1 nm以上.
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