电子束物理气相沉积是真空蒸发技术的一种,具有蒸发速率高和无污染的特点,目前广泛应用于材料表面涂层的制备.将离子束辅助和等离子辅助与电子束物理气相沉积技术相结合,可以提高蒸发粒子入射能量和扩散能力,改善由于电子束物理气相沉积工艺本身存在阴影效应和扩散能力低而引起的沉积材料的不致密等不足.介绍了电子束物理气相沉积技术的概况,并展望了该技术的未来应用及发展前景.
参考文献
| [1] | B.A.Movchan .Inorganic materials and coatings produced by EBPVD[J].Surface Engineering,2006(1):35-46. |
| [2] | Smith H R;Kennedy K .Metallurgical characteristics of titanium alloy foil prepared by electron-beam evaporation[J].Journal of Vacuum Science and Technology,1970,7(06):48. |
| [3] | 张宇峰,张溪文,任兆杏,韩高荣.离子束辅助薄膜沉积[J].材料导报,2003(11):40-43. |
| [4] | 贾克辉,徐颖,高劲松,曹健林.等离子辅助镀膜技术[J].发光学报,2002(06):623-626. |
| [5] | Reinhold E;Botzler E;Deus C .EB-PVD process management for highly productive zirconia thermal barrier coating of turbine blades[J].Surface and Coatings Technology,1999,120-121:77. |
| [6] | Lugscheider E.;Dopper G.;Barimani C. .Ceramic thermal barrier coatings deposited with the electron beam-physical vapour deposition technique[J].Surface & Coatings Technology,1998(1/3):1221-1227. |
| [7] | Schiller S;Metzner Chr .New coatings on metal sheets and strips produced using EB PVD technologies[J].Surface and Coatings Technology,2000,125(03):240. |
| [8] | 史丽萍,赫晓东,李垚.EBPVD法制备NiCrAlY/ZrO2-8Y2O3微层复合板的拉伸力学性能研究[J].宇航材料工艺,2003(06):57-59. |
| [9] | 王英剑,李庆国,范正修.电子束、离子辅助和离子束溅射三种工艺对光学薄膜性能的影响[J].强激光与粒子束,2003(09):841-844. |
| [10] | 关春龙,李垚,赫晓东.电子束物理气相沉积技术及其应用现状[J].航空制造技术,2003(11):35-37. |
| [11] | Hhirvonen J .Ion-beam processing for surface modification[J].Annual Review of Materials Science,1989,19:401. |
| [12] | Kuwahara K;Sumomogl T .Internal stress in aluminum oxide,titanium carbide and copper films obtained by planar magnetron sputtering[J].Thin Solid Films,1981,78(01):41. |
| [13] | Deng H;Chen J;Inturi R B et al.Structure,mechanical and tribological properties of d.c.magnetron sputtered TiB2 and TiB2 (N) thin films[J].Surface and Coatings Technology,1995,76-77:609. |
| [14] | Noyan I C;Hunag T C;York B R .Residual stress/strain analysis in thin films by X-ray diffraction[J].Critical Review in Solid State and Materials Sciences,1995,20(02):125. |
| [15] | Quaeyhaegens C;Knuyt G .Experimental study of the growth evolutin from random towards a (111) preferential orientation of PVD TiN coatings[J].Thin Solid Films,1995,258(1-2):1710. |
| [16] | Gerlach J W;Preckwinkel U .Biaxial alignment of TiN films prepared by ion beam assisted deposition[J].Applied Physics Letters,1996,68(17):2360. |
| [17] | Jiang H.;Li H.;Tao K. .STRUCTURE OF TINX (0-LESS-THAN-X-LESS-THAN-1.1) FILMS PREPARED BY ION BEAM-ASSISTED DEPOSITION[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1995(1/2):51-55. |
| [18] | Roth T;Kllos K H .Structure,internal stresses,adhesion and wear resistance of sputtered alumina coatings[J].Thin Solid Films,1987,153(1-3):123. |
| [19] | 肖友文 .70mm平行束卡夫曼源的设计[J].电子器件,1997,20(01):705. |
| [20] | 尤大纬.宽束考夫曼离子源的原理及其使用[J].电工电能新技术,1993(01):55. |
| [21] | Lin Yongchang;You Dawei;Li Xiaoqian .Plasma ion assisted deposition technique[J].Optical instruments,1999,21(425):39. |
| [22] | 张以忱.电子枪与离子束技术[M].北京:冶金工业出版社,2004:244. |
| [23] | 卢国英,林国强.脉冲偏压电弧离子镀CrAlN薄膜研究[J].真空科学与技术学报,2006(06):441-445. |
| [24] | 张皓扬,周兰英,田建朝.基体偏压对TiAlN涂层性能的影响[J].表面技术,2006(06):15-16,45. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%