以γ-环氧丙氧丙基三甲氧基硅烷(GPTMS)和正硅酸乙酯(TEOS)为前躯体,采用溶胶-凝胶法在LY12铝合金基体表面制备了铈盐Ce(NO3)3掺杂有机-无机杂化膜.通过极化曲线与电化学阻抗谱(EIS)研究铈盐掺杂硅烷杂化膜在3.5%(质量分数)NaCl溶液中耐蚀性能随浸泡时间的变化.结果表明,硅烷杂化膜的极化阻抗值随浸泡时间延长而缓慢降低,但浸泡183h后仍显著高于金属基体;铝合金点蚀电位在浸泡期间呈现先降低后升高再降低的变化.在浸泡初期,EIS曲线的高频容抗行为显著.从69h至260h浸泡试验结束,低频阻抗值保持基本稳定.上述变化与膜中掺杂的铈盐具有自修复性质密切相关.
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