反应溅射制备ＡｌＮ 薄膜时，薄膜的择优取向与众多的实验参数有关．建立晶面择优取向程度与溅射气压、靶基距、靶功率等重要实验参数之间的函数关系，避免了研究每一项参数对薄膜择优取向影响所需的实验次数的繁多，得到制备择优取向程度最佳薄膜的实验参数．同时，通过用该函数关系式计算得到结果与实验结果比较，发现两者具有很好的一致性．这一系列函数关系式的建立，对进一步设计新的实验方案、验证已有的实验结果以及制备良好择优取向薄膜都有着重要意义．
The preferential orientation intensity of AlN films depends on several deposition parameters. For the
first time, the function relation formulae between the intensity of preferential orientation of the films and experimental parameters
(such as sputtering pressure, target power and the distance) were found. It is common practice to perform a number of deposition experiments by varying
the controllable parameters to determine the optimal films growth conditions. The comparison of the experimental results and computational results obtained
by using the function relation formula indicates that two results have a good agreement with each other. The foundation of these function relation formulae
is of great signification for furthermore designing of a new experimental scheme, validating an old experimental result, or preparing the good
preferential orientation films.
参考文献
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