Formation of Nanoscale Intermetallic Phases in Ni Surface Layer at High Intensity Implantation of Al Ions

材料科学技术（英）, 2004, 20(5): 583-586.

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1.Tomsk State University of Architecture & Building, 2 Solyanaya pl., Tomsk,634003, Russia

2.Tomsk State University of Architecture & Building, 2 Solyanaya pl., Tomsk,634003, Russia

3.Tomsk State University of Architecture & Building, 2 Solyanaya pl., Tomsk,634003, Russia

4.Nuclear Physics Institute, Tomsk Polytechnic University, 2a Lenin Str., Tomsk,634050, Russia

5.Tomsk State University of Architecture & Building, 2 Solyanaya pl., Tomsk,634003, Russia

6.Institute of Strength Physics and Materials Science, Russian Academy of Sciences, 2/1 Pr. Akademicheskii,Tomsk,634021, Russia

基金项目: the support of Ministry of Education of the Russian Federation(TOO-7.5-2777 and Grant PD02-1.2-401)

Formation of Nanoscale Intermetallic Phases in Ni Surface Layer at High Intensity Implantation of Al Ions

Keywords： High intensive ion implantation

The results of experimental study of nanoscale intermetallic formation in surface layer of a metal target at ion implantation are presented. To increase the thickness of the ion implanted surface layer the high intensive ion implantation is used. Compared with the ordinary ion implantation, the high intensive ion implantation allows a much thicker modified surface layer. Pure polycrystalline nickel was chosen as a target. Nickel samples were irradiated with Al ions on the vacuum-arc ion beam and plasma flow source "Raduga-5". It was shown that at the high intensity ion implantation the fine dispersed particles of Ni3Al, NiAl intermetallic compounds and solid solution Al in Ni are formed in the nickel surface layer of 200 nm and thicker. The formation of phases takes place in complete correspondence with the Ni-Al phase diagram.

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Formation of Nanoscale Intermetallic Phases in Ni Surface Layer at High Intensity Implantation of Al Ions

参考文献