用磁控溅射法在奥氏体不锈钢基片上制备了SiC单层膜和Ti／TiN双层膜以及Ti／TiN／SiC功能梯度薄膜。采用XRD和显微硬度计对薄膜的结晶质量和硬度进行表征；用AFM和SEM对薄膜的表面和截面形貌进行了表征。结果表明：Ti／TiN双层膜在氩氮流量比为15：15时，薄膜的结晶质量最好，硬度最高，达到15．6GPa，最适合作为钢基SiC薄膜的缓冲层。另外，功能梯度SiC薄膜比SiC单层膜的结晶质量好；不同退火温度下功能梯度SiC薄膜的硬度高于SiC单层膜，同时功能梯度SiC薄膜的表面结晶质量也优于SiC单层膜。
SiC film, Ti/TiN bilayers and Ti/TiN/SiC functionally gradient films were prepared on austenitic stainless steel by magnetron sputtering method. Crystallinity and microhardness of these films were analyzed by XRD and microhardness test, and the surface and sectional morphology were analyzed by AFM and SEM. The results show that the crystallinity of Ti/TiN bilayer films is the best and the microhardness reaches the maximum value of 15.6 GPa when the ratio of argon to nitrogen is 15： 15, which is used for the buffer layer of Ti/TiN/SiC functionally gradient films. The crystallinity, mierohardness and surface quality of the Ti/TiN/SiC functionally gradient films are better than those of SiC monolayer film.
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