辉光放电辅助脉冲激光沉积CNx涂层工艺

电镀与涂饰 , 2015, 34(15): 851-855.

辉光放电辅助脉冲激光沉积CNx涂层工艺

张青 ^1, , 陈传胜 ^2, , 宋建强 ^3, , 郑晓华 ^4,

1.安徽职业技术学院机械工程系,安徽合肥,230011

2.安徽职业技术学院机械工程系,安徽合肥,230011

3.浙江工业大学材料科学与工程学院,浙江杭州,310032

4.浙江工业大学材料科学与工程学院,浙江杭州,310032

基金项目: 浙江省自然科学基金(Y411645)

关键词：氮化碳涂层 , 脉冲激光沉积 , 辉光放电 , 氮含量 , 摩擦因数 , 磨损率

Glow discharge-assisted pulsed laser deposition of CNx coatings

Keywords： carbon nitride coating , pulsed laser deposition , glow discharge , nitrogen content , friction coefficient , wear rate

采用直流辉光放电辅助PLD(脉冲激光沉积)法制备了CNx涂层,通过正交试验研究了气压、激光通量、放电功率密度和靶基距等工艺参数对CNx涂层的氮含量、摩擦因数和磨损率的影响,利用扫描电镜(SEM)、X射线光电子能谱仪(XPS)和球-盘式微型摩擦仪对涂层的表面形貌、化学成分以及摩擦学特性进行了表征.结果表明,辉光放电辅助PLD制备的CNx涂层比传统PLD涂层光滑,且工艺参数对涂层表面形貌的影响较小.激光通量对涂层的氮含量、摩擦因数和磨损率的影响较为显著,放电功率密度的影响最小.涂层的耐磨性随涂层氮含量的升高而降低.当气压为12 Pa、激光通量为6.7 J/cm2、放电功率密度为30 mW/cm2和靶基距为37 mm时,涂层中氮原子分数为32.2％,沉积速率为0.83 μm/h,摩擦因数为0.122,磨损率为1.13×10-13 m3/(N.m).

参考文献

[1]	LIU A Y;COHEN M L .Prediction of new low compressibility solids[J].SCIENCE,1989,245(4920):841-842.
[2]	郑晋翔,郑晓华,沈涛,杨芳儿,宋仁国.递进式脉冲激光沉积CNx薄膜的组织结构与摩擦学特性[J].中国激光,2012(06):155-160.
[3]	Szorenyi T.;Fogarassy E.;Bertoti I.;Antoni F. .Dependence of nitrogen content and deposition rate on nitrogen pressure and laser parameters in ArF excimer laser deposition of carbon nitride films[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2000(1/4):248-250.
[4]	梁小蕊,江炎兰,孔令燕,陈菊娜,王刚.氮化碳（C3N4）材料的合成及应用研究进展[J].新技术新工艺,2013(01):88-90.
[5]	Kutasi K.;Donko Z.;Mohai M.;Nemes L.;Marosi G. .Formation of CNx layers in a nitrogen glow discharge with graphite electrodes[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2002(4):311-319.
[6]	傅广生,于威,王淑芳,李晓苇,张连水,韩理.辉光放电等离子体辅助XeCl准分子激光溅射沉积碳氮薄膜[J].物理学报,2001(11):2263-2268.
[7]	Wei Hu;Ning Xu;Yi-Qun Sheng;Ting-Wei Zhang;Jian Sun;Jia-Da Wu;Zhi-Feng Ying .Synthesis of nanocrystalline carbon nitride films by glow discharge plasma beam deposition[J].Materials Science & Engineering, A. Structural Materials: Properties, Misrostructure and Processing,2006(1/2):142-148.
[8]	Cheng YH.;Tay BK.;Lau SP.;Qiao XL.;Chen JG.;Wu YP.;Xie CS. Wang YQ.;Xu DS.;Mo SB.;Sun YB.;Sun ZH. .Influence of deposition pressure on the composition and structure of carbon nitride films deposited by direct current plasma assisted pulsed laser ablation[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2001(1/2):32-39.
[9]	沈邦兴.工程实验设计[M].涿州:测绘出版社,1990:96-102.
[10]	M. Rusop;T. Soga;T. Jimbo .The effect of processing parameters on amorphous carbon nitride layer properties[J].Diamond and Related Materials,2004(11/12):2187-2196.
[11]	罗乐,张君芳,方晓东,夏天荣,秦娟娟,陶汝华.激光脉冲能量对类金刚石薄膜及其红外光学特性的影响[J].中国激光,2010(12):3121-3126.

上一张下一张

计量

下载量()
访问量()

作者相关

文章评分

您的评分：
1

0%
2

0%
3

0%
4

0%
5

0%

材料期刊网