采用共溅射和多层膜溅射两种不同的溅射方式制备FePt:Ag颗粒膜.MFM和TEM微观结构观测的结果表明:与多层膜溅射制备的FePt:Ag颗粒膜相比,共溅射制备的颗粒膜具有更小的磁畴尺寸和晶粒尺寸,并且其磁畴和晶粒的分布更加均匀.这种微观结构上的区别可解释为共溅射制备的颗粒膜中Ag原子的分布更加具有随机性.对薄膜内部缺陷的研究进一步证实了该解释.
Two different sputtering modes, co-sputtering and multilayer-sputtering, were used to fabricate FePt:Ag granular thin films. It is observed by the MFM and TEM images that smaller magnetic domain patterns and grains are more uniformly distributed in the co-sputtered granular films compared to in multilayer-sputtered ones. This difference in the microstructure is explained to be attributed to the more randomly distributed Ag atoms in the co-sputtered films. Further study on in-depth defects in these films confirms this explanation.
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