介绍了一种新型的紫外光刻体系,它由包含低分子量PVP(K30)作为稳定剂的钯胶和用作光刻胶的高分子量PVP(K90)/DAS组成.通过紫外光引发DAS分解及PVP交联、乙醇显影和高温处理在玻璃基片的表面选择性固定Pd颗粒,然后通过Pd颗粒引发化学镀,得到铜线路图形.采用扫描电镜(SEM)观察并讨论了显影时间及其对图形分辨率的影响.
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