采用直流磁控溅射的方法,在Si(111)基片上沉积AlN(100)面择优取向薄膜,研究了溅射功率对AlN薄膜结构及表面粗糙度的影响.结果表明,随着溅射功率的增加,沉积速率增大,但薄膜结构择优取向度变差,表面粗糙度增大,这说明要制备择优取向良好、表面粗糙度小的AlN薄膜,需选择较小的溅射功率.
参考文献
[1] | D. Liufu;K. C. Kao .Piezoelectric, dielectric, and interfacial properties of aluminum nitride films[J].Journal of Vacuum Science & Technology, A. Vacuum, Surfaces, and Films,1998(4):2360-2366. |
[2] | Marc-Alexandre Dubois;Paul Muralt .Properties of aluminum nitride thin films for piezoelectric transducers and microwave filter applications[J].Applied physics letters,1999(20):3032-3034. |
[3] | Wauk M T;Winslow D K .Vacuum Deposition of AlN Acoustic Transducers[J].Applied Physics Letters,1968,13:286-288. |
[4] | Davis R.F. .III-V nitrides for electronic and optoelectronic applications[J].Proceedings of the IEEE,1991(5):702-712. |
[5] | Rodriguez-Clemente R;Aspar B;Azema N et al.Morphological Properties of Chemical Vapour Deposition AlN Films[J].Journal of Crystal Growth,1993,133:59-70. |
[6] | Yang D;Jonnalagadda R;Rogers B R .Texture and Surface Roughness of PRCVD Aluminum Nitride[J].Thin Solid Films,1998,332:312-318. |
[7] | 许昌昆;孟秀林.声表面波器件及其应用[M].北京:科学出版社,1984:99. |
[8] | 田民波;刘德令.薄膜科学与技术手册[M].北京:机械工业出版社,1991:103. |
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