本文利用sol-gel旋涂法在ITO玻璃衬底上成功制备了氧化镍(NiO)薄膜.薄膜在550nm处的透过率为83.9 %,直接禁带宽度为3.65 eV.XRD分析结果表明NiO薄膜为立方晶相,沿(111),(200),(220)晶面生长,垂直于晶面(200)方向的晶粒直径尺寸大约为6.82 nm.循环伏安实验测试表明,NiO薄膜在电化学反应过程中Ni2+不只经历了一次氧化反应,而是被氧化成更高价态的Ni3+ ,Ni4+价态,并通过计算得出薄膜在最强的阳极/阴极峰处的扩散系数为13.4×10-12 cm2/s和2.29×10-12cm2/s,并且薄膜在550 nm处致色态与褪色态的透过率之差为36.5%,Tbleched/Tcoloured为1.8.
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