沉积温度对磁控溅射BiFeO3薄膜结构和性能的影响

人工晶体学报, 2011, 40(4): 921-925.

沉积温度对磁控溅射BiFeO3薄膜结构和性能的影响

赵庆勋 ^1, , 张婷 ^2, , 马继奎 ^3, , 魏大勇 ^4, , 王宽冒 ^5, , 刘保亭 ^6,

1.河北大学物理科学与技术学院,河北省光电信息材料重点实验室,保定071002

2.河北大学物理科学与技术学院,河北省光电信息材料重点实验室,保定071002

3.河北大学物理科学与技术学院,河北省光电信息材料重点实验室,保定071002

4.河北大学物理科学与技术学院,河北省光电信息材料重点实验室,保定071002

5.河北大学物理科学与技术学院,河北省光电信息材料重点实验室,保定071002

6.河北大学物理科学与技术学院,河北省光电信息材料重点实验室,保定071002

关键词：磁控溅射 , 沉积温度 , SrRuO3 , BiFeO3薄膜

Effect of Deposition Temperature on the Structural and Physical Properties of BiFeO3 Films Prepared by Magnetron Sputtering

应用磁控溅射法在以SrRuO3 (SRO)薄膜为缓冲层的Pt/TiO2/SiO2/Si(001)基片上制备了多晶BiFeO3 (BFO)薄膜,构架了SRO/BFO/SRO异质结电容器.采用X射线衍射、铁电测试仪等研究沉积温度对BFO薄膜结构和性能的影响.X射线衍射图谱显示BFO薄膜为多晶结构.在2.5 kHz测试频率下,500℃生长的BFO薄膜呈现比较饱和的电滞回线,2Pr为145μC/cm2,矫顽场Ec为158 kV/cm,漏电流密度约为2.4×104 A/cm2.漏电机制研究表明,在低电场区,SRO/BFO/SRO电容器满足欧姆导电机制,在高电场区,满足普尔-弗兰克导电机理.实验发现:SRO/BFO/SRO电容器经过109翻转后仍具有良好的抗疲劳特性.

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