采用直流磁控溅射工艺制备TbDyFe磁致伸缩薄膜,通过考察薄膜成分及其微结构,分析研究了溅射功率对薄膜磁致伸缩性能的影响.结果表明,同一薄膜内部成分相当均一,但不同溅射功率条件下的薄膜成分相异.溅射功率较低,薄膜内部微柱状体结构导致了磁各向异性的产生,磁致伸缩性能下降;溅射功率提高到120 W,微柱状体结构消失,薄膜内部趋于均一连续,磁致伸缩性能较好.
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