利用微波吸收介电谱检测技术,检测均匀掺杂[Fe(CN)_6]~(4-)盐的立方体AgCl微晶首次曝光后的自由和浅束缚光电子的衰减时间分辨谱.实验发现,随着掺杂浓度的增加,样品中自由光电子衰减时间逐渐从未掺杂时的116 ns延长至1133 ns.分析光电子衰减曲线还同时得到,随着掺杂浓度的增加,光电子的前期较慢衰减过程逐渐变快,后期较快衰减过程逐渐变慢,总体上衰减时间逐渐增加,且掺杂浓度变化对后期衰减影响较大.研究表明掺杂使得晶体中引入了能总体上延缓光电子衰减的浅电子陷阱,并且随掺杂浓度的增加,浅电子陷阱特征更加明显.
The decay spectra of the free and shallow-trapped photoelectrons at the first exposure time in cubic AgCl microcrystals doped with [Fe(CN)_6]~(4-) were obtained by microwave absorption and dielectric spetrum mesurement technique. It is found that the free photoelectrons decay time increased from 116ns to 1133 ns as the doping concentration increasing. By analyzing the photoelectrons decay curve, it is also found that the doping concentration increasing, the first slower decay section becomes faster and the second faster decay section slower, as a whole the decay time increased. The variation of the doping concentration has greater impact on the photoelectrons later decay part. The result shows that the doping introduces shallow electron traps which can delay the decay process of the photoelectrons, and with the doping concentration increasing, the characteristic of shallow electron traps becomes remarkable.
参考文献
| [1] | Tani T;Takeshi S;Katsuhisa O .Energy Gap Dependence of Efficiency of Photoinduced Electron Transfer from Cyanine Dyes to Silver Bromide Microcrystals in Spectral Sensitization[J].Journal of Physical Chemistry,1990,94:1298. |
| [2] | Janusonis G A;Jones R W;Butaine J R et al.Internally Doped Silver Halide Emulsions[P].US patent:4 835 093,1989. |
| [3] | McDugle W G;Machetti A P;Keevert J E et al.Photographic Emulsions Containing Internally Modified Silver Halide Grains[P].US Patent:4 981 781,1991. |
| [4] | Gurney R W;Mott N F .Theory of the Photolysis of Silver Bromide and Photographic Latent Image[J].^Proc R Soc London,1938,164(A):151-156. |
| [5] | McDugle W G;Machetti A P;Keevert J E et al.Photographic Emulsions Containing Internally Modified Silver Halide Grains[P].US Patent:5 037 732,1991. |
| [6] | Marchetti A P;McDugle W G;Eachus R S .Photographic Emulsions Containing Internally Modified Silver Halide Grains[P].US Patent 4 937 180,1990. |
| [7] | Keevertt J E;McDugle W G;Eachus R S .Photographic Emulsions Containing Internally Modified Silver Halide Grains[P].US Patent:4 945 035,1990. |
| [8] | Kinji Ohkubo;Junper Noguchi;Kunioki Ghmura .Process of Precipating Silver Halide in the Presence of a Colloid and a Water-Soluble Iron Salt[P].US Patent:3 672 901,1972. |
| [9] | Harashi;Kazunori;Masahiro et al.Direct Positive Silver Halide Photographic Materials[P].US Patent 5 112 732,1992. |
| [10] | Schmidt J.EPR and ENDOR Spectroscopy of Shallow Electron Traps in AgCl and AgBr[A].Antwerp Belgium,1998:74-76. |
| [11] | 戴晖,梁冰,庄思永,孙健,张大德.[Fe（CN）6]4-在溴碘化银T-颗粒乳剂中的掺杂[J].感光科学与光化学,2001(04):262-267. |
| [12] | Sakuragi S;Kanzaki H .Indentification of Shallow Electron Centres in Silver Halides[J].Physical Review Letters,1977,38(22):1302-1305. |
| [13] | Hirano A.Shallow Electron Traps in Silver Halide Investigated by a Photoconductivity Technique[A].Antwerp Belgium,1998:89-92. |
| [14] | 代秀红,李晓苇,董国义,张荣香,张继县,李红莲,韩理,傅广生.浅电子陷阱掺杂AgCl微晶的光作用特性研究[J].人工晶体学报,2007(03):550-553,595. |
| [15] | Li Xiao-Wei,Zhang Rong-Xiang,Liu Rong-Juan,Yang Shao-Peng,Han Li,Fu Guang-Sheng.The influence of trapping centres on the photoelectron decay in silver halide[J].中国物理（英文版）,2006(03):624-630. |
| [16] | 李晓苇,江晓利,孟涛,代秀红,赵晓辉,董国义,韩理.掺杂的AgCl微晶在化学增感条件下的光电子衰减特性[J].光谱学与光谱分析,2006(09):1581-1583. |
| [17] | Mussig Th;Hegenbart G .Principles of Microwave Absorption Technique Applied to AgX Micocrystals[J].Journal of Imaging Science and Technology,1997,41:118-120. |
| [18] | Mussig Th;Hegenbart G;Russow A et al.Microwave Absorption Investigations of Ag_(1-x)I_x Crystals[J].Journal of Imaging Science and Technology,1994,38(06):526-532. |
| [19] | 杨少鹏,李晓苇,韩理,傅广生.Characteristics of Photoelectron Decay of Silver Halide Microcrystal Illuminated by a Short Pulse Laser[J].中国物理快报(英文版),2002(03):429-431. |
| [20] | 李晓苇,韩理,耿爱丛,杨少鹏,傅广生.卤化银微晶中光电子衰减谱的特性[J].光谱学与光谱分析,2004(07):787-789. |
- 下载量()
- 访问量()
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%