反应磁控溅射广泛应用于制备光学薄膜.分析了高阈值激光反射膜膜层材料的选择及膜系设计,比较了目前制备高阈值激光反射膜的几种常用方法.重点论述了反应磁控溅射制备高阈值激光反射膜需要解决的两个问题:工作点的选择及控制方法;反应磁控溅射中的打火、靶中毒及阳极消失.并且提出了相应的解决方案.阐述了影响激光反射膜损伤阈值的因素以及反应磁控溅射制备高阈值激光反射膜的优势.
参考文献
| [1] | Matthew W Hooker.A ruggedness evaluation of procedures for damage threshold testing optical materials[J].NASA Technical Memorandum,1995(02):4369. |
| [2] | Wood Roger M.Laser damage in optical materials[M].Bristol and Boston:Adam Hilger,1986 |
| [3] | 胡建平,邱服民,付雄鹰,曾勋.SiO2半波覆盖层对HfO2/SiO2 高反射膜激光损伤的影响[J].强激光与粒子束,2001(02):137-141. |
| [4] | Rainer F.A historical perspective on fifteen years of laser damage thresholds at LLNL[A].,1993:27. |
| [5] | 付雄鹰,孔明东,胡建平,范正修.波长1O64nm脉冲激光高阈值反射膜的研制[J].强激光与粒子束,1999(04):413-417. |
| [6] | Fournet C;Pinot B;Geenen B et al.High damage threshold mirrors and polarizers in the ZrO2/SiO2and HfO2/SiO2 dielectrics systems[J].Proceedings of SPIE-The International Society for Optical Engineering,1991,1624 |
| [7] | Genin F Y et al.Growth of laser-induced damage during repetitive illumination of HfO2/SiO2 multilayer mirror and polarizer coatings[R].UCRL-JC-124877,1997. |
| [8] | 王永忠,张云洞,熊胜明.提高强激光反射镜镀膜损伤阈值的激光后处理技术及机理探讨[J].强激光与粒子束,1994(02):297. |
| [9] | Bliss E S;Milam D;Bradbury R A .Dielectric mirror damage by laser radiation over a range of pulse durations and beam radii[J].Applied Optics,1973,12(04):677. |
| [10] | Stolz C J;Genin F Y et al.Effect of SiO2 Overcoat thickness on laser damage morphology of HfO2/SiO2 brewster's angle polarizers at 1064nm[R].UCRL-JC-124875,1997. |
| [11] | Genin F Y;Stolz C J et al.Effect of electric field distribution on the morphologies of laser induced in hafnia-silica multilayer polarizer[R].UCRL-JC-124873,1997. |
| [12] | 胡江川,王万录,冯庆,刘高斌,吴子华,葛芳芳.高反射膜抗激光损伤的研究进展[J].材料导报,2003(z1):238-241. |
| [13] | Shen Jun;Zhang Qinyuan.Sol-gel processing of zirconia coating for HR mirrors with high laser damage threshold[J].JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY,2000(19):271. |
| [14] | Zhang Qinyuan.Sol-gel derived ZrO2-SiO2 highly reflective coatings[J].International Journal of Inorganic Materials,2000(02):319. |
| [15] | 闫宏,赵福庭.光学薄膜领域反应磁控溅射技术的进展[J].光学仪器,2004(02):109-114. |
| [16] | 侯晓波.反应溅射制备SiO2膜的问题及进展[J].真空,1999(06):1. |
| [17] | 茅昕辉,陈国平,蔡炳初.反应磁控溅射的进展[J].真空,2001(04):1-7. |
| [18] | 姜燮昌.真空镀膜技术的最新进展[J].真空,1999(05):1. |
| [19] | Erich Hacker;Hans Lauth;Peter Weissbrodt .Review of structural influences on the laser damage coatings[J].SPIE,1996,2714:316. |
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