采用电化学和分光光度法研究了苯并三氮唑和甲基苯并三氮 唑在去离子水中对紫铜的腐蚀电化学行为的影响和吸附规律.结果表明，当浓度大于5 mg/L 时，苯并三氮唑和甲基苯并三氮唑均具有较好缓蚀性能，且甲基苯并三氮唑的缓蚀性能优于 苯并三氮唑.这两种缓蚀剂属于阳极型缓蚀剂，吸附过程为放热反应，属化学吸附，服从Lan gmuir吸附等温式.
Corrosion electrochemistry behavior of benzotriazol e (BTA)and tolytriazole (TTA)on copper in deionized water was studied.It was sh own that BTA and TTA have good inhibition performance when t heir concentrations are higher than 5 mg/L.They are anodic type inhibitors,and a t the same time they have a little inhibitive effect on the cathodic reaction.Wi th the help of spectrophotometry,the relation of concentration,temperature,time to the inhibiting action of BTA and TTA in deionized water was studied respectiv ely.The adsorption processes are exothermic reactions and belong to chemical ads orptions.The Langmuir isotherm is followed.The free energy,enthalpy and entropy of adsorption,constant of adsorption were calculated.Considering the differences of their molecular structures,the hydrophobic methyl group substitution at the benzene ring gives TTA.The methyl group is not expected to interfere with the bo nding characteristics of the triazole ring,as it is far away from the triazole N atoms.The experiments show that the inhibiting action and its persistence of TT A is better than those of BTA under the given conditions.These positive effects can be attributed to the increased film hydrophobicity.
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