沉积温度对磁控溅射Ni3Al-Cr薄膜微观结构及性能的影响

功能材料, 2013, 44(4): 483-487.

沉积温度对磁控溅射Ni3Al-Cr薄膜微观结构及性能的影响

邢永燕 ^1, , 魏贤华 ^2, , 马拥军 ^3, , 代波 ^4,

1.西南科技大学材料科学与工程学院,四川省非金属复合与功能材料重点实验室,四川绵阳621010

2.西南科技大学材料科学与工程学院,四川省非金属复合与功能材料重点实验室,四川绵阳621010

3.西南科技大学材料科学与工程学院,四川省非金属复合与功能材料重点实验室,四川绵阳621010

4.西南科技大学材料科学与工程学院,四川省非金属复合与功能材料重点实验室,四川绵阳621010

基金项目: 国家高技术研究发展计划(863计划)重点资助项目(2009AA035002) 四川省非金属复合与功能材料重点实验室开放基金资助项目(11zxfk17) 西南科技大学研究生创新基金资助项目(12ycjj07)

关键词：薄膜 , 磁控溅射 , 微观结构 , 抗腐蚀性能 , 力学性能

The influence of depositing temperature on structure, corrosion resistance and mechanical properties of magnetron sputtered Ni3Al-Cr thin films

通过磁控溅射分别在300、400、500和600℃下沉积了Ni3Al-Cr薄膜.采用X射线衍射(XRD)和原子力显微镜(AFM)表征了薄膜的晶体结构和表面形貌,通过方阻法检测了薄膜的抗腐蚀性能,采用纳米压痕表征了薄膜的硬度.结果表明,沉积温度对薄膜的微观结构、抗腐蚀及力学性能有重要影响.随着沉积温度的升高,薄膜晶粒及颗粒尺寸增大,300C时形成尺寸均匀的立方体小颗粒,400和500℃时颗粒长大且致密堆积,600℃时部分颗粒过度长大.在400℃沉积的薄膜兼具最优的抗腐蚀性和力学性能.证明了方阻法表征薄膜抗腐蚀性能的可靠性.

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